Abstract: In a treatment liquid supply system that supplies treatment liquid used for coating industrial objects for film formation including a semiconductor substrate, a display substrate, a glass and the like, a nozzle connected to a treatment liquid tank vacuum-sucks and injects the treatment liquid from the treatment liquid tank due to a negative pressure occurring in the nozzle, wherein supply control of a small flow amount of the treatment liquid to the nozzle can be performed due to a difference pressure between pressure in the treatment liquid tank and the negative pressure occurring in the nozzle.
Abstract: A wrapping member for wrapping a glass substrate to be used in production of a FPD such as a liquid crystal display and a plasma display and a method of transferring a glass substrate for FPD, in which the wrapping member for wrapping either one or both of the surfaces of the glass substrate for FPD before transfer is made of a water-soluble film material dissolved in water, so that preprocessing of each of the glass substrates in the production line of the FPD may be simplified and so that the outer shape of a package formed by packing the glass substrates in a transfer box and a lid for closing the transfer box is reduced to an extent enabling a plurality of the glass substrates to be transferred at a high efficiency.
Abstract: In a treatment liquid supply system that supplies treatment liquid used for coating industrial objects for film formation including a semiconductor substrate, a display substrate, a glass and the like, a nozzle connected to a treatment liquid tank vacuum-sucks and injects the treatment liquid from the treatment liquid tank due to a negative pressure occurring in the nozzle, wherein supply control of a small flow amount of the treatment liquid to the nozzle can be performed due to a difference pressure between pressure in the treatment liquid tank and the negative pressure occurring in the nozzle.
Abstract: In a treatment liquid supply system that supplies treatment liquid used for coating industrial objects for film formation including a semiconductor substrate, a display substrate, a glass and the like, a nozzle is connected to a treatment liquid tank and the nozzle vacuum-sucks and injects the treatment liquid from the treatment liquid tank due to a negative pressure occurring in the nozzle, wherein supply control of a small flow amount of the treatment liquid to the nozzle can be performed due to a difference pressure between pressure in the treatment liquid tank and the negative pressure occurring in the nozzle.