Abstract: According to various embodiments, a semiconductor device may include: at least one first contact pad on a front side of the semiconductor device; at least one second contact pad on the front side of the semiconductor device; a layer stack disposed at least partially over the at least one first contact pad, wherein the at least one second contact pad is at least partially free of the layer stack; wherein the layer stack includes at least an adhesion layer and a metallization layer; and wherein the metallization layer includes a metal alloy and wherein the adhesion layer is disposed between the metallization layer and the at least one first contact pad for adhering the metal alloy of the metallization layer to the at least one first contact pad.

Abstract: An electronic device includes a semiconductor chip including an electrode, a substrate element and a contact element connecting the electrode to the substrate element. The electronic device further includes an encapsulant configured to leave the contact element at least partially exposed such that a heatsink may be connected to the contact element.

Abstract: A semiconductor die includes a substrate, a first device region and a second device region. The first device region includes an epitaxial layer on the substrate and one or more semiconductor devices of a first type formed in the epitaxial layer of the first device region. The second device region is spaced apart from the first device region and includes an epitaxial layer on the substrate and one or more semiconductor devices of a second type formed in the epitaxial layer of the second device region. The epitaxial layer of the first device region is different than the epitaxial layer of the second device region so that the one or more semiconductor devices of the first type are formed in a different epitaxial layer than the one or more semiconductor devices of the second type.

Abstract: Crack sensors for semiconductor devices, semiconductor devices, methods of manufacturing semiconductor devices, and methods of testing semiconductor devices are disclosed. In one embodiment, a crack sensor includes a conductive structure disposed proximate a perimeter of an integrated circuit. The conductive structure is formed in at least one conductive material layer of the integrated circuit. The conductive structure includes a first end and a second end. A first terminal is coupled to the first end of the conductive structure, and a second terminal is coupled to the second end of the conductive structure.

Abstract: A drive circuit for a firing element of an occupant protection system comprises first and second supply potential terminals and first and second firing element terminals. A first semiconductor switching element is integrated in a first semiconductor body and has a first load terminal coupled to the first supply potential terminal and a second load terminal coupled to the first firing element terminal. A second semiconductor switching element is integrated in a second semiconductor body and has a first load terminal coupled to the second firing element terminal and a second load terminal coupled to the second supply potential terminal. The first and second semiconductor bodies are applied to a thermally conductive carrier element and commonly housed. A temperature detector is integrated in the second semiconductor body and provides an overtemperature signal at an output of the drive circuit upon detection of an overtemperature of the first semiconductor switching element.

Abstract: A method for producing a mask set for lithography including at least one mask, has a predetermined layout of structures which are provided for imaging into a common exposure plane and which are transferred to the masks as a basis. Strongly coupled structures that are so closely adjacent one another, at least in sections, that they are strongly coupled in the case of simultaneous imaging are distributed between at least two different masks of the mask set.

Abstract: A compensation component and a process for production thereof includes a semiconductor body having first and second electrodes, a drift zone disposed therebetween, and areas of a first conductivity type and a second conductivity type opposite the first conductivity type disposed in the drift zone. Higher doped zones of the first type are inlaid in a weaker doped environment of the second type closer to the first electrode and higher doped zones of the second type are inlaid in a weaker doped environment of the first type closer to the second electrode. The drift zone is complementary so that, in a direction between the electrodes, a more highly doped zone of the first type adjoins a more weakly doped environment of the first type, and a more weakly doped environment of the second type adjoins a more highly doped zone of the second type.

Abstract: The invention involves a semi-conductor component testing system, a process for semi-conductor components, as well as an assembly, more particularly a wafer with several semi-conductor components to be tested, whereby each semi-conductor component is allocated an individual identifying label, more particularly an identification-number, in order to perform the test—done individually for each semi-conductor component—on the respective semi-conductor component.

Abstract: An etch rate of a nitride liner layer is improved relative to an etch rate of a nitride cap layer. The nitride liner layer is located at an exposed portion of a substrate adjacent to a stacked structure also located atop the substrate. The nitride cap layer is located atop the stacked structure. An oxide spacer is formed along sidewalls of the stacked structure. The nitride liner layer is patterned and etched to form at least one opening therein to the substrate while the nitride cap layer remains substantially intact.

Abstract: A method for producing for a mask a mask layout which avoids aberrations in which a provisional auxiliary mask layout produced, in particular in accordance with a prescribed electrical circuit diagram is converted into the mask layout with the aid of an OPC method. At least two different OPC variants are used in the course of the OPC method by subdividing the original auxiliary mask layout into at least two layout areas and processing each of the layout areas in accordance with one of the at least two OPC variants.

Abstract: An optical transmitting and/or receiving arrangement including an optical element mounted in an intermediate space between a base plate and a lens. The lens is supported by a structure that is mounted on the base plate, and a carrier element mounted on the base plate and has an end portion extending through an opening formed in the structure and into the intermediate space. The end portion of the carrier element is positioned adjacent to the optical element, and includes electrical feed lines that are connected to the optical element by wires or bands. A transparent casting compound is then injected through the opening into the intermediate space.