Abstract: An internal supply voltage generating circuit includes a clock comparator configured to compare a first clock signal having clock information corresponding to a level of a reference voltage with a second clock signal having clock information corresponding to a level of an internal supply voltage, a control signal generator configured to generate a driving control voltage having a voltage level corresponding to an output signal of the clock comparator; and a driver configured to drive a terminal of the internal supply voltage in response to the driving control voltage.

Abstract: A method of forming a hardmask pattern over a semiconductor device semiconductor device includes forming a first hardmask layer over a semiconductor substrate. First and second structures are formed over the first hardmask layer, the first and second structures formed of the same material, the first and second structures defining a first pitch. First and second overcoats are formed over the first and second structures, respectively, the first and second overcoats being conformal to the first and second structures, respectively. The first and second overcoats define a space therebetween and are configured to expose an underlying layer. A filling layer is formed to fill the space defined between the first and second overcoats. The first and second overcoats are removed to provide the first structure, the second structure, and a third structure provided between the first and second structures, the first and third structures defining a second pitch, the second and third structures defining a third pitch.