Patents Assigned to Elohim Incorporation
  • Method for manufacturing High-K MIM capacitor to improve electrical characteristics
    Patent number: 11961671
    Abstract: An embodiment of the present disclosure provides a MIM capacitor by High-k dielectric and method for fabricating the same to prevent formation of oxygen-based interface films between a lower electrode and a dielectric layer, and between an upper electrode and a dielectric layer by stacking a first film formed of metal between the dielectric layer formed of a High-k material having a high dielectric constant and the lower electrode formed of metal, and a second film formed of metal between the dielectric layer and the upper electrode.
    Type: Grant
    Filed: January 25, 2022
    Date of Patent: April 16, 2024
    Assignee: Elohim Incorporation
    Inventors: Seunggu Lim, Jihoon Cha, Dong-Ki Lee, Taedong Kim, Yeonglyeol Park