Abstract: The present disclosure is directed towards systems and methods for the treatment of wastewater. A system in accordance with one particular embodiment may include a front end system including at least one resin tank configured to contain an ion exchange resin configured to target a particular metal. The at least one resin tank may be configured to receive an output from an oxidation reactor configured to receive a flow of wastewater from a wastewater producing process. The system may further include a central processing system configured to receive a saturated resin tank from the at least one resin tank. The central processing system may further include a vacuum filter band system configured to receive a slurry from the saturated resin tank and to provide a cascading resin rinse to the slurry. The central processing system may further include a repetitive stripping system configured to receive a metal-filled purification unit from a metal specific purification system.

Abstract: The present disclosure is directed towards systems and methods for the treatment of wastewater. A system in accordance with one particular embodiment may include an oxidation reactor configured to receive a flow of wastewater from a wastewater producing process. The oxidation reactor may be further configured to oxidize a chemical associated with the flow of wastewater with an oxidation agent. The oxidation reactor may include at least one reaction member configured to pressurize at least a portion of the oxidation reactor. The system may further include at least one resin tank configured to contain an ion exchange resin configured to target a particular metal, the at least one resin tank configured to receive an output from the oxidation reactor. Numerous other embodiments are also within the scope of the present disclosure.

Abstract: The present disclosure is directed towards systems and methods for the treatment of wastewater. A system in accordance with one particular embodiment may include a vacuum filter band system configured to receive a saturated resin tank from a front end system, the vacuum filter band system configured to generate a slurry from the saturated resin tank and to provide a cascading resin rinse to the slurry. The system may further include a repetitive stripping system configured to receive a metal-filled purification unit from a metal specific purification system. The repetitive stripping system may be further configured to sequentially apply the contents of a plurality of acid tanks to the metal-filled purification unit to generate a metal salt. Numerous other embodiments are also within the scope of the present disclosure.

Abstract: The present disclosure is directed towards systems and methods for the treatment of wastewater. A system in accordance with one particular embodiment may include a vacuum filter band system configured to receive a saturated ion exchange resin tank and to apply a water rinse to the resin to generate a resin slurry. The vacuum filter band system may further include a vacuum filter band configured to receive the resin slurry. The vacuum filter band system may also be configured to generate a mixed metal solution. The system may further include a metal specific purification system including a plurality of purification units configured to receive a continuous flow of the mixed metal solution, each of the purification units configured to target a particular metal from the mixed metal solution. Numerous other embodiments are also within the scope of the present disclosure.