Patents Assigned to IONES CO., LTD.
  • Patent number: 11668011
    Abstract: A forming method of an yttrium oxide fluoride (YOF) coating film and a (YOF) coating film formed thereby are disclosed. The YOF coating film has no or extremely small pores therein and a nanostructure to increase light transmittance thereof, and has high hardness and high bonding strength and thus can protect a transparent window of a display device. The method for forming an YOF coating film involves the steps of: providing pretreated YOF powder having a particle diameter ranging from 0.1 to 12 ?m; receiving a transfer gas supplied from a transfer gas supply unit and receiving the pretreated YOF powder supplied from a powder supply unit to transfer the pretreated YOF powder in an aerosol state; and colliding/smashing (spraying) the pretreated YOF powder transferred in the aerosol state with/onto a substrate in a process chamber to form an YOF coating film on the substrate.
    Type: Grant
    Filed: November 26, 2019
    Date of Patent: June 6, 2023
    Assignee: IONES CO., LTD.
    Inventors: Jae Hyuk Park, Dae Gean Kim, Hye Won Seok, Byung Ki Kim
  • Patent number: 10982331
    Abstract: The present invention relates to a method for forming a ceramic coating having improved plasma resistance and a ceramic coating formed thereby. The present invention discloses the method for forming the ceramic coating having improved plasma resistance and the ceramic coating formed thereby, comprising the steps of: receiving, from a powder supply portion, a plurality of ceramic powders having a first powder particle size range, and transporting the powders using a transport gas; and forming a ceramic coating in which a plurality of first ceramic particles within a first coating particle size range and a plurality of second ceramic particles within a second coating particle size range, which is larger than the first coating particle size range, by causing the transported ceramic powders to collide with a substrate inside a process chamber, at the speed of 100 to 500 m/s so as to be pulverized.
    Type: Grant
    Filed: December 4, 2014
    Date of Patent: April 20, 2021
    Assignee: IONES CO., LTD.
    Inventors: Mun Ki Lee, Byung Ki Kim, Jae Hyuk Park, Dae Gean Kim, Myoung No Lee
  • Publication number: 20200095687
    Abstract: A forming method of an yttrium oxide fluoride (YOF) coating film and a (YOF) coating film formed thereby are disclosed. The YOF coating film has no or extremely small pores therein and a nanostructure to increase light transmittance thereof, and has high hardness and high bonding strength and thus can protect a transparent window of a display device. The method for forming an YOF coating film involves the steps of: providing pretreated YOF powder having a particle diameter ranging from 0.1 to 12 ?m; receiving a transfer gas supplied from a transfer gas supply unit and receiving the pretreated YOF powder supplied from a powder supply unit to transfer the pretreated YOF powder in an aerosol state; and colliding/smashing (spraying) the pretreated YOF powder transferred in the aerosol state with/onto a substrate in a process chamber to form an YOF coating film on the substrate.
    Type: Application
    Filed: November 26, 2019
    Publication date: March 26, 2020
    Applicant: IONES CO., LTD.
    Inventors: Jae Hyuk Park, Dae Gean Kim, Hye Won Seok, Byung Ki Kim
  • Patent number: 10590542
    Abstract: The present invention discloses the method for forming the coating having the composite coating particle size and the coating formed thereby, comprising the steps of: receiving, from a powder supply portion, a plurality of powders within a first powder particle size range, and transporting the powders using a transport gas; and forming a coating in which a plurality of first particles within a first coating particle size range and a plurality of second particles within a second coating particle size range, which is larger than the first coating particle size range, by causing the transported powders to collide with a substrate inside a process chamber at the speed of 100 to 500 m/s so as to be pulverized.
    Type: Grant
    Filed: December 4, 2014
    Date of Patent: March 17, 2020
    Assignee: IONES CO., LTD.
    Inventors: Mun Ki Lee, Byung Ki Kim, Jae Hyuk Park, Dae Gean Kim, Myoung No Lee