Patents Assigned to Heliovoit Corporation
  • Patent number: 6720239
    Abstract: Systems and methods are described for synthesis of films, coatings or layers using precursor exerted pressure containment. A method includes exerting a pressure between a first precursor layer that is coupled to a first substrate and a second precursor layer that is coupled to a second substrate; forming a composition layer; and moving the first substrate relative to the second substrate, wherein the composition layer remains coupled to the second substrate.
    Type: Grant
    Filed: July 17, 2002
    Date of Patent: April 13, 2004
    Assignee: Heliovoit Corporation
    Inventor: Billy J. Stanbery