Abstract: An analysis apparatus comprises: a moveable stage assembly; a sample holder on a top surface of the stage assembly; a first photon source and a first photon detector or detector array, the first photon source being configured to emit a first beam of photons that intercepts the surface of a sample at a first location on the sample and the first photon detector or detector array being configured to detect photons that are emitted from the first location; and a second photon source and a second photon detector or detector array, the second photon source being configured to emit a second beam of photons that intercepts the surface of the sample at a second location on the sample, the second location being spaced apart from the first location, and the second photon detector or detector array being configured to detect photons that are emitted from the second location.
Abstract: An analysis apparatus comprises: a moveable stage assembly; a sample holder on a top surface of the stage assembly; a first photon source and a first photon detector or detector array, the first photon source being configured to emit a first beam of photons that intercepts the surface of a sample at a first location on the sample and the first photon detector or detector array being configured to detect photons that are emitted from the first location; and a second photon source and a second photon detector or detector array, the second photon source being configured to emit a second beam of photons that intercepts the surface of the sample at a second location on the sample, the second location being spaced apart from the first location, and the second photon detector or detector array being configured to detect photons that are emitted from the second location.
Abstract: The invention relates to a method (S) for generating a plurality of cold-plasma jets at atmospheric pressure in order to treat a target (2), wherein said method includes the following steps: producing (S1) a primary cold-plasma jet (3) at atmospheric pressure using a plasma source (10); placing (S2) a substrate (20, 21, 30, 32, 34) near the target (2) to be treated, said substrate (20, 21, 30, 32, 34) including at least two through-holes; and passing (S3) the plasma through the through-holes (22) of the substrate (20) such as to generate at least two secondary cold-plasma jets (4) at atmospheric pressure.
Type:
Grant
Filed:
November 26, 2015
Date of Patent:
September 24, 2019
Assignees:
CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS), UNIVERSITE D'ORLEANS, INEL
Inventors:
Jean-Michel Pouvesle, Eric Robert, Sebastien Dozias, Michel Hugnot, Vanessa Sarron, Thibault Darny
Abstract: An X-ray gas detector for analyzing a material by studying X-ray diffraction. In order to minimize the parallax error without resorting to auxiliary electrodes, difficult to manufacture, a radial field in the whole gas space (40) is generated only by means of input electrodes (36) set to appropriate voltages and by means of lateral electrodes (44) also individually set to appropriate voltages. By modifying the voltages, it is also possible to move the center of the spheric equipotentials for permitting the analysis without parallax error of samples (20) placed at variable distances (D) from mthe input window (32) of the detector.
Type:
Grant
Filed:
April 27, 1989
Date of Patent:
September 4, 1990
Assignees:
Centre National de la Recherche Scientifique, Societe Inel
Inventors:
Vincent Comparat, Jean Ballon, Pierre Carrechio, Alain Pelissier