Patents Assigned to EPIR Technologies, Inc.
  • Publication number: 20100105082
    Abstract: An assay test solution, a method for using, and an apparatus for the rapid detection of multiple pathogens using a FRET-based phenomenon. A volume of fluid, possibly containing pathogens, is passed through an intake and combined with an assay solution of quantum dot/antibody-antigen/quencher complexes that dissociate and recombine with the pathogens into quantum dot/antibody-pathogen complexes. The quantum dot/antibody-antigen/quencher and quantum dot/antibody-pathogen complexes are captured on a detection filter which is illuminated by a light source. The quantum dot/antibody-pathogen complexes, but not the quantum dot/antibody-antigen/quencher complexes, fluoresce when excited by the light from the light source and the fluorescence is picked up by a photodetector, indicating the presence of the pathogens.
    Type: Application
    Filed: October 28, 2008
    Publication date: April 29, 2010
    Applicant: EPIR TECHNOLOGIES, INC.
    Inventors: Dinakar RAMADURAI, James W. GARLAND, Sivalingam SIVANANTHAN
  • Publication number: 20100096001
    Abstract: A Group II-VI photovoltaic solar cell comprising at least two and as many as five subcells stacked upon one another. Each subcell has an emitter layer and a base layer, with the base of the first subcell being made of silicon, germanium, or silicon-germanium. The remaining subcells are stacked on top of the first subcell and are ordered such that the band gap gets progressively smaller with each successive subcell. Moreover, the thicknesses of each subcell are optimized so that the current from each subcell is substantially equal to the other subcells in the stack. Examples of suitable Group II-VI semiconductors include CdTe, CdSe, CdSeTe, CdZnTe, CdMgTe, and CdHgTe.
    Type: Application
    Filed: October 30, 2008
    Publication date: April 22, 2010
    Applicant: EPIR TECHNOLOGIES, INC.
    Inventors: Sivalingam SIVANANTHAN, Wayne H. LAU, Christoph GREIN, James W. GARLAND
  • Publication number: 20090321642
    Abstract: A detector of incident infrared radiation has a first region with a first spectral response, and a second region with a second, different spectral response. The second absorption region is stacked on the first and may be separated therefrom by a region in which the chemical composition of the compound semiconductor is graded. Separate contacts are provided to the first and second absorption regions and a further common contact is provided so as to permit the application of either a bias voltage or a skimming voltage across the respective pn junctions. The detector may be operated such that a preselected one of the absorption regions responds to incident infrared radiation of a predetermined waveband while the other absorption region acts as a skimmer of dark current, thereby enhancing the signal to noise ratio of the detector.
    Type: Application
    Filed: April 30, 2008
    Publication date: December 31, 2009
    Applicant: EPIR TECHNOLOGIES, INC.
    Inventors: Silviu VELICU, Christoph GREIN, Sir B. Rafol, Sivalingam SIVANANTHAN
  • Publication number: 20090261442
    Abstract: A photosensitive diode has an active region defining a majority carrier of a first conductivity type and a minority carrier of a second conductivity type. An extraction region is disposed on a first side of the active region and extracts minority carriers from the active region. It also has majority carriers within the extraction region flowing toward the active region in a condition of reverse bias. An exclusion region is disposed on a second side of the active region and has minority carriers within the exclusion region flowing toward the active region. It receives majority carriers from the active region. At least one of the extraction and exclusion region provides a barrier for substantially reducing flow of one of the majority carriers or the minority carriers, whichever is flowing toward the active region, while permitting flow of the other minority carriers or majority carriers flowing out of the active region.
    Type: Application
    Filed: April 17, 2008
    Publication date: October 22, 2009
    Applicant: EPIR TECHNOLOGIES, INC.
    Inventors: Christoph H. Grein, Silviu Velicu, Sivalingam Sivananthan
  • Patent number: 7586115
    Abstract: Structures and methods to inject electrons into an insulator from a semiconductor layer that are then collected in a thin layer of a direct semiconductor material which in turn emits light by bandgap recombination.
    Type: Grant
    Filed: July 3, 2006
    Date of Patent: September 8, 2009
    Assignee: EPIR Technologies, Inc.
    Inventor: Robert W. Bower
  • Publication number: 20070270081
    Abstract: At least one wafer is suspended on a respective jig shaft above a polishing platen. The degree of parallelism between the wafer and the polishing platen is controlled using a three-point suspension, which allows for planar pitch adjustments using vertical actuation algorithms. As the wafer is lowered into contact against the polishing platen, a load cell senses how much of the weight of the jig shaft, wafer mount and wafer continues to be supported by the jig. The vertical displacement of the wafer is controlled using a linear actuator responsive to a signal from the load cell. Vertical actuation of the wafer serves to increase or decrease this amount of supported weight, in turn decreasing or increasing the amount of applied downforce exerted between the wafer and the platen. A compression spring is used to increase the resolution of the pressure control. Finally, system components exposed to the work environment are encapsulated by chemically resistive components to prevent corrosion of system components.
    Type: Application
    Filed: August 2, 2007
    Publication date: November 22, 2007
    Applicant: EPIR TECHNOLOGIES, INC.
    Inventors: Jerome CROCCO, Rasdip SINGH
  • Patent number: 7045378
    Abstract: A photosensitive diode has superlattice exclusion region formed from a stack of first and second layers. The first layers are penetrated by minority carriers using quantum mechanical tunneling and reduce minority carrier mobility. The second layers have a sufficiently low bandgap that the tunneling minority carriers can reach an active region of the diode. The process of successively forming first and second layers is repeated until the exclusion region is at least three times the minority carrier diffusion length.
    Type: Grant
    Filed: September 24, 2004
    Date of Patent: May 16, 2006
    Assignee: EPIR Technologies, Inc.
    Inventors: Christoph H. Grein, Silviu Velicu, Sivalingam Sivananthan
  • Patent number: 6906358
    Abstract: A photosensitive diode has an active region defining a majority carrier of a first conductivity type and a minority carrier of a second conductivity type. At least one extraction region is disposed on a first side of the active region and has a majority carrier of the second conductivity type. Carriers of the second conductivity type are extracted from the active region and into the extraction region under a condition of reverse bias. At least one exclusion region is disposed on a second side of the active region and has a majority carrier of the first conductivity type. The exclusion region prevents entry of its minority carriers, which are of the second conductivity type, into the active region while in a condition of reverse bias. The exclusion region includes a superlattice with a plurality of layers.
    Type: Grant
    Filed: January 30, 2003
    Date of Patent: June 14, 2005
    Assignee: EPIR Technologies, Inc.
    Inventors: Christoph H. Grein, Silviu Velicu, Sivalingam Sivananthan
  • Patent number: 6657194
    Abstract: At a face of a silicon semiconductor substrate tilted about one degree from a [100] orientation, a readout integrated circuit (ROIC) is implemented, specially designed and fabricated for direct epitaxial growth. Layers of II-VI semiconductor material, preferably including layers of HgCdTe of different bandgaps, are successively and monolithically grown on the face by molecular beam epitaxy (MBE) within a window masking the face and then patterned and wet-etched to create mesas of two-color detector elements in an array. Preferably a beginning buffer layer of CdTe is grown to minimize crystalline mismatch between the Si and the HgCdTe. Sloped sidewalls of the mesas ensure good step coverage of the conductive interconnects from the detector elements to the ROIC.
    Type: Grant
    Filed: April 13, 2001
    Date of Patent: December 2, 2003
    Assignee: EPIR Technologies, Inc.
    Inventors: Renganathan Ashokan, Paul Boieriu, Yuanping Chen, Jean-Pierre Faurie, Sivalingam Sivananthan