Patents Assigned to ETP Electron Multipliers Pty Ltd
  • Publication number: 20180218891
    Abstract: An apparatus for generating and focusing electrons is provided. The apparatus has an emissive material configured to emit an electron, an electron target, and an electrical potential gradient generator configured to generate an electrical potential gradient within the emissive material. The electrical potential gradient is oriented so as to vary from positive to negative in the general direction toward the electron target. In operation, an electron emitted from the emissive materials is deflected away from the emissive material and generally toward the electron target. The apparatus may be incorporated in scientific analytical equipment such as an electron multiplier.
    Type: Application
    Filed: July 14, 2016
    Publication date: August 2, 2018
    Applicant: ETP ELECTRON MULTIPLIERS PTY LTD
    Inventor: Richard STRESAU
  • Patent number: 7446327
    Abstract: Apparatus for amplifying a stream of primary charged particles comprises a body defining a chamber and an entrance aperture for receiving the stream of primary charged particles into the chamber, and an incident dynode, adapted to be charged to a pre-determined electrical potential, having a surface positioned in the chamber to be impacted by said primary charged particles at an angle of incidence greater than 30° from the surface normal and in response to the impact to generate a stream of secondary charged particles.
    Type: Grant
    Filed: April 21, 2006
    Date of Patent: November 4, 2008
    Assignee: ETP Electron Multipliers Pty Ltd.
    Inventor: Richard W. Stresau
  • Patent number: 6982428
    Abstract: Electron focussing apparatus includes a cathode plate defining an impact surface on which particles impact, which surface has a finite probability of generating at least one electron for each impacting particle having predetermined characteristics. The apparatus also has an electron receiving element, and respective means for generating electrostatic and magnetic fields in a space extending from the impact surface to the electron receiving element. The means for generating the electrostatic and magnetic fields are configured whereby the E/B2 ratio adjacent the electron receiving element is smaller than adjacent the impact surface, whereby to decrease the radius of curvature of the electron trajectories adjacent the electron receiving element relative to adjacent the impact surface and to thereby focus the electron trajectories in at least one dimension.
    Type: Grant
    Filed: January 16, 2004
    Date of Patent: January 3, 2006
    Assignee: ETP Electron Multipliers Pty Ltd
    Inventors: Richard Stresau, Kevin Hunter, Wayne Sheils, Peter Raffin, Yair Benari