Abstract: The present invention relates to a method for manufacturing silicon articles for a plasma processing apparatus. The present invention provides a method for manufacturing silicon articles, comprising: preparing a silicon ingot; forming a hollow silicon cylinder and a silicon core cylinder having a diameter less than that of the silicon ingot by coring the silicon ingot; forming a silicon annular plate having a central opening by cutting the hollow silicon cylinder and forming a silicon electrode plate by cutting the silicon core cylinder; and forming a silicon ring by processing the silicon annular plate and forming a silicon electrode by processing the silicon electrode plate. According to the present invention, a hollow silicon cylinder and a silicon core cylinder are manufactured by coring a cylindrical silicon ingot before the silicon ingot is sliced.