Patents Assigned to International Rectifier Corporation, Japan Ltd.
  • Patent number: 4170020
    Abstract: The invention discloses a gate controlled semiconductor device in which a gate electrode is substantially divided into many pieces. And the semiconductor device comprises a semiconductive element having at least one P-N junction formed by at least a pair of P-type diffusion regions and N-type diffusion regions, a cathode assembly including a metallic layer deposited on a cathode-emitter layer formed on a surface of said semiconductive element, an anode electrode assembly and gate electrode assemblies which includes a plural separated metallic layers provided around the cathode electrode assemblies of the cathode-emitter layer.
    Type: Grant
    Filed: April 4, 1977
    Date of Patent: October 2, 1979
    Assignees: Kabushiki Kaisha Meidensha, International Rectifier Corporation, Japan Ltd.
    Inventors: Tetsuro Sueoka, Hisao Udagawa