Abstract: According to various embodiments, a workpiece planarization arrangement may include: a chuck including at least one portion configured to support one or more workpieces; and a planarization tool configured to planarize the at least one portion of the chuck and to planarize one or more workpieces on the at least one portion of the chuck; wherein the at least one portion of the chuck includes at least one of particles, pores and/or a polymer.
Type:
Grant
Filed:
March 1, 2017
Date of Patent:
February 5, 2019
Assignee:
Infineon Technologioes AG
Inventors:
Ingo Muri, Alexander Binter, Bernhard Goller, Christian Grindling