Patents Assigned to Epitech Inc.
  • Patent number: 6716777
    Abstract: A fabric structure is constructed having a fabric base sheet, a viscidity layer, a polymeric back layer, and a protective layer. The polymeric back layer is prepared from SBC (styrenic block copolymer) for the advantage of low specific gravity and preventing the drawback of PVC or the like that pollutes the environment when disposed off. The protective layer is prepared from PU series or modified SBC (styrenic block copolymer) series agent. When the fabric structure used to make a bag, the front surface of the fabric base sheet is disposed outside the bag and the surface of the protective layer is disposed inside the bag.
    Type: Grant
    Filed: November 8, 2001
    Date of Patent: April 6, 2004
    Assignee: Epitech Inc.
    Inventor: Chun-Wei Lin
  • Publication number: 20030087570
    Abstract: A fabric structure is constructed having a fabric base sheet, a viscidity layer, a polymeric back layer, and a protective layer. The polymeric back layer is prepared from SBC (styrenic block copolymer) for the advantage of low specific gravity and preventing the drawback of PVC or the like that pollutes the environment when disposed off. The protective layer is prepared from PU series or modified SBC (styrenic block copolymer) series agent. When the fabric structure used to make a bag, the front surface of the fabric base sheet is disposed outside the bag and the surface of the protective layer is disposed inside the bag.
    Type: Application
    Filed: November 8, 2001
    Publication date: May 8, 2003
    Applicant: EPITECH INC.
    Inventor: Chun-Wei Lin