Patents Assigned to KABUSHIKI KAISHA RENIASU
  • Patent number: 9533327
    Abstract: A transparent resin plate superior in quality and productivity and a method for producing the same by forming a hard-coat layer on a substrate into a hardened film and by establishing a reforming method thereof are disclosed. The transparent resin plate has a substrate (1), a primer layer (2) and a hard-coating layer (3) in order, wherein the primer layer (2) is formed by a wet method, the hard-coating layer (3) is formed out of silicone polymer by the wet method, the surface of the silicone polymer layer is exposed to irradiation by ultraviolet light having a wavelength less than 200 nm, and only the exposed region is changed into a reformed region mainly composed of silicon dioxide.
    Type: Grant
    Filed: December 10, 2008
    Date of Patent: January 3, 2017
    Assignee: KABUSHIKI KAISHA RENIASU
    Inventor: Sadao Maeda