Patents Assigned to Hoechst Celanese Corporation
  • Metal ion reduction in top anti-reflective coatings for photoresisis
    Patent number: 5624789
    Abstract: The present invention provides methods for producing top anti-reflective coating compositions having a very low level of metal ions, utilizing specially treated ion exchange resins. A method is also provided for producing semiconductor devices using such top anti-reflective coating compositions.
    Type: Grant
    Filed: June 2, 1995
    Date of Patent: April 29, 1997
    Assignee: Hoechst Celanese Corporation
    Inventors: M. Dalil Rahman, Dana L. Durham
  • Chiralrhenium catalysts and processes for preparing the same
    Patent number: 5618958
    Abstract: A novel catalyst comprising the formula:LRE(O)nwhereinL is selected from the group consisting of(a) (R.sub.1)(AL)wherein R.sub.1 is an alkyl side chain containing at least one carbon-rhenium covalent bond, andAL is a molecule having C.sub.2 to C.sub.50, and has at least one hetero atom selected from the group consisting of N, O, S, and P wherein there is at least one hetero-rhenium dative bond, and has at least one chiral center. and(b) R.sub.AL is a straight or branched chain alkyl or arylalkyl group containing C.sub.2 to C.sub.50 and containing at least one heteroatom selected from the group consisting of N, O, S, and P, with the proviso that said alkyl group contains at least one carbon-rhenium covalent bond and at least one hetero-rhenium dative bond, and has at least one chiral center:and n is an integer which is 2, 3, 4, or 5 and which has utility in areas such as epoxidation of olefins.
    Type: Grant
    Filed: August 8, 1996
    Date of Patent: April 8, 1997
    Assignee: Hoechst Celanese Corporation
    Inventors: Charles E. Tucker, Kenneth G. Davenport
  • Method of preparing cyclic formals
    Patent number: 5616736
    Abstract: A method of preparing cyclic formals which contain only small amounts of by-product impurities and unreacted starting materials, and which are ready to be purified.In preparing a cyclic formal by reacting alkylene glycol with formaldehyde in the presence of a catalyst, a reaction vessel provided with a vapor-liquid contact zone at the upper part thereof is used. Vapor generated from the reaction mixture and containing a cyclic formal goes up and passes through the vapor-liquid contact zone to be condensed. While part of the condensate is returned to the vapor-liquid contact zone, the remainder of the condensate is taken out as a distillate.
    Type: Grant
    Filed: February 4, 1994
    Date of Patent: April 1, 1997
    Assignee: Hoechst Celanese Corporation
    Inventor: Hubert H. Thigpen
  • Synthesis of and hydroformylation with fluoro-substituted bidentate phosphine ligands
    Patent number: 5616785
    Abstract: Hydroformylation of alkenes to aldehydes in the presence of a rhodium complex catalyst is improved by the addition of a novel bidentate ligand of the formula ##STR1## wherein R.sub.1, R.sub.2, R.sub.1.sup.' are organic radicals selected from alicyclic, aliphatic and aromatic groups of which at least one is preferably substituted with at least one electronegative moiety and the methylene groups are present at the trans-2,3 positions on the norbornane moiety. The invention also provides a novel method for producing the bidentate ligand and novel intermediate phosphine oxide and phosphinous acid compounds.
    Type: Grant
    Filed: April 10, 1996
    Date of Patent: April 1, 1997
    Assignee: Hoechst Celanese Corporation
    Inventors: Jerry D. Unruh, Brigitte E. Segmuller, Gabriel R. Chapa, Kent E. Pryor
  • Process for producing liquid crystal polymer
    Patent number: 5616680
    Abstract: A process for producing an anisotropic melt-phase forming polymer involving separate acetylation and polymerization steps, which utilizes controlled vapor phase reflux to reduce reactant loss and assist in maintaining the stoichiometry of the process.
    Type: Grant
    Filed: November 22, 1995
    Date of Patent: April 1, 1997
    Assignee: Hoechst Celanese Corporation
    Inventor: H. Clay Linstid, III
  • Synthetic fiber dyeing process
    Patent number: 5613986
    Abstract: The invention is a method of producing a melt spun synthetic polymeric filament which has the superior deep dyeability thereof. The method includes the steps of application of a dye dispersed in water to the filaments during the drawing of the filament, and heat setting the surface dyed filaments to uniformly diffuse the dye throughout the total cross section of the filaments.
    Type: Grant
    Filed: May 22, 1996
    Date of Patent: March 25, 1997
    Assignee: Hoechst Celanese Corporation
    Inventors: William E. Bessey, Joseph DaSilva
  • Using a Lewis base to control molecular weight of novolak resins
    Patent number: 5614349
    Abstract: The present invention provides methods for producing water insoluble, aqueous alkali soluble novolak resins having a precise and consistent molecular weight, by adjusting the concentration of Lewis base. A method is also provided for producing photoresist composition from such novolak resins and for producing semiconductor devices using such photoresist compositions.
    Type: Grant
    Filed: December 29, 1992
    Date of Patent: March 25, 1997
    Assignee: Hoechst Celanese Corporation
    Inventors: M. Dalil Rahman, Daniel P. Aubin, Dana L. Durham, Ralph R. Dammel
  • Metal ion reduction in novolak resins solution in PGMEA by chelating ion exchange resin
    Patent number: 5614352
    Abstract: The present invention provides methods for producing water insoluble, aqueous alkali soluble novolak resins having a very low level of metal ions, utilizing treated chelated ion exchange resins to make the neutral ammonium salt or acid form. A method is also provided for producing photoresist composition having a very low level of metal ions from such novolak resins and for producing semiconductor devices using such photoresist compositions.
    Type: Grant
    Filed: December 30, 1994
    Date of Patent: March 25, 1997
    Assignee: Hoechst Celanese Corporation
    Inventor: M. Dalil Rahman
  • Positive photoresist composition comprising a mixed ester of trishydroxyphenyl ethane and a mixed ester of trihydroxybenzophenone
    Patent number: 5612164
    Abstract: A photosensitizer comprising a trishydroxyphenylethane 80/20 to 50/50 2,1,5-/2,1,4-diazonaphthoquinone sulfonate, and a trishydroxybenzophenone 0/100 to 20/80 2,1,5-/2,1,4-diazonaphthoquinone sulfate, and a photoresist composition containing such photosensitizer, the photosensitizer being present in the photoresist composition in an amount sufficient to uniformly photosensitize the photoresist composition; and a water insoluble, aqueous alkali soluble novolak resin, the novolak resin being present in the photoresist composition in an amount sufficient to form a substantially uniform photoresist composition.
    Type: Grant
    Filed: February 9, 1995
    Date of Patent: March 18, 1997
    Assignee: Hoechst Celanese Corporation
    Inventors: Anthony Canize, Stanley A. Ficner, Ping-Hung Lu, Walter Spiess
  • Process for dye removal
    Patent number: 5611934
    Abstract: A process for dye removal from effluent is disclosed which includes treating the effluent with a reducing agent, adjusting the pH to a selected value in the range of 2-7, treating the effluent with a particular charge neutralization mixture, adjusting the pH a second time and subjecting the mixture to a flocculating process with selected chemicals.
    Type: Grant
    Filed: December 18, 1995
    Date of Patent: March 18, 1997
    Assignee: Hoechst Celanese Corporation
    Inventors: Paul W. Shepperd, III, Larry W. Becker, Robert J. Cundiff
  • Coating composition for a subbing layer on a polyester film for light sensitive material
    Patent number: 5607777
    Abstract: The present invention discloses a subbing coating composition for polyester films comprising:I polymer A having attached to its backbonecarboxyl groups and/orgroups which form carboxyl groups upon hydrolysis anda polymer B having attached to its backbone --SO.sub.3 X and/or --PO.sub.3 XY groups, whereinX and Y are identical or different and denote an alkali metal, ammonium or hydrogenorII a polymer A' having attached to its backbonecarboxyl groups and/or groups which form carboxyl groups upon hydrolysis, and--SO.sub.3 X and/or --PO.sub.3 XY groups, wherein X and Y are identical or different and denote an alkali metal, ammonium or hydrogenandIII an organic compound C having at least two free hydroxy groups, wherein the coating composition does not comprise addition polymerizable compounds.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: March 4, 1997
    Assignee: Hoechst Celanese Corporation
    Inventors: James J. Krejci, John M. Heberger, Cathy R. Moore, Robin M. Donald
  • Method for reduced sulfur dioxide formation in refiner bleaching
    Patent number: 5607547
    Abstract: A method for eliminating the formation of sulfur dioxide in a refiner bleaching process is disclosed wherein a selected amount of a carbonate is added to the refiner contents at approximately the same time that sodium dithionite is added.
    Type: Grant
    Filed: May 19, 1995
    Date of Patent: March 4, 1997
    Assignee: Hoechst Celanese Corporation
    Inventors: Jeffrey Nye, Martin G. Fairbank
  • Fibrous structures containing particulate and including microfiber web
    Patent number: 5605746
    Abstract: A fibrous structure comprising a composite fiber matrix loaded with immobilized functional particulate and including void spaces forming tortuous flow paths, is provided. The particulate is beneficially distributed in the interior of the fibrous structure in three dimensions and fused to a low melting component of the composite fibers without substantially reducing the available surface area of the particulate. A filtration structure of a composite staple having a nylon sheath and a polyester core, with activated carbon particles bonded to the fiber matrix, and including a microfiber web located within the structure, is specifically disclosed.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: February 25, 1997
    Assignee: Hoechst Celanese Corporation
    Inventors: H. Gunter Groeger, George A. Serad, Clinton D. Felton
  • Trimethylolpropane color improvement
    Patent number: 5603835
    Abstract: This invention relates to a process for improving the color of trimethylolpropane (TMP) by extracting color-causing impurities generated in the reaction to produce TMP. This improved color TMP is characterized by a reduced acid wash color and phthalic anhydride color--color measurement tests commonly used in the industry for assessing product quality and suitability of the TMP for certain color sensitive end-uses.
    Type: Grant
    Filed: July 21, 1994
    Date of Patent: February 18, 1997
    Assignee: Hoechst Celanese Corporation
    Inventors: Hung-Cheun Cheung, Rodolfo W. Laurel, George C. Seaman
  • Use of 4-substituted 2-butanones to prepare nabumetone
    Patent number: 5600009
    Abstract: The palladium-catalyzed coupling of aryl and vinyl halides with vinylic compounds is disclosed. A preferred embodiment relating to the palladium catalyzed coupling of 4-substituted and 6-substituted-2-methoxynaphthalene to form nabumetone is also disclosed. The beauty of this novel reaction is that methylvinylketone, normally employed by the art directly as-is for the preparation of nabumetone, is formed in situ. We have discovered a mechanism to take advantage of the in situ formation of methylvinylketone, thus avoiding the use of expensive, toxic, and unstable methyl vinyl ketone feed. This reaction may be employed for a variety of pharmaceutically active and non-pharmaceutical compounds.
    Type: Grant
    Filed: April 9, 1996
    Date of Patent: February 4, 1997
    Assignee: Hoechst Celanese Corporation
    Inventors: John F. Fritch, Mohammad Aslam, Dora E. Rios, Joel C. Smith
  • Acid-modified polybenzimidazole fuel cell elements
    Patent number: 5599639
    Abstract: An electrolytic membrane for use in fuel cell includes a fluid-imbibed acidified polybenzimidazole resin. The resin is alkyl or aryl sulfonated or alkyl or aryl phosphonated, preferably with a degree of substitution of from 15 to about 60 per cent.
    Type: Grant
    Filed: October 27, 1995
    Date of Patent: February 4, 1997
    Assignee: Hoechst Celanese Corporation
    Inventors: Michael J. Sansone, Frank J. Onorato, Naoya Ogata
  • Recovery of acetic acid from dilute aqueous streams formed during a carbonylation process
    Patent number: 5599976
    Abstract: A method is provided to improve the quality of recycle of certain residues by modifying the separation of alkanes and alkane-like materials and carbonyl-containing impurities from the recycle during the manufacture of acetic acid by the carbonylation of methanol. The improvement comprises partitioning the residues by the addition of water obtained from aqueous streams containing up to 50 wt. % acetic acid and which have been treated in a catalytic distillation unit to react the acetic acid with methanol to form recyclable methyl acetate and water and wherein the water is separated from the organics by distillation.
    Type: Grant
    Filed: April 7, 1995
    Date of Patent: February 4, 1997
    Assignee: Hoechst Celanese Corporation
    Inventors: Mark O. Scates, Steven E. Parker, Jennifer B. Lacy, Russell K. Gibbs
  • Superabsorbent polymers and products therefrom
    Patent number: 5597873
    Abstract: A surface crosslinked superabsorbent polymer composition, a process for its preparation and articles made therefrom wherein said superabsorbent composition is prepared by surface crosslinking the polymerization product of a carboxyl or carboxylate group containing monomer with a crosslinker solution comprising water, C.sub.3 -C.sub.6 diol and a crosslinking compound having at least two functional reactive groups with the carboxyl or carboxylate groups of said polymerization product.
    Type: Grant
    Filed: May 25, 1995
    Date of Patent: January 28, 1997
    Assignee: Hoechst Celanese Corporation
    Inventors: Douglas R. Chambers, William G-J Chiang, Guy T. Woodrum
  • Metal ion reduction in novolak resins and photoresists
    Patent number: 5594098
    Abstract: The present invention provides methods for producing water insoluble, aqueous alkali soluble novolak resins having a very low level of metal ions, utilizing treated ion exchange resins. A method is also provided for producing photoresist composition having a very low level of metal ions from such novolak resins and for producing semiconductor devices using such photoresist compositions.
    Type: Grant
    Filed: July 11, 1994
    Date of Patent: January 14, 1997
    Assignee: Hoechst Celanese Corporation
    Inventors: M. Dalil Rahman, Dana L. Durham
  • Process for preparing hyperbranched polymers
    Patent number: 5591809
    Abstract: The present invention provides novel one-step processes for preparing highly branched macromolecule polymers that have highly controlled molecular architectures. The process comprises the reaction of a branching monomer such as a substituted phenyl compound having the formula: ##STR1## wherein R.sub.1, R.sub.2, and R.sub.3 are defined herein, with a core monomer and an end-capping monomer, such as a phenolic ester, for a sufficient period of time and at a sufficient temperature to directly produce the highly branched polymer, in a single processing step.
    Type: Grant
    Filed: August 18, 1995
    Date of Patent: January 7, 1997
    Assignee: Hoechst Celanese Corporation
    Inventors: Richard Vicari, Kathleen N. Juneau, Carl D. Murphy