Patents Assigned to Hitachi, Ltd. and Hitachi ULSI Systems Co., Ltd.
  • Publication number: 20040079996
    Abstract: The number of design processes for fabricating semiconductor devices can be reduced by parallel connection of a plurality of unit bipolar transistors Qu that are completely electrically isolated from each other in a semiconductor layer of an SOI substrate 1 to form a bipolar transistor having a large current capacity.
    Type: Application
    Filed: October 21, 2003
    Publication date: April 29, 2004
    Applicant: Hitachi, Ltd. and Hitachi ULSI Systems Co., Ltd.
    Inventors: Yoichi Tamaki, Takayuki Iwasaki, Kousuke Tsuji, Chiyoshi Kamada
  • Publication number: 20030153127
    Abstract: Techniques are provided for preventing occurrence of damage to the top surface of a semiconductor chip at the time of die bonding the semiconductor chip by use of a contact collet. A protection tape is pasted to the top surface of the semiconductor chip before die bonding of the semiconductor chip is executed by pressing the back surface (underside) of the semiconductor chip sucked and securely held by the contact collect against respective chip-mounting regions of a multi-wiring board. The contact collect is, for example, substantially cylindrical in outside shape, and a bottom part (suction head) thereof is made of a soft synthetic rubber, and so forth. The protection tape pasted to pasted to the top surface of the semiconductor chip can prevent the top surface of the semiconductor chip from coming in direct contact with the contact collet even at the time of vacuum suction by pressing the suction head of the contact collect against the top surface of the semiconductor chip.
    Type: Application
    Filed: January 15, 2003
    Publication date: August 14, 2003
    Applicant: Hitachi, Ltd. Hitachi ULSI Systems Co., Ltd.
    Inventors: Takashi Wada, Kazunari Suzuki, Chuichi Miyazaki, Toshihiro Shiotsuki, Tomoko Higashino
  • Publication number: 20030141905
    Abstract: The present invention is directed to simplify a circuit for fixing an output logic of a logic gate while suppressing a subthreshold current. A logic circuit has an n-channel type first transistor capable of interrupting power supply to a logic gate in accordance with an input control signal, and a p-channel type second transistor capable of fixing an output node of the logic gate to a high level interlockingly with the power supply interrupting operation by the first transistor, and a threshold of the first transistor is set to be higher than that of a transistor as a component of the logic gate. Means for interrupting the power supply to the logic gate is realized by the first transistor, and means for fixing an output node of the logic gate to the high level is realized by the second transistor, thereby simplifying the circuit for fixing the output logic of the logic gate while suppressing a subthreshold current.
    Type: Application
    Filed: January 16, 2003
    Publication date: July 31, 2003
    Applicant: Hitachi, Ltd. and Hitachi ULSI Systems Co.,Ltd.
    Inventors: Yoshikazu Saitou, Kenichi Osada
  • Publication number: 20030142928
    Abstract: The present invention provides a module for optical transmitter formed as an opto-electronic integrated circuit (OEIC) for reducing the heat generated at a driver circuit for modulator and stabilizing the thermal fluctuation in an optical modulator.
    Type: Application
    Filed: November 22, 2002
    Publication date: July 31, 2003
    Applicant: Hitachi, Ltd and Hitachi ULSI Systems Co., Ltd.
    Inventors: Koji Hirata, Masataka Shirai, Tomoyoshi Mishima
  • Publication number: 20030012052
    Abstract: A method for settling threshold voltages of word lines on a predetermined level in an erasing processing of a non-volatile semiconductor memory device so as to speed up the erasing processing. A word latch circuit is provided for each word line and the threshold voltage of each memory cell is managed for each word line in a selected memory block. Each word latch circuit is shared by a plurality of word lines so as to reduce the required chip area. A rewriting voltage is set for each finished non-volatile memory and the voltage information is stored in the boot area of the non-volatile memory, so that the voltage is recognized by the system each time the system is powered.
    Type: Application
    Filed: August 20, 2002
    Publication date: January 16, 2003
    Applicant: Hitachi, Ltd. and Hitachi ULSI Systems Co., Ltd.
    Inventors: Nozomu Matsuzaki, Kazuyoshi Shiba, Yasuhiro Taniguchi, Toshihiro Tanaka, Yutaka Shinagawa
  • Publication number: 20020199056
    Abstract: A non-volatile memory, an SRAM, a DRAM and a control circuit are module-formed into a single packaged. The control circuit assigns addresses to the SRAM and addresses to the DRAM and data necessary to be held for a long period of time is saved in the SRAM. Two chips of DRAM are mapped to the same address space and refreshed alternately. The plural chips are arranged such that they are mutually laminated, and they are wired by means of a BGA or inter-chip bonding.
    Type: Application
    Filed: June 7, 2002
    Publication date: December 26, 2002
    Applicant: Hitachi, Ltd. and Hitachi ULSI Systems Co., Ltd.
    Inventors: Kazushige Ayukawa, Seiji Miura, Tetsuya Iwamura, Kouichi Hoshi, Yoshikazu Saitou
  • Publication number: 20020182847
    Abstract: A layer comprising a second metal silicide as a major constituent element or a layer comprising a second metal as a major constituent element is formed simultaneously by one single chemical vapor deposition process to the bottom surface of two out of there groups of openings etched in a dielectric film on a substrate. A surface comprising silicon as a major constituent element is exposed at each bottom (“through holes or local interconnection holes”) of the first group of openings, a surface comprising a first metal silicide as a major constituent element is exposed at each bottom of the second group of openings, and a surface comprising a first metal as a major constituent element is exposed at each bottom of the third group of openings. The manufacturing method provides low contact resistance and sufficiently small junction leakage current from a diffusion layer in connection with plugs or local interconnections, even if the etched area of the openings are of different depths, shapes, or sizes.
    Type: Application
    Filed: July 18, 2002
    Publication date: December 5, 2002
    Applicant: Hitachi, Ltd. And Hitachi ULSI Systems Co., Ltd.
    Inventors: Natsuki Yokoyama, Masakazu Kawano
  • Publication number: 20020024062
    Abstract: A semiconductor integrated circuit having therein a plurality of memories, realizing an improved yield by efficiently repairing a defective bit in a memory. This semiconductor integrated circuit has: a plurality of circuit blocks (RAM macro cells) each having an identification code coincidence detecting circuit for determining whether an input identification code coincides with a self identification code or not and a reception data latch and performing an operation according to latched data; a setting circuit capable of setting the identification code and information corresponding to the identification code and serially outputting the set information; and a control circuit capable of sequentially reading the setting information from the setting circuit, converting the setting information to parallel data, and transferring the parallel data to the plurality of circuit blocks.
    Type: Application
    Filed: June 22, 2001
    Publication date: February 28, 2002
    Applicant: Hitachi, Ltd. Hitachi ULSI Systems Co., Ltd.
    Inventors: Shigeru Nakahara, Hideki Hayashi, Takeshi Suzuki, Keiichi Higeta
  • Publication number: 20020014686
    Abstract: A first semiconductor chip (2) is bonded and secured to a second semiconductor chip (3) with a back surface of the first semiconductor chip (2) and a circuit forming surface (3X) of the second semiconductor chip (3) facing each other, and an inner portion of a support lead (6) is bonded and secured to the circuit forming surface (3X) of the second semiconductor chip (3). Such a configuration makes it possible to provide a semiconductor with a reduced thickness.
    Type: Application
    Filed: July 27, 2001
    Publication date: February 7, 2002
    Applicant: Hitachi, Ltd. and Hitachi ULSI Systems Co., Ltd.
    Inventors: Kouichi Kanemoto, Masachika Masuda, Tamaki Wada, Michiaki Sugiyama, Mikako Kimura