Patents Assigned to Horiba Stec, Co., Ltd.
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Patent number: 10718677Abstract: The pressure sensor comprises the diaphragm, an electrode body, a housing, an inlet pipe, and a thermal buffer member. The diaphragm includes a pressure receiving surface configured to receive a pressure of a measured target fluid. The electrode body includes an electrode surface facing a rear surface of the pressure receiving surface with a gap interposed therebetween. The housing supports the diaphragm so as to form a measuring chamber by surrounding the pressure receiving surface. The inlet pipe is coupled to the housing and configured to guide the measured target fluid into the measuring chamber. The thermal buffer member is disposed on the inlet pipe and has a predetermined heat capacity. Accordingly, the diaphragm is unlikely to bend due to a rapid temperature change in a fluid guiding pipe disposed a fluid line.Type: GrantFiled: March 28, 2018Date of Patent: July 21, 2020Assignee: HORIBA STEC, Co., Ltd.Inventors: Sotaro Kishida, Junya Nakai, Takehisa Hataita, Akira Kuwahara
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Patent number: 10718050Abstract: Provided is a concentration control apparatus that, without reducing maintainability, can shorten piping to improve responsiveness. The concentration control apparatus is one adapted to introduce carrier gas into a storage tank storing a material, and control the concentration of material gas that is led out of the storage tank as mixed gas with the carrier gas and results from vaporization of the material. Also, the concentration control apparatus includes: a first unit that controls the flow rate of the carrier gas to be introduced into the storage tank; and a second unit that detects the concentration of the material gas led out of the storage tank.Type: GrantFiled: September 18, 2018Date of Patent: July 21, 2020Assignee: HORIBA STEC, CO., LTDInventors: Toru Shimizu, Masakazu Minami
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Patent number: 10705545Abstract: A fluid control device is adapted to include: a valve provided in a flow path through which a fluid flows; a pressure sensor provided upstream of the valve; a flow rate sensor provided on downstream of the pressure sensor; a set flow rate generator that outputs a set flow rate corresponding to the measured pressure on the basis of a pressure-flow rate map; a valve control part that controls the opening level of the valve so that the deviation between the set flow rate and a measured flow rate decreases; and the set flow rate generator that outputs the set flow rate corresponding to the measured pressure to the valve control part. In addition, the set flow rate generator is adapted to control the set flow rate so that the measured pressure has a value up to a limit pressure.Type: GrantFiled: May 15, 2019Date of Patent: July 7, 2020Assignee: HORIBA STEC, Co., Ltd.Inventors: Kotaro Takijiri, Yusuke Kanamaru, Emiko Nakagawa, Yuki Tanaka
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Patent number: 10704936Abstract: To provide a flow rate characteristic function identification method, flow rate sensor, and flow rate characteristic function identification program that can set a flow rate characteristic function reflecting not only the type or shape of a fluid resistance but also the effects of states such as an attachment state of the fluid resistance, and calculate a flow rate with higher accuracy. An actual flow rate characteristic function, which is a flow rate characteristic function when an actual fluid resistance is provided in a flow path, is identified on the basis of multiple flow rate characteristic functions including a first reference flow rate characteristic function and a second reference flow rate characteristic function, and predetermined weighting.Type: GrantFiled: December 11, 2017Date of Patent: July 7, 2020Assignee: HORIBA STEC, Co., Ltd.Inventors: Daniel Thomas Mudd, William Wylie White, Michael Kramer, Tadahiro Yasuda
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Patent number: 10705546Abstract: In order to provide a flow rate control apparatus capable of reducing noise while reducing delay, the flow rate control apparatus includes: a fluid resistor provided in a flow path; a downstream valve provided downstream of the fluid resistor; and a downstream pressure sensor provided between the fluid resistor and the downstream valve. The apparatus calculates a resistor flow rate through the fluid resistor; the time change amount of the downstream pressure; on the basis of the resistor flow rate, the difference between the resistor flow rate and the time change amount of the downstream side pressure, and a weighting factor, calculates a weighted average to estimate a valve flow rate through the downstream valve; and, on the basis of the deviation between a set flow rate and the valve flow rate, controls the downstream side valve, in which the weighting factor is configured to be changeable.Type: GrantFiled: July 24, 2019Date of Patent: July 7, 2020Assignee: HORIBA STEC, Co., Ltd.Inventors: Tsai Wei Tseng, Tomohiro Yoshida, Kentaro Nagai
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Patent number: 10705544Abstract: In order to restrain generation of a peak in the measured flow rate, a fluid control unit measures a flow rate of a fluid in a channel and outputs a signal indicating a valve operation amount of a fluid control valve obtained based on a deviation between a preset flow rate and a measured flow rate and a control coefficient, and the control coefficient for a stable state and the control coefficient for a transitional state are so set to moderate fluctuation of the valve operation amount to the deviation more in the transitional state than in the stable state. At or shortly after a timing when the stable state is switched to the transitional state, a signal is output that indicates an operation amount for a switching time calculated based on each of the operation amounts output at a plurality of timings in the stable state.Type: GrantFiled: March 2, 2018Date of Patent: July 7, 2020Assignee: HORIBA STEC, Co., Ltd.Inventors: Kazuhiro Matsuura, Masao Yamaguchi, Kentaro Nagai
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Publication number: 20200182776Abstract: In order to provide an absorption analyzer capable of directly measuring an analysis target gas flowing into or produced in a vessel such as a chamber and preventing a measurement error due to moisture condensation, the absorption analyzer is adapted to include: a light emission module that is attached covering a first opening of the vessel into which the analysis target gas flows or in which the analysis target gas is produced and emits light into the vessel; and a light detection module that detects the light emitted from the light emission module and passing through the vessel. In addition, the light emission module is adapted to include: a base flange that is attached around the first opening on an outer surface of the vessel; a window material whose outer surface is tilted at a predetermined angle; a seal member; and a pressing body.Type: ApplicationFiled: November 20, 2019Publication date: June 11, 2020Applicant: HORIBA STEC, CO., LTD.Inventors: Miyako HADA, Daisuke HAYASHI
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Patent number: 10655220Abstract: The present invention makes it easy to control the amount of material gas led out of a tank. Accordingly, carrier gas is introduced into a tank containing a material and together with the carrier gas, from the tank, material gas produced by vaporization of the material is led out. A control part controls the flow rate of the carrier gas so that a concentration index value obtained by measuring mixed gas led out of the tank and indicating the concentration of the material gas in the mixed gas comes close to a predetermined target concentration index value. In addition, the control part controls the flow rate of the carrier gas to change at a predetermined change rate, and then controls the flow rate of the carrier gas on the basis of the deviation between the concentration index value and the target concentration index value.Type: GrantFiled: March 5, 2018Date of Patent: May 19, 2020Assignee: HORIBA STEC, Co., Ltd.Inventors: Yuhei Sakaguchi, Toru Shimizu, Masakazu Minami, Daisuke Hayashi
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Patent number: 10612131Abstract: A vaporization system without a pressure sensor including: a vaporizer that vaporizes the liquid material; a supply amount controller that controls the supply amount of the liquid material to the vaporizer; a flow rate regulation valve that regulates the flow rate of vaporized gas produced by the vaporizer; a flow rate sensor that measures the flow rate of the vaporized gas; and a valve control part that outputs a drive signal to the flow rate regulation valve to control a valve opening level so that a measured flow rate measured by the flow rate sensor becomes equal to a predetermined set flow rate, is adapted to acquire a drive signal value that is a value indicated by the drive signal; and output a control signal to the supply amount controller on the basis of the drive signal value and control the supply of the liquid material.Type: GrantFiled: October 30, 2018Date of Patent: April 7, 2020Assignee: HORIBA STEC, Co., Ltd.Inventors: Akihiro Taguchi, Ryoichi Kyoyama
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Patent number: 10605671Abstract: To provide a chromatograph data processing device and the like that can estimate and calculate a retention index or a retention time that would be measured by performing programmed-temperature analysis with any desired rate of temperature increase from known retention indices measured by programmed-temperature analysis, a receiving unit that receives a rate of temperature increase, an RI-r relationship storage unit that stores an RI-r relationship, the RI-r relationship being a relationship between a retention index and a rate of temperature increase and being identified based on a plurality of retention indices with respect to different rates of temperature increase and the corresponding rates of temperature increase, and a retention index calculation unit that calculates an estimated retention index based on the RI-r relationship, the estimated retention index being a retention index corresponding to the received rate of temperature increase received by the receiving unit.Type: GrantFiled: December 9, 2014Date of Patent: March 31, 2020Assignee: HORIBA STEC, CO., LTD.Inventors: Tsuneaki Maeda, Nanako Sasaki
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Patent number: 10545514Abstract: Provided is a flow rate control apparatus that includes a flow restrictor, a downstream side valve, a downstream side pressure sensor, first and second flow rate calculators, and a flow rate controller. The downstream side valve is disposed downstream of the flow restrictor in a flow path. The downstream side pressure sensor measures a pressure between the flow restrictor and the downstream side valve. The first flow rate calculator calculates a first flow rate of fluid flowing through the flow restrictor. The second flow rate calculator calculates a second flow rate of fluid flowing out of the downstream side valve on the basis of the first flow rate and the temporal variation in downstream side pressure measured by the downstream side pressure sensor. The flow rate controller controls the downstream side valve on the basis of a set flow rate and the second flow rate.Type: GrantFiled: July 30, 2018Date of Patent: January 28, 2020Assignee: HORIBA STEC, Co., Ltd.Inventors: Tadahiro Yasuda, Bill White, Patrick Lowery, Maximilian Gundlach, Ryan Owens
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Patent number: 10538843Abstract: A vaporizer includes a main body including a first body and a second body. The first body has an upper portion narrowing in a direction of a height of the first body and the second body has a cavity in which the first body is positioned. A mixing chamber is between the first and second bodies. The second body includes a carrier gas injection path connected to a carrier gas inlet formed in an upper portion of the mixing chamber. The carrier gas injection path carries a carrier gas. A source material injection path is connected to a source material inlet formed in the mixing chamber. The source material injection path carries a liquid source material. A discharge is connected to an outlet formed in a lower portion of the mixing chamber. A mixed fluid including the carrier gas and the liquid source material is discharged through the discharge path.Type: GrantFiled: December 20, 2016Date of Patent: January 21, 2020Assignees: SAMSUNG ELECTRONICS CO., LTD., HORIBA STEC, CO., LTD.Inventors: Hyun-Sik Sim, Jung-Suk Oh, Jae-Seok Kim, Ho-Gon Kim, Jun-Won Lee, Hyuk-Yul Choi, Hyung-Ho Kim, Sang-Jin Choi, Heok-Jae Lee, Dong-Ok Shin, Jang-Hyoun Youm, Ichiro Nishikawa, Masanori Terasaka, Masashi Hamada, Tae-Hoon Lee
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Patent number: 10514313Abstract: In order to eliminate influence of a noise voltage applied to a diaphragm of a capacitance type sensor, the capacitance type sensor includes: a detection capacitor formed of a diaphragm and a fixed electrode, the diaphragm being connected to a frame and deformed by receiving an external force; and a fixed capacitor connected in series with the detection capacitor, so that it is intended to detect a divided voltage applied to the detection capacitor by applying a voltage to the detection capacitor and the fixed capacitor, and further includes: a noise voltage generating part connected to the frame and adapted to generate a noise voltage caused in the frame; a noise voltage adding part adapted to add the noise voltage to the voltage applied to each of the capacitors; and a noise voltage subtraction part adapted to subtract the added noise voltage from a divided voltage of the detection capacitor.Type: GrantFiled: December 13, 2017Date of Patent: December 24, 2019Assignee: HORIBA STEC, Co., Ltd.Inventor: Hiroshi Takakura
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Patent number: 10503179Abstract: A flow rate control apparatus is provided which enables high speed response particularly in a transient response state, such as when a target flow rate falls. The flow rate control apparatus includes: a valve provided with a position sensor to measure an opening degree and disposed in a flow channel; a flow rate sensor disposed upstream of the valve and provided with a restrictor; a first pressure sensor disposed downstream of the restrictor and disposed upstream of the valve; a second pressure sensor disposed downstream of the valve; a storage section to store a characteristic map indicating a relationship between at least the opening degree of the valve, a differential pressure before and after the valve, and a flow rate of a fluid passing through the flow channel; and a valve control section to control the valve so that the flow rate reaches an accepted target flow rate.Type: GrantFiled: December 5, 2017Date of Patent: December 10, 2019Assignee: HORIBA STEC, Co., Ltd.Inventors: Shigeyuki Hayashi, Kentaro Nagai, Masao Yamaguchi
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Patent number: 10480669Abstract: In order to suppress changes in opening level and flow rate associated with the thermal expansion of a resin member caused by a temperature change, a valve device that displaces a valve body by applying drive voltage to an actuator is adapted to include: a position sensor that detects the position of the valve body; a voltage regulator that regulates the drive voltage on the basis of a detected position by the position sensor; and a temperature sensor that detects the temperature of the valve body. In addition, the seating surface of the valve body is adapted to be formed of a resin member, and the voltage regulator is adapted to change the setting value of the drive voltage depending on detected temperature by the temperature sensor.Type: GrantFiled: November 30, 2017Date of Patent: November 19, 2019Assignee: HORIBA STEC, Co., Ltd.Inventor: Atsushi Ieki
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Patent number: 10480670Abstract: In order to provide a fluid control valve less likely to cause contamination, and a fluid control apparatus using the fluid control valve, at least any one of a valve seat member and a valve body member is one including a base body made of metal; and a resin layer that covers the surface of the base body to form a valve seat surface or a seating surface, in which the resin layer is directly chemically bonded to the base body.Type: GrantFiled: April 6, 2017Date of Patent: November 19, 2019Assignee: HORIBA STEC, Co., Ltd.Inventors: Shigeyuki Hayashi, Kazuya Shakudo
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Publication number: 20190333737Abstract: In order to uniform a two-dimensional concentration distribution or two-dimensional temperature distribution in a chamber at high speed and with high accuracy without relying on operator's experience, the present invention is adapted to include: a chamber that contains substrates and is also supplied with material gas; a laser emitting mechanism that emits laser beams from multiple points around the chamber toward incident windows formed in the peripheral wall of the chamber; a laser detecting mechanism that detects respective laser beams emitted from the multiple points, passing through the chamber, and emitted through emission windows formed in the peripheral wall of the chamber; and a control device that acquires beam intensity signals of the respective laser beams detected by the laser detecting mechanism, as well as on the basis of the beam intensity signals, calculates the two-dimensional concentration distribution or two-dimensional temperature distribution of the material gas in the chamber.Type: ApplicationFiled: April 25, 2019Publication date: October 31, 2019Applicant: HORIBA STEC, Co., Ltd.Inventors: Daisuke HAYASHI, Masakazu MINAMI
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Patent number: 10391417Abstract: In order to eliminate liquid accumulation occurring between a gas-liquid mixing part and a vaporization part to stably perform liquid feeding to the vaporization part and vaporization in the vaporization part, a liquid material vaporization apparatus includes: a gas-liquid mixing part adapted to mix a liquid material and gas to produce a gas-liquid mixture; and a vaporization part adapted to heat the gas-liquid mixture to vaporize the liquid material. In addition, the gas-liquid mixing part has a gas-liquid mixture lead-out pipe for leading out the gas-liquid mixture, the vaporization part has a heating flow path HS for heating the gas-liquid mixture, and a lead-out port of the gas-liquid mixture lead-out pipe is arranged in the heating flow path HS.Type: GrantFiled: December 7, 2016Date of Patent: August 27, 2019Assignee: HORIBA STEC, Co., Ltd.Inventors: Taketoshi Ito, Masaki Inoue
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Publication number: 20190242818Abstract: Obtained is an absorbance meter capable of, when measuring high-temperature sample gas, without increasing the distance from a light source part to a light receiving part, protecting the light source part and the light receiving part from the heat of the sample gas and keeping measurement accuracy high. A sample accommodation part including an accommodation space for accommodating the sample gas, the light source part for radiating light into the accommodation space, the light receiving part for receiving light exiting from inside the accommodation space, a first insulation part disposed adjacent to the light source part side of the sample accommodation part, a second insulation part disposed adjacent to the light receiving part side of the sample accommodation part, a first cooling part disposed adjacent to the first insulation part, and a second cooling part disposed adjacent to the second insulation part are provided.Type: ApplicationFiled: September 14, 2017Publication date: August 8, 2019Applicant: HORIBA STEC, CO., LTD.Inventors: Hiroshi NISHIZATO, Masakazu MINAMI, Yuhei SAKAGUCHI
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Patent number: 10371674Abstract: In order to, in a chromatograph sampler, regulate the pressure of a sample fluid filled in a constant volume tube to be as constant as possible and ensure the reproducibility of measurement, the chromatograph sampler is configured to provide a bypass line between a sample introduction line and a sample discharge line in parallel with the constant volume tube, and when filling the sample fluid in the constant volume tube, flow the sample fluid also through the bypass line in parallel.Type: GrantFiled: April 11, 2017Date of Patent: August 6, 2019Assignee: HORIBA STEC, CO., LTD.Inventors: Tomohiro Sasaki, Tomotaka Yoshimura, Shoji Narukami, Tsuneaki Maeda