Patents Assigned to Japan Fine Coatings Co.,
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Patent number: 11697616Abstract: [Problem] To provide a radiation curable resin composition which is suitable as a primary material for optical fibers, while having a high curing rate by means of irradiation of radiation [Solution] A radiation polymerizable composition for forming an optical fiber primary coating layer, said composition containing: (A) a urethane oligomer containing a structure represented by formula (I) (in formula (I), R represents a vinyl group; and * represents a bonding hand); (B) one or more compounds selected from among (i) maleic acid anhydride, (ii) a compound represented by formula (II) (in formula (II), RI represents a single bond or an alkanediyl group having from 1 to 6 carbon atoms; and R2 represents a hydrogen atom, a hydroxy group or a specific group represented by formula (II-1) or formula (II-2)), and (iii) a compound represented by formula (III) (in formula (III), R5 represents an alkanediyl group having from 1 to 6 carbon atoms); and (C) a radiation polymerization initiator.Type: GrantFiled: January 15, 2021Date of Patent: July 11, 2023Assignee: Japan Fine Coatings Co., Ltd.Inventors: Daigou Mochizuki, Takumi Nakajima, Noriyasu Shinohara
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Publication number: 20130316154Abstract: A photocurable resin composition for three-dimensional photofabrication operations, including stereolithography, comprising (A) a cationically polymerizable compound having two or more bisphenol structures and one or more hydroxyl groups, (B) a cationically polymerizable compound other than the component (A), (C) a cationic photoinitiator, (D) a radically polymerizable compound, (E) a radical photoinitiator, and (F) multilayer polymer particles having a core and a shell layer, the shell layer containing functional group-modified rubber polymer particles having at least one reactive functional group.Type: ApplicationFiled: May 21, 2013Publication date: November 28, 2013Applicants: DSM IP Assets B.V., Japan Fine Coatings Co., Ltd., JSR CorporationInventors: Masahiro UEDA, Katsuyuki TAKASE, Takahiko KUROSAWA
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Patent number: 8207239Abstract: The present invention aims to provide a radiation-curing liquid resin composition for optical tridimensional modeling having good storage stability. The suitable radiation-curing liquid resin composition for optical tridimensional modeling of the present invention includes a compound represented by the below general formula (1), a compound having phenolic hydroxyl group, a cationic polymerizable compound, a radical polymerization initiator, a radical polymerizable compound, one or more sulfur compound selected from the group consisting of 2-mercaptobenzothiazole, 2-(4-morpholinodithiobenzothiazole, diisopropylxantogendisulfide and diphenyldisulfide, a polyether polyol compound.Type: GrantFiled: October 17, 2011Date of Patent: June 26, 2012Assignees: DSM IP Assets B.V., JSR Corporation, Japan Fine Coatings Co. Ltd.Inventors: Katsuyuki Takase, Takayoshi Tanabe, Noriyasu Shinohara
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Publication number: 20120041091Abstract: The present invention aims to provide a radiation-curing liquid resin composition for optical tridimensional modeling having good storage stability. The suitable radiation-curing liquid resin composition for optical tridimensional modeling of the present invention includes a compound represented by the below general formula (1), a compound having phenolic hydroxyl group, a cationic polymerizable compound, a radical polymerization initiator, a radical polymerizable compound, one or more sulfur compound selected from the group consisting of 2-mercaptobenzothiazole, 2-(4-morpholinodithiobenzothiazole, diisopropylxantogendisulfide and diphenyldisulfide, a polyether polyol compound.Type: ApplicationFiled: October 17, 2011Publication date: February 16, 2012Applicants: DSM IP ASSETS B.V., Japan Fine Coatings Co., Ltd., JSR CorporationInventors: Katsuyuki Takase, Takayoshi Tanabe, Noriyasu Shinohara
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Publication number: 20070232713Abstract: Provided is a radiation curing liquid resin composition for optical three-dimensional modeling, which has a small step on the side face and excellent surface smoothness, and allows forming a high accuracy optically modeled article, is composed of the components (A) through (F). The content of (A) component in the total quantity of the composition is 0.1 to 10% by mass, and the content of (F) polyether polyol compound is 1 to 35% by mass. (A) A compound having phenolic hydroxyl group and/or phosphite group, (B) A cationic polymerizable compound, (C) A cationic polymerization initiator, (D) A radical polymerizable compound, (E) A radical polymerization initiator, and (F) A polyether polyol compound.Type: ApplicationFiled: May 26, 2005Publication date: October 4, 2007Applicants: JSR Corporation, Japan Fine Coatings Co., Ltd., DSM IP Assets B.V.Inventors: Katsuyuki Takase, Ryouji Tatara, Masanobu Sugimoto, Zen Komiya
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Publication number: 20070178298Abstract: To provide a curable composition having excellent applicability and capable of forming a coat (film) having high hardness and high refractive index and excelling in scratch resistance and adhesion to a substrate and a low-refractive-index layer on the surface of various types of substrates, a cured product of the curable composition, and a laminate having a low reflectance and excelling in antistatic property. A curate e composition comprising particles (A) prepared by bonding oxide particles of at least one element selected from the group consisting of silicon, aluminum, zirconium, titanium, zinc, germanium, indium, tin, antimony, and cerium with an organic compound having a polymerizable unsaturated group, a compound (B) having a urethane bond and two or more polymerizable unsaturated groups in the molecule, and a photoinitiator (C).Type: ApplicationFiled: March 25, 2005Publication date: August 2, 2007Applicants: DSM IP ASSETS B.V., JSR CORPORATION, JAPAN FINE COATINGS CO., LTDInventors: Yasunobu Suzuki, Ryousuke Iinuma, Noriyasu Shinohara, Zen Komiya
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Patent number: 7084187Abstract: To provide a radiation-sensitive curable liquid resin composition having excellent applicability and capable of producing a film excelling in hardness, scratch resistance, adhesion, transparency, and appearance of the surface of the film. A curable liquid resin composition comprising: (A) particles prepared by bonding at least one oxide of an element selected from the group consisting of silicon, aluminum, zirconium, titanium, zinc, germanium, indium, tin, antimony, and cerium to a specific organic compound which comprises a polymerizable unsaturated group and a group shown by —X—C(?Y)—NH— (wherein X is NH, O, or S, and Y is O or S), and preferably a silanol group, (B) a compound having two or more polymerizable unsaturated groups in the molecule, (C) a specific alkylene glycol organic solvent, and preferably (D) a polymerization initiator.Type: GrantFiled: September 26, 2002Date of Patent: August 1, 2006Assignees: DSM IP Assets B.V., JSR Corporation, Japan Fine Coatings Co., Ltd.Inventors: Hideaki Takase, Yoshikazu Yamaguchi, Takayoshi Tanabe
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Publication number: 20060128856Abstract: Provided is a liquid curing resin composition exhibiting excellent adhesion to PET-PET, MS-PET and the like, having excellent processability, heat resistance and water resistance, and having a high-cure rate. A liquid curing resin composition containing the following components (A) and (B): (A) 30 to 70 wt. % of a urethane (meth)acrylate having a number-average molecular weight of from 10000 to 40000, and (B) 30 to 60 wt. % of an ethylenically unsaturated monomer having a glass transition point, in the form of a homopolymer, of 60° C. or greater.Type: ApplicationFiled: September 29, 2003Publication date: June 15, 2006Applicants: JRS Corporation, JAPAN FINE COATINGS CO., LTD., DSM IP ASSETS B.V.Inventors: Atsuya Takahashi, Junji Yoshizawa, Masakatsu Ukon, Zen Komiya
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Patent number: 7060737Abstract: The invention relates to a curable resin composition, cured products thereof, and laminated materials. The curable composition comprises: (A-1) acicular oxide particles, the oxide being an oxide of at least one element selected from the group consisting of silicon, aluminum, zirconium, titanium, zinc, germanium, indium, tin, antimony, and cerium, (B) a compound having two or more polymerizable unsaturated groups, (C) a photopolymerization initiator is provided. After cure, the composition has excellent scratch resistance. In addition, it may have excellent antistatic characteristics and transparency. In a preferred embodiment the composition also comprises (A-2) particles other than the acicular particles (A-1), being oxide of at least one element selected from the group consisting of silicon, aluminum, zirconium, titanium, zinc, germanium, indium, tin, antimony, and cerium.Type: GrantFiled: March 29, 2002Date of Patent: June 13, 2006Assignees: DSM IP Assets B.V., JSR Corporation, Japan Fine Coatings Co., Ltd.Inventors: Yoshikazu Yamaguchi, Takayoshi Tanabe, Hiroki Nakajima, Hideaki Takase
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Publication number: 20050032927Abstract: To provide a UV-curable resin composition useful for forming optical parts such as optical lenses. A radiation-curable resin composition for optical parts, comprising (A) 5-70 wt % of urethane (meth)acrylate, (B) 0.1-70 wt % of benzyl (meth)acrylate, and (C) 10-70 wt % of an ethylenically unsaturated group-containing compound other than the components (A) and (B).Type: ApplicationFiled: May 7, 2004Publication date: February 10, 2005Applicants: DSM IP Assets B. V., JSR Corporation, Japan Fine Coatings Co., Ltd.Inventors: Shingo Itai, Satoshi Futami, Yoshikazu Yamaguchi, Takayoshi Tanabe
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Patent number: 6846572Abstract: The invention relates to a curable composition comprising (A) particles prepared by bonding at least one oxide of an element selected from the group consisting of silicon, aluminum, zirconium, titanium, zinc, germanium, indium, tin, antimony, and cerium, and an organic compound which comprises a polymerizable group, (B) a compound having a melamine group and one or more polymerizable groups and (C) a compound having at least two polymerizable groups in the molecule other than the component (B); and to cured products and laminates with a with low reflectance and superior chemical resistance.Type: GrantFiled: July 16, 2002Date of Patent: January 25, 2005Assignees: DSM IP Assets B.V., JSR Corporation, Japan Fine Coatings Co. Ltd.Inventors: Yoshikazu Yamaguchi, Takao Yashiro, Isao Nishiwaki, Takashi Ukachi
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Patent number: 6818678Abstract: A resin composition comprising: (A) particles prepared by bonding at least one oxide of an element selected from the group consisting of silicon, aluminum, zirconium, titanium, zinc, germanium, indium, tin, antimony, and cerium, and an organic compound which includes a polymerizable unsaturated group, (B) an oligomer-type radiation polymerization initiator having a site which generates photo-radicals by irradiation of radioactive rays, and (C) a compound having at least two polymerizable unsaturated groups in the molecule.Type: GrantFiled: February 12, 2002Date of Patent: November 16, 2004Assignees: DSM IP Assets B.V., JSR Corporation, Japan Fine Coatings Co., Ltd.Inventors: Yoshikazu Yamaguchi, Takao Yashiro, Isao Nishiwaki, Takashi Ukachi
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Publication number: 20040106692Abstract: A photocurable resin composition suitable for use in three-dimensional photofabrication comprising (A) a cationically polymerizable organic compound, (B) a cationic photoinitiator, and (C) a (co)polymer obtainable by (co)polymerization of monomers comprising at least one (meth)acrylate-group comprising monomer.Type: ApplicationFiled: October 3, 2003Publication date: June 3, 2004Applicants: DSM N.V., JSR Corporation, Japan Fine Coatings Co., Ltd.Inventors: Tetsuya Yamamura, Takayoshi Tanabe, Takashi Ukachi
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Patent number: 6727334Abstract: The invention relates to a resin composition exhibiting excellent coatability and capable of forming coatings with high hardness, superior scratch resistance, low curling properties, superb adhesion, excellent transparency, and superior coating surface appearance without a wavy striation, streaks, unevenness of coatings, cissing, and the like, as well as cured products made from the resin composition.Type: GrantFiled: August 15, 2001Date of Patent: April 27, 2004Assignees: DSM N.V., JSR Corporation, Japan Fine Coatings Co., Ltd.Inventors: Isao Nishiwaki, Yoshikazu Yamaguchi, Yuichi Eriyama, Takashi Ukachi
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Patent number: 6727035Abstract: The present invention relates to a photocurable liquid resin composition comprising: (A) a cationically polymerizable organic compound; (B) a cationic photopolymerization initiator; (C) an ethylenically unsaturated monomer; (D) a radical photopolymerization initiator; (E) a polyether polyol compound having one or more hydroxyl groups in one molecule; and, optionally, includes elastomer particles having a specific particle diameter and/or an epoxy-branched alicyclic compound.Type: GrantFiled: August 8, 2001Date of Patent: April 27, 2004Assignees: DSM N.V., JSR Corporation, Japan Fine Coatings Co., Ltd.Inventors: Tetsuya Yamamura, Akira Takeuchi, Tsuyoshi Watanabe, Takashi Ukachi
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Patent number: 6710097Abstract: A photocurable resin composition comprising: (A) a urethane (meth)acrylate produced by reacting at least a polyether polyol with a number average molecular weight of 500 or more having an alkyleneoxy structure in the molecule, an organic polyisocyanate compound, and a (meth)acrylate containing a hydroxyl group; (B) a monofunctional (meth)acrylate shown by the following formula (1), wherein R1 represents a hydrogen atom or a methyl group, R2 represents —(CH2CH2O)p—, —(CH(CH3)CH2O)q—, or —CH2CH(OH)CH2O—, Y1, Y2, and Y3 individually represent a hydrogen atom, bromine atom, alkyl group having 1-10 carbon atoms, phenyl group, or —C(CH3)2C6H5—, and p and q represent integers from 0 to 10; and (C) a photoinitiator; its use and optical parts prepared from the photocurable resin composition.Type: GrantFiled: December 3, 2001Date of Patent: March 23, 2004Assignees: DSM N.V., JSR Corporation, Japan Fine Coatings Co., Ltd.Inventors: Hideaki Takase, Jirou Ueda, Takayoshi Tanabe, Takashi Ukachi
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Patent number: 6686047Abstract: Reactive particles have been invented that may be used for a curable composition exhibiting excellent cured product productivity and capable of forming coatings with high hardness, superior scratch resistance, excellent abrasion resistance, low curling properties, superb adhesion, and chemicals resistance, particularly high chemicals resistance, on the surface of various substrates; a curable composition containing the reactive particles; and cured products made from the curable composition.Type: GrantFiled: June 27, 2002Date of Patent: February 3, 2004Assignees: DSM N.V., JSR Corporation, Japan Fine Coatings Co. LtdInventors: Yoshikazu Yamaguchi, Takao Yashiro, Isao Nishiwaki, Takashi Ukachi
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Patent number: 6685869Abstract: A photocurable resin composition suitable for use in three-dimensional photofabrication comprising (A) a cationically polymerizable organic compound, (B) a cationic photoinitiator, and (C) a (co)polymer obtainable by (co)polymerization of monomers comprising at least one (meth)acrylate-group comprising monomer. A process for producing a three-dimensional object which comprises the use of a washing agent having a Hansen-solubility between 27-35 (Mpa)½.Type: GrantFiled: May 30, 2002Date of Patent: February 3, 2004Assignees: DSM N.V., JSR Corporation, Japan Fine Coatings Co. Ltd.Inventors: Tetsuya Yamamura, Takayoshi Tanabe, Takashi Ukachi
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Patent number: 6521677Abstract: Provided is a liquid curable resin composition which can produce transparent cured products with a high refractive index, high hardness, and superior abrasion resistance, and which can be suitably used as a coating material. The liquid curable resin composition comprises: (A) a poly-functional (meth)acrylic compound having at least three (meth) acryloyl groups in the molecule; (B) a reaction product obtained by the reaction of a compound having a polymerizable unsaturated group and alkoxysilyl group in the molecule and particles metal oxide, the metals being preferably selected from the group consisting of zirconium, antimony, zinc, tin, cerium, and titanium; and (C) a radiation polymerization initiator.Type: GrantFiled: May 7, 2001Date of Patent: February 18, 2003Assignees: DSM N.V., JSR Corporation, Japan Fine Coating Co., Ltd.Inventors: Takao Yashiro, Yuichi Eriyama, Isao Nishikawi, Takashi Ukachi
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Patent number: RE42593Abstract: A photocurable resin composition suitable for photo-fabrication. The resin composition capable of being promptly cured by photo-irradiation, thereby reducing fabricating time and providing cured products having excellent mechanical strength and minimized shrinkage during curing to ensure high dimensional accuracy. The composition includes (A) an oxetane compound, (B) an epoxy compound, and (C) a cationic photo-initiator.Type: GrantFiled: September 26, 2003Date of Patent: August 2, 2011Assignees: DSM IP Assets B.V., JSR Corporation, Japan Fine Coatings Co., Ltd.Inventors: Tetsuya Yamamura, Tsuyoshi Watanabe, Akira Takeuchi, Takashi Ukachi