Patents Assigned to Huhtamaki Forchheim Zweigniederiassung der Huhtamaki Deutschland GmbH & Co. KG
  • METHOD OF PRODUCING THIN LAYERS OF A SILICON, AND THIN SILICON
    Publication number: 20100178824
    Abstract: The invention relates to a method for producing thin layers (3) of a silicon that can be subjected to plastic treatment, whereby the silicon layer (3) is extruded, and to the thin silicon layer produced by said method.
    Type: Application
    Filed: June 18, 2007
    Publication date: July 15, 2010
    Applicant: Huhtamaki Forchheim Zweigniederiassung der Huhtamaki Deutschland GmbH & Co. KG
    Inventors: Kurt Stark, Werner Schmidt, Walter Gunter