Patents Assigned to John M. Zeigler
  • Poly(silyl silane)homo and copolymers
    Patent number: 4820788
    Abstract: Poly(silyl silanes) have been prepared. They have high photosensitivity and excellent resistance to oxygen-reactive ion etching processes. They are useful as photodepolymerizable photoresists, barrier layers, etc.
    Type: Grant
    Filed: October 31, 1986
    Date of Patent: April 11, 1989
    Assignee: John M. Zeigler
    Inventor: John M. Zeigler