Patents Assigned to GTAT IP HOLDING LLC
  • Patent number: 10544517
    Abstract: The present invention relates to a method of growing a silicon ingot comprising a dopant material having a segregation coefficient of k, wherein the concentration of the dopant is axially substantially uniform throughout the ingot. The method comprises the steps of providing a crucible having an inner growth zone in fluid communication with an outer feed zone, and the inner growth zone and the outer feed zone have cross-sectional areas that are can be used to determine conditions for maintaining dopant uniformity for the specific dopant material used. A crystalline growth system for growing at least one uniformly doped silicon ingot is also disclosed.
    Type: Grant
    Filed: May 4, 2012
    Date of Patent: January 28, 2020
    Assignee: GTAT IP HOLDING LLC.
    Inventor: Bayard K. Johnson
  • Patent number: 10202705
    Abstract: A Czochralski growth system is disclosed comprising a crucible, a silicon delivery system comprising a feeder having a delivery point overhanging the crucible and delivering a controllable amount of silicon into the crucible, and at least one doping mechanism controllably delivering at least one dopant material to the feeder. The system can comprise two or more doping mechanisms each loaded with a different dopant material and can therefore be used to prepare silicon ingots having multiple dopants. The resulting ingots have substantially constant dopant concentrations along their axes. Also disclosed is a method of Czochralski growth of at least one silicon ingot comprising at least one dopant material, which is preferably a continuous Czochralski method.
    Type: Grant
    Filed: April 13, 2012
    Date of Patent: February 12, 2019
    Assignee: GTAT IP HOLDING LLC
    Inventors: Bayard K. Johnson, John P. Deluca, William L. Luter
  • Patent number: 10202704
    Abstract: A Czochralski growth system is described comprising a growth chamber, a feed port, and a feed chamber comprising a container for feedstock and a feeder. The feed port is disposed in at least one side wall of the growth chamber, and the feed chamber is attached to the growth chamber at the feed port. The feeder is insertable into the growth chamber through the feed port and supplies the feedstock into the growth chamber. Preferably this system can be used for producing silicon ingots using a continuous Czochralski method.
    Type: Grant
    Filed: October 15, 2012
    Date of Patent: February 12, 2019
    Assignee: GTAT IP HOLDING LLC
    Inventors: William L. Luter, Verlin A. Lauher, Dick S. Williams, Howard P. Zinschlag, Neil Middendorf, David J. Dubiel
  • Patent number: 9745666
    Abstract: The present invention relates to a Czochralski growth apparatus and method, preferably a continuous Czochralski growth apparatus and method, in which solid feedstock provided from a delivery system during ingot growth is substantially prevented from entering the growth zone of a crucible. In this way, an ingot having exceptionally consistent properties is produced.
    Type: Grant
    Filed: September 9, 2013
    Date of Patent: August 29, 2017
    Assignee: GTAT IP HOLDING LLC
    Inventors: William L. Luter, Weidong Huang