Patents Assigned to Kabushiki Kaisha Meidenshae
  • Method for carbon film production
    Patent number: 5073241
    Abstract: A carbon film producing method utilizing a reactive sputtering process for projecting carbon particles from a graphite target electrode to deposite a very thin layer on a substrate. The reactive sputtering process is performed at a predetermined pressure in an atmosphere of hydrogen gas mixed at a predetermined ratio to another kind of gas.
    Type: Grant
    Filed: January 28, 1987
    Date of Patent: December 17, 1991
    Assignee: Kabushiki Kaisha Meidenshae
    Inventor: Misuzu Watanabe