Patents Assigned to Everlight USA, Inc.
  • Patent number: 6585782
    Abstract: Reactive dye mixtures comprising a black or navy reactive dye and a reactive disazo dye. The reactive dye mixtures of the present invention are suitable for exhaust dyeing, printing, continuous dyeing or discharge printing of a blended or interwoven fabric of cellulose fibres or cellulose nylon blends. The compounds of the present invention display good level dyeing properties, good build up and excellent low nylon cross-dyeing.
    Type: Grant
    Filed: February 27, 2001
    Date of Patent: July 1, 2003
    Assignee: Everlight USA, Inc.
    Inventors: Huei Ching Huang, Mao Cheng Hsu, Bao-Kun Lai, Ya-Chi Tseng
  • Patent number: 6541635
    Abstract: The present invention discloses a method for producing angiotensin converting enzyme inhibitor of the following formula (I) and pharmaceutically acceptable salts thereof, in which a compound of the following formula (II), wherein R and R1 are defined as in the specification, is subjected to a de-protective reaction of silyl group in non-aqueous medium. This reaction is easily carried out only in the non-aqueous medium, so that by-product is minimized and the yield is high.
    Type: Grant
    Filed: June 25, 2002
    Date of Patent: April 1, 2003
    Assignee: Everlight USA, Inc.
    Inventors: Mong-Jong Tien, Yu-Liang Liu
  • Patent number: 6500246
    Abstract: The present invention provides an ink-jet ink composition which includes (a) at least one water-soluble dye; (b) at least one low vapor-pressure solvent; (c) a nonionic non-amphoteric surfactant; (d) a fluoric surfactant; and (e) balanced water. The ink-jet ink composition of the present invention is suitable for thermal ink-jet printers.
    Type: Grant
    Filed: January 5, 2001
    Date of Patent: December 31, 2002
    Assignee: Everlight USA, Inc.
    Inventors: Hong-Chang Huang, Jen-Fang Lin
  • Patent number: 6441115
    Abstract: The present invention provides a photosensitive polymer containing the following structure unit of formula (II): Wherein R is hydrogen or C1-C4 alkyl group; R′ is C1-C4 alkyl group; n is an integer of 2, 3, 4, 5 or 6. This photosensitive polymer also relates to chemical amplified photoresist composition. This chemical amplified photoresist composition can be applied to general lithography processes, especially in 193 nm lithography and the patterns formed from the photoresist composition exhibit excellent resolution and photosensitivity.
    Type: Grant
    Filed: June 30, 2000
    Date of Patent: August 27, 2002
    Assignee: Everlight USA, Inc.
    Inventors: Shang-Wern Chang, Yen-Cheng Li, Shang-Ho Lin
  • Patent number: 6440857
    Abstract: The present invention discloses a two-step CMP method and employed polishing compositions. In the first step, a first polishing slurry is provided to selectively polish the Al-alloy layer. Next, a second polishing slurry is provided to selectively polish the barrier layer. Accordingly, undesired surface non-planarity after the CMP process, such as metal dishing and corrosion of dielectric layers with complicated pattern geometry, can be avoided, and thus the planarization of wafer surfaces can be achieved.
    Type: Grant
    Filed: January 25, 2001
    Date of Patent: August 27, 2002
    Assignee: Everlight USA, Inc.
    Inventors: Yuan-Hsin Li, Ming-Shin Tsai, Chien-Hua Chiu, Bau-Tong Dai, Ting-Chen Hu
  • Patent number: 6407220
    Abstract: The present invention provides reactive formazan dyestuffs of the general formula (I), Wherein A, B, D, Me, Q, R, and Z are defined in this document. The dyes according to the invention are distinguished by high fixation and a very good build-up. They are distinguished also by a low substantivity and a high exhaustion, and they have fiber-reactive properties and are very highly suitable for dyeing and printing of materials containing either cellulose fibers.
    Type: Grant
    Filed: December 14, 2001
    Date of Patent: June 18, 2002
    Assignee: Everlight USA, Inc.
    Inventors: Huei Ching Huang, Wen-Jang Chen
  • Patent number: 6403817
    Abstract: The present invention discloses a method for preparing a prostaglandin E-type compound, in which prostaglandin F-type compound is used as an initiator to generate novel derivative of prostaglandin F-type compound through a silylation reaction, and eventually a prostaglandin E-type compound is obtained through an oxidation and a desilylation reaction.
    Type: Grant
    Filed: February 26, 2001
    Date of Patent: June 11, 2002
    Assignee: Everlight USA, Inc.
    Inventors: Chi-Hsiang Yao, Rung-Tian Suen, Yu-Liang Liu
  • Patent number: 6376700
    Abstract: An alicyclic compound of the formula (1) is disclosed: wherein R1 and R2 each independently is a hydroxyl group, a C1-8 hydroxyalkyl group, or a C3-8 hydroxycycloalkyl group; R3, R4 and R5 each independently is a hydrogen, a C1-8 hydroxyalkyl group, a C1-6 carboxylic acid or a C3-8 carboxylic acid ester; k is an integer of 0, 1, 2, 3, 4, 5 or 6. The compound of the formula (1) can be applied to dissolution inhibitors for preparing positive photoresist composition.
    Type: Grant
    Filed: June 30, 2000
    Date of Patent: April 23, 2002
    Assignee: Everlight USA, Inc.
    Inventors: Shang-Wern Chang, Yen-Cheng Li, Shang-Ho Lin, Wen-Chieh Wang
  • Patent number: 6329514
    Abstract: A fiber reactive dyestuff of the following formula (I) wherein the definition of D, and Z the same meaning as given in the description. The fiber reactive dyestuff of the present invention is suitable for dyeing and printing on cellulose fiber or fiber materials containing cellulose. Dyed material with various excellent properties in dyed color can be obtained, showing especially outstanding performance in the property of wash fastness.
    Type: Grant
    Filed: February 8, 2000
    Date of Patent: December 11, 2001
    Assignee: Everlight USA, Inc.
    Inventors: Huei Ching Huang, Keh Loong Chen, Mao Cheng Hsu, Ta Chung Yin
  • Patent number: 6316159
    Abstract: A chemical amplified photoresist composition comprising a photosensitive polymer containing the following structure unit of formula (II): Wherein R is hydrogen or C1-C4 alkyl group; R′ is C1-C4 alkyl group; n is an integer of 2, 3, 4, 5 or 6. This chemical amplified photoresist composition can be applied to general lithography processes, especially in 193 nm lithography and the patterns formed from the photoresist exhibit excellent resolution and photosensitivity.
    Type: Grant
    Filed: June 30, 2000
    Date of Patent: November 13, 2001
    Assignee: Everlight USA, Inc.
    Inventors: Shang-Wern Chang, Yen-Cheng Li, Shang-Ho Lin
  • Patent number: 6313338
    Abstract: A process for preparing N-[1-(S)-ethoxycarbonyl-3-phenylpropyl]-L-alanine N-carboxyanhydride of the following formula (I), is to react N-[1-(S)-ethyoxy carbonyl-3-phenylpropyl]-L-alanine with XCOOR, wherein X is halogen atom, R is C1-C6 alkyl, to obtain a N-alkoxycarbonyl compound, then reacting with an acyl group activation reagent, finally contact with water. The compound of formula (I) is a key intermediate of ACE inhibitors.
    Type: Grant
    Filed: May 14, 2001
    Date of Patent: November 6, 2001
    Assignee: Everlight USA, Inc.
    Inventors: Chong-Ming Chen, Yu-Liang Liu, Ya-Chieh Chao, Chien-Huang Wu
  • Patent number: 6294309
    Abstract: A positive photoresist composition comprising a polymer, a photoactived agent and an dissolution inhibitor represented by the following formula (1): wherein R1, R2, R3, R4, R5 and k are defined in the specification. The photoresist composition of the present invention is useful as a chemically amplified type resist when exposed to deep UV light from a KrF and ArF excimer laser.
    Type: Grant
    Filed: June 30, 2000
    Date of Patent: September 25, 2001
    Assignee: Everlight USA, Inc.
    Inventors: Shang-Wern Chang, Yen-Cheng Li, Shang-Ho Lin, Wen-Chieh Wang
  • Patent number: 6271412
    Abstract: This invention provides a compound of the formula (I): wherein R is hydrogen or C1-C4 alkyl group; R′ is C1-C4 alkyl group; n is an integer of 2, 3, 4, 5 or 6. The compound of formula (I) can be polymerized or copolymerized to form a photosensitive polymer or copolymer.
    Type: Grant
    Filed: June 30, 2000
    Date of Patent: August 7, 2001
    Assignee: Everlight USA, Inc.
    Inventors: Shang-Wern Chang, Yen-Cheng Li, Shang-Ho Lin
  • Patent number: 6265131
    Abstract: A positive photoresist composition comprising a polymer, a photoactived agent and an dissolution inhibitor represented by the following formula (1): wherein R1 and R2 each independently is a hydroxyl group, a C1-8 hydroxyalkyl group, or a C3-8 hydroxycycloalkyl group; R3, R4 and R5 each independently is a hydrogen, a C1-8 hydroxyalkyl group, a C1-6 carboxylic acid or a C3-8 carboxylic acid ester; k is an integer of 0, 1, 2, 3, 4, 5 or 6. The photoresist composition has high transparency to deep UV light and is capable of forming good fine patterns, roughness and high sensitivity, thus being useful as a chemically amplified type resist when exposed to deep UV light from an KrF and ArF excimer laser.
    Type: Grant
    Filed: April 3, 2000
    Date of Patent: July 24, 2001
    Assignee: Everlight USA. Inc.
    Inventors: Shang-Wern Chang, Yen-Cheng Li, Shang-Ho Lin, Wen-Chieh Wang
  • Patent number: 6262274
    Abstract: A process for preparing N-[1-(S)-ethoxycarbonyl-3-phenylpropyl]-L-alanine N-carboxyanhydride of the following formula (I), is to react N-[1 -(S)-ethyoxy carbonyl-3-phenylpropyl]-L-alanine with XCOOR, wherein X is halogen atom, R is C1-C6 alkyl, to obtain a N-alkoxycarbonyl compound, then reacting with an acyl group activation reagent, finally contact with water. The compound of formula (I) is a key intermediate of ACE inhibitors.
    Type: Grant
    Filed: October 13, 2000
    Date of Patent: July 17, 2001
    Assignee: Everlight USA, Inc.
    Inventors: Chong-Ming Chen, Yu-Liang Liu, Ya-Chieh Chao, Chien-Huang Wu
  • Patent number: 6258966
    Abstract: A chiral ligand of the formula (II) or formula (II′), was synthesized. The chiral ligand (II) or formula (II′) can chelate to metals to form a catalytic complex to catalyze the addition of trimethylsilyl cyanide to aldehydes to give optically active cyanohydrin, individually.
    Type: Grant
    Filed: October 13, 1999
    Date of Patent: July 10, 2001
    Assignee: Everlight USA, Inc.
    Inventors: Biing-Jiun Uang, Chun-Tzu Yang
  • Patent number: 6222067
    Abstract: A compound of the following formula (I): wherein R1 is hydrogen or C1-7 acyl, R2 is C1-3 alkylene, n is 0 or 1. Novel dyestuff intermediates of formula (I) compound of the present invention can be used to synthesis many kinds of dyestuffs. Also disclosed is a process for the preparation of compound of formula (I).
    Type: Grant
    Filed: February 8, 2000
    Date of Patent: April 24, 2001
    Assignee: Everlight USA, Inc.
    Inventors: Keh-Loong Chen, Ta-Chung Yin
  • Patent number: 6203581
    Abstract: A yellow reactive dye composition which includes two different yellow reactive dyes is disclosed. The yellow reactive dye composition disclosed here is a reactive dye composition with good stability, build-up, light fastness and wet fastness. The yellow reactive dye composition is suitable for the natural and regenerated cellulose fibers in exhaust dyeing, printing and continous dyeing.
    Type: Grant
    Filed: November 12, 1999
    Date of Patent: March 20, 2001
    Assignee: Everlight USA, Inc.
    Inventors: Bao-Kun Lai, Jung-Fang Yeh
  • Patent number: 6171349
    Abstract: A reactive dye composition comprising (a) at least a black or navy reactive dye with good color fastness to laundering-oxidative bleach response; and (b) at least a red, orange, yellow or other shade of reactive azo dye. The dye composition of the present invention is suitable for use in dyeing fiber materials. It has good property in build-up, wash fastness, wash-off, and levelness, especially performing excellently in the properties of good color fastness to laundering-oxidative bleach response.
    Type: Grant
    Filed: July 2, 1999
    Date of Patent: January 9, 2001
    Assignee: Everlight USA, Inc.
    Inventors: Bao-Kun Lai, Der-Chin Song
  • Patent number: 6127537
    Abstract: A method for the preparation of 3-amino-1,2-propandiol derivatives of the formula (I) ##STR1## by reacting a compound of the formula (II) ##STR2## with RNH.sub.2, wherein R and R.sub.1 have the same meaning as given in the description. The formula (I) derivatives are .beta.-blockers used for treating hypertension.
    Type: Grant
    Filed: December 10, 1999
    Date of Patent: October 3, 2000
    Assignee: Everlight USA, Inc.
    Inventors: Biing-Jiun Uang, Jia-Wen Chang