Abstract: A recyclable flexible package used for foods, non-foods, pharmaceuticals, and other products that would benefit from flexible packaging solutions is provided. The present invention also relates to the methods of forming recyclable flexible packaging using fewer production steps while using EB cured inks & EB laminates, among others.

Abstract: Window tiles for electron beam systems are provided. The window tiles can comprise a first surface and a second surface, and one or more features extending from the first surface to the second surface. The one or more features can have a non-uniform or tapered cross-section between the first surface and the second surface. The first surface can be configured to be exposed to vacuum conditions and can be configured to receive electrons accelerated from an electron beam generator. The second surface can be configured to allow electrons to pass through to a foil. The window tiles can improve electron beam processing systems for example by increasing electron throughput, lowering power consumption, reducing heat absorption to the foil, improving and increasing foil life, and potentially allowing for use of smaller and cheaper machines in electron beam processing.

Abstract: The present invention is directed to methods for making materials treatable by electron beam (EB) processing, such as materials for flexible packaging, comprising: providing a substrate; applying an ink formulation on at least a portion of the substrate, the ink formulation comprising ink and at least one monomer selected from acrylates, vinyl ethers, cycloaliphatic diepoxides, and polyols; and applying a lacquer on at least a portion of the ink formulation, the lacquer comprising at least one monomer selected from acrylates, vinyl ethers, cycloaliphatic diepoxides, and polyols. The processing apparatus for EB treating the material operates at a low voltage, such as 110 kVolts or below.

Abstract: The present invention is directed to materials treatable by electron beam (EB) processing, such as materials for flexible packaging. The material comprises a substrate; an ink formulation on at least a portion of the substrate, the ink formulation comprising ink and at least one monomer selected from acrylate esters, vinyl ethers, cycloaliphatic diepoxides, and polyols; and a lacquer on at least a portion of the ink formulation, the lacquer comprising at least one monomer selected from acrylate esters, vinyl ethers, cycloaliphatic diepoxides, and polyols. The processing apparatus for EB treating the material operates at a low voltage, such as 125 kVolts or less.

Abstract: The present invention is directed to a particle beam processing apparatus that is smaller in size and operates at a higher efficiency, and also directed to an application of such apparatus to treat a coating on a substrate of a treatable material, such as for flexible packaging. The processing apparatus includes a particle beam generating assembly, a foil support assembly, and a processing assembly. In the particle beam generating assembly, electrons are generated and accelerated to pass through the foil support assembly. In the flexible packaging application, the substrate is fed to the processing apparatus operating at a low voltage, such as 110 kVolts or below, and is exposed to the accelerated electrons to treat the coating on the substrate.

Abstract: The present invention is directed to a particle beam processing apparatus that is smaller in size and operates at a higher efficiency. The processing apparatus includes a particle beam generating assembly, a foil support assembly, and a processing assembly. In the particle beam generating assembly, a cloud of particles, for example, electrons, are generated by heating at least one tungsten filament. The electrons are then extracted to travel at a high speed to the foil support assembly which is set at a much lower voltage than the particle beam generating assembly. A substrate is fed to the processing apparatus through the processing zone and is exposed to the electrons exiting the particle beam generating assembly and entering the processing zone. The electrons penetrate and cure the substrate causing a chemical reaction, such as polymerization, cross-linking, or sterilization.

Abstract: The present invention is directed to a particle beam processing apparatus that is smaller in size and operates at a higher efficiency. The processing apparatus includes a particle beam generating assembly, a foil support assembly, and a processing assembly. In the particle beam generating assembly, a cloud of particles, for example, electrons, are generated by heating at least one tungsten filament. The electrons are then extracted to travel at a high speed to the foil support assembly which is set at a much lower voltage than the particle beam generating assembly. A substrate is fed to the processing apparatus through the processing zone and is exposed to the electrons exiting the particle beam generating assembly and entering the processing zone. The electrons penetrate and cure the substrate causing a chemical reaction, such as polymerization, cross-linking, or sterilization.

Abstract: The present invention is directed to a particle beam processing apparatus that is smaller in size and operates at a higher efficiency, and also directed to an application of such apparatus to treat a coating on a substrate of a treatable material, such as for flexible packaging. The processing apparatus includes a particle beam generating assembly, a foil support assembly, and a processing assembly. In the particle beam generating assembly, electrons are generated and accelerated to pass through the foil support assembly. In the flexible packaging application, the substrate is fed to the processing apparatus operating at a low voltage, such as 110 kVolts or below, and is exposed to the accelerated electrons to treat the coating on the substrate.

Abstract: The present invention is directed to a particle beam processing apparatus that is smaller in size and operates at a higher efficiency. The processing apparatus includes a particle beam generating assembly, a foil support assembly, and a processing assembly. In the particle beam generating assembly, a cloud of particles, for example, electrons, are generated by heating at least one tungsten filament. The electrons are then extracted to travel at a high speed to the foil support assembly which is set at a much lower voltage than the particle beam generating assembly. A substrate is fed to the processing apparatus through the processing zone and is exposed to the electrons exiting the particle beam generating assembly and entering the processing zone. The electrons penetrate and cure the substrate causing a chemical reaction, such as polymerization, cross-linking, or sterilization.

Abstract: A novel parallel-filament type electron gun for electron beam irradiation accelerators or generators and the like having a plurality of longitudinally extending parallel transversely spaced substantially co-planar similar filaments for generating electrons and disposed between a lower co-extensive extractor grid and an upper co-extensive electrostatic lens surface for shaping the electron beam profile, and with constructional features that enable variable width and extremely wide guns to be achieved and with improved beam uniformity.

Abstract: A novel heatable filament wire support is provided embodying flexible and rigid support and current-providing bracket beams terminating in inherent resilient clip springs for accurately clamping the ends of the filament with mechanical and electrical reliability, enabling facile filament wire alignment and replacement, and accommodation for thermal displacement upon filament heating.

Abstract: This invention embraces a method of controlling the impermeability of an organic polymer film to gases such as oxygen, aroma, flavor and fragrance and the like to produce gas impermeable organic polymer films by coating with a mixture of a siloxane monomer with carboxylic acid in an alcohol solvent and evaporating the solvent to complete the formation of Si--O--Si bonds; and then polymerizing and grafting the coating, preferably by electron beam radiation, to the polymer film. Improved coated polymer films and formulation products therefor are also provided.

Abstract: A novel technique and apparatus for shielding electron beam and similar product irradiation zones with a separable shielding housing extending transversely of the longitudinal line of product flow and slidably openable in a transverse direction orthogonal to both the electron beam and the direction of product flow, both in passing the beam and along the line, resulting in substantial space saving, more facile accelerating to the irradiation and product feed zone and less costly and sizeable shielding apparatus.

Abstract: A novel electron beam apparatus and technique wherein a plurality of longitudinally extending heated filaments is employed, each similarly offset laterally of a central longitudinal axis, but with successive filaments alternately disposed on opposite sides of said axis and cooperating with a first low velocity accelerating stage comprising staggered grid slots and openings, and a high velocity second accelerating stage to provide long uniform longitudinal electron beams.

Abstract: Through the use of a hybrid or the combination of inexpensive relatively impure, and expensive pure, nitrogen purging at various locations of electron-beam processing of polymer and other coatings, high speed efficient processing can be obtained at reduced cost.

Abstract: A method of imbuing polymer films as of polyethylene and polypropylene with gas, aroma, fragrance, flavor, grease and oil impermeable surface characteristics involving coating the film with appropriate silane compounds and cross-linking the same while providing physical adsorption adherence to the film, and in sufficient coating micron thickness to produce gas and related barrier characteristics; with chemical grafting, including by eb techniques, further providing improved bonding. Preferred barrier-coated polymer films with reduced haze and clarity are formed by such method.

Abstract: A process is described for modifying the surface of polymers such as polyolefins and the like to improve the wetability by barrier and other coatings and to enhance interlayer adhesion by graft polymerization through initiation by electron-beam radiation, optionally with an added electron energy acceptor.

Abstract: This disclosure relates to the use of electron beam curing and bonding irradiation in an in-line process of laminating a decorative layer, such as printed paper, to an adhesive-coated particle board panel or the like, wherein an electron-curable top coating is adsorbed into the paper and, under the electron-beam irradiation, cures with the adhesive to produce a monolithically bonded paper-to-panel polymeric structure with a hard scratch and abrasion-proof surface imparted to the paper.

Abstract: A process is described for modifying the surface of polymers such as polyolefins and the like to improve the wetability by barrier and other coatings and to enhance interlayer adhesion by graft polymerization through initiation by electron-beam radiation, optionally with an added electron energy acceptor.

Abstract: A process for controlling the penetration of electron beam radiation through package coverings of products to insure sterilization of the covering wraps, but protecting the internal products and medium from electron beam penetration and x-ray generation and the like, as required for such applications as pharmaceutics, medicaments, parenteral drugs and devices, prostheses, food packaging and similar systems.