Abstract: A chip module, including a radio frequency integrated circuit (RFIC) chip and a package, and a method and system for designing the module. Chip and package design are performed so the RF front end (FE) is split between chip and package. The chip includes an amplifier with a first differential port and the package includes a passive device and matching network with a second differential port connected to the first differential port. The second differential port is power matched to the first differential port using complex power matching based on port voltage reflection coefficients in order to achieve improved performance (i.e., a peak power transfer across a bandwidth as opposed to at only one frequency). The power matching process can result in a chip power requirement reduction that allows for device size scaling. Thus, designing the chip and designing the package is iteratively repeated in a chip-package co-optimization process.

Abstract: Disclosed is a threshold voltage-programmable field effect transistor-based (e.g., a ferro-electric field effect transistor (FeFET)-based) memory circuit employing source-line and/or bit-line-applied variable programming assist voltages. For single-bit data storage in a FeFET, decremental programming assist voltages are selectively applied by a voltage driver to the source-line and/or the bit-line connected to a FeFET during repeat programming processes when previous attempts at programming have failed. For multi-bit data storage in a FeFET, different programming assist voltages are associated with different multi-bit data values and at least one specific programming assist voltage is applied by a voltage driver to the source-line and/or the bit-line connected to a selected FeFET during a programming process to achieve storage of a specific multi-bit data value. Optionally, multiple FeFETs in the same row can be currently programmed with different multi-bit data values.

Abstract: Disclosed is a reconfigurable complementary metal oxide semiconductor (CMOS) device with multiple operating modes (e.g., frequency multiplication mode, etc.). The device includes an N-type field effect transistor (NFET) and a P-type field effect transistor (PFET), which are threshold voltage-programmable, which are connected in parallel, and which have electrically connected gates. The threshold voltages of the NFET and PFET can be concurrently programmed and the operating mode of the device can be set depending upon the specific combination of threshold voltages achieved in the NFET and PFET. Optionally, the threshold voltages of the NFET and PFET can be concurrently reprogrammed to switch the operating mode. Such a device is relatively small and achieves frequency multiplication and other functions with minimal power consumption. Also disclosed are methods for forming the device and for reconfiguring the device (i.e., for concurrently programming the NFET and PFET to set or switch operating modes).

Abstract: Disclosed is a threshold voltage-programmable field effect transistor-based (e.g., a ferro-electric field effect transistor (FeFET)-based) memory circuit employing source-line and/or bit-line-applied variable programming assist voltages. For single-bit data storage in a FeFET, decremental programming assist voltages are selectively applied by a voltage driver to the source-line and/or the bit-line connected to a FeFET during repeat programming processes when previous attempts at programming have failed. For multi-bit data storage in a FeFET, different programming assist voltages are associated with different multi-bit data values and at least one specific programming assist voltage is applied by a voltage driver to the source-line and/or the bit-line connected to a selected FeFET during a programming process to achieve storage of a specific multi-bit data value. Optionally, multiple FeFETs in the same row can be currently programmed with different multi-bit data values.

Abstract: The present disclosure relates to semiconductor structures and, more particularly, to floating-gate devices and methods of manufacture. The structure includes: a gate structure comprising a gate dielectric material and a gate electrode; and a vertically stacked capacitor over and in electrical connection to the gate electrode.

Abstract: Embodiments of the disclosure provide an integrated circuit (IC) structure. The IC structure may include a first metal layer on a substrate, and a second metal layer on the substrate that is horizontally separated from the first metal layer. A dielectric material may include a first portion on the first metal layer, and having a first upper surface, a second portion on the second metal layer, and having a second upper surface, and a third portion on the substrate between the first metal layer and the second metal layer. The third portion of the dielectric material includes a third upper surface above the first upper surface of the first portion and the second upper surface of the second portion of the dielectric material.

Abstract: The present disclosure relates to semiconductor structures and, more particularly, to co-integrated high voltage and medium voltage devices with defect prevention structures and methods of manufacture. The structure includes: a semiconductor on insulator (SOI) region and a bulk region integrated in a single substrate; at least one active device in the bulk region; at least one active device in the SOI region; and a defect prevention structure bordering the SOI region.

Abstract: A chip module, including a radio frequency integrated circuit (RFIC) chip and a package, and a method and system for designing the module. Chip and package design are performed so the RF front end (FE) is split between chip and package. The chip includes an amplifier with a first differential port and the package includes a passive device and matching network with a second differential port connected to the first differential port. The second differential port is power matched to the first differential port using complex power matching based on port voltage reflection coefficients in order to achieve improved performance (i.e., a peak power transfer across a bandwidth as opposed to at only one frequency). The power matching process can result in a chip power requirement reduction that allows for device size scaling. Thus, designing the chip and designing the package is iteratively repeated in a chip-package co-optimization process.

Abstract: The present disclosure relates to semiconductor structures and, more particularly, to ferroelectric based transistors and methods of manufacture. The ferroelectric based transistor includes: a semiconductor-on-insulator substrate including a semiconductor material, a buried insulator layer under the semiconductor material and a substrate material under the semiconductor channel material; a ferroelectric capacitor under the buried insulator layer and which includes a bottom electrode, a top electrode and a ferroelectric material between the bottom electrode and the top electrode; a gate stack over the semiconductor material; a first terminal contact connecting to the bottom electrode of the ferroelectric capacitor; and a second terminal contact connecting to the top electrode of the ferroelectric capacitor.

Abstract: Disclosed is a reconfigurable complementary metal oxide semiconductor (CMOS) device with multiple operating modes (e.g., frequency multiplication mode, etc.). The device includes an N-type field effect transistor (NFET) and a P-type field effect transistor (PFET), which are threshold voltage-programmable, which are connected in parallel, and which have electrically connected gates. The threshold voltages of the NFET and PFET can be concurrently programmed and the operating mode of the device can be set depending upon the specific combination of threshold voltages achieved in the NFET and PFET. Optionally, the threshold voltages of the NFET and PFET can be concurrently reprogrammed to switch the operating mode. Such a device is relatively small and achieves frequency multiplication and other functions with minimal power consumption. Also disclosed are methods for forming the device and for reconfiguring the device (i.e., for concurrently programming the NFET and PFET to set or switch operating modes).

Abstract: Disclosed are a semiconductor structure, which includes a charge-trapping sidewall spacer-type non-volatile memory (CTSS-NVM) device, and a method of forming the structure. The CTSS-NVM device includes asymmetric first and second sidewall spacers on opposing sidewalls of a gate structure above a channel region in a semiconductor substrate. The second sidewall spacer is wider than the first and includes multiple dielectric spacer layers, one of which is made of a charge-trapping material, is separated from the substrate (e.g., by a thin oxide layer), and has a bottom end closest to the substrate with a maximum width that is sufficient to achieve charge-trapping for proper CTSS-NVM device operation. The CTSS-NVM device further includes an epitaxial semiconductor layer for a source/drain region on the semiconductor substrate adjacent to the first sidewall spacer and a metal silicide layer for a Schottky barrier on the semiconductor substrate adjacent to the second sidewall spacer.

Abstract: The present disclosure relates to semiconductor structures and, more particularly, to co-integrated high voltage and medium voltage devices and methods of manufacture. The structure includes a substrate having a semiconductor on insulator (SOI) region and a bulk region; and a first device formed on the bulk region, the first device having a first gate dielectric layer and a second gate dielectric layer surrounding the first dielectric layer, and a thickness of the first gate dielectric layer and the second gate dielectric layer being greater than a thickness of an insulator layer of the SOI region.

Abstract: Disclosed are a semiconductor structure, which includes a charge-trapping sidewall spacer-type non-volatile memory (CTSS-NVM) device, and a method of forming the structure. The CTSS-NVM device includes asymmetric first and second sidewall spacers on opposing sidewalls of a gate structure above a channel region in a semiconductor substrate. The second sidewall spacer is wider than the first and includes multiple dielectric spacer layers, one of which is made of a charge-trapping material, is separated from the substrate (e.g., by a thin oxide layer), and has a bottom end closest to the substrate with a maximum width that is sufficient to achieve charge-trapping for proper CTSS-NVM device operation. The CTSS-NVM device further includes an epitaxial semiconductor layer for a source/drain region on the semiconductor substrate adjacent to the first sidewall spacer and a metal silicide layer for a Schottky barrier on the semiconductor substrate adjacent to the second sidewall spacer.

Abstract: Structures including field-effect transistors and methods of forming a structure including field-effect transistors. A first field-effect transistor includes a first source/drain terminal and a second source/drain terminal, and a second field-effect transistor includes a third source/drain terminal and a fourth source/drain terminal. The first source/drain terminal and the second source/drain terminal each include a fully-silicided section located at and above a top surface of a semiconductor layer. The third source/drain terminal and the fourth source/drain terminal each include a partially-silicided section located over the top surface of the semiconductor layer.

Abstract: The disclosure provides integrated circuit (IC) layouts and methods to form the same. An IC layout may include two standard cells, with a well contact cell laterally between them. The well contact cell may include a single semiconductor region having the first doping type, an active bridge region within the single semiconductor region, extending continuously from the first active region of the first standard cell to the third active region of the second standard cell. A doped tap region within the single semiconductor region is laterally separated from the active bridge region. The doped tap region is laterally aligned with the second active region and the fourth active region.

Abstract: In sophisticated semiconductor devices, manufacturing techniques and etch masks may be formed on the basis of a mask layer stack which comprises an additional mask layer, which may receive an opening on the basis of lithography techniques. Thereafter, the width of the mask opening may be reduced by applying a selective deposition or growth process, which thus results in a highly uniform and well-controllable adjustment of the target width of the etch mask prior to performing the actual patterning process, for instance for forming sophisticated contact openings, via openings and the like.

Abstract: In sophisticated semiconductor devices, a shallow drain and source concentration profile may be obtained for active regions having a pronounced surface topography by performing tilted implantation steps upon incorporating the drain and source dopant species. In this manner, a metal silicide may be reliably embedded in the drain and source regions.

Abstract: When forming sophisticated P-channel transistors, the metal silicide agglomeration in a germanium-containing strain-inducing semiconductor alloy may be avoided or at least significantly reduced by incorporating a carbon and/or nitrogen species in a highly controllable manner. In some illustrative embodiments, the carbon species or nitrogen species is incorporated during the epitaxial growth process so as to form a surface layer of the strain-inducing semiconductor alloy with a desired nitrogen and/or carbon concentration and with a desired thickness without unduly affecting any other device areas.