Patents Assigned to Kanegafuchi Chemical Industry Co. Ltd.
  • Patent number: 5409995
    Abstract: A curable composition which comprises (C) a non-polymeric organic curing agent having at least two hydrosilyl groups in a molecule, (D) an organic polymer having at least one alkenyl group in a molecule, and (E) a hydrosilylation catalyst has rapid curability and good depth curability, and gives a homogeneous cured material having good mechanical properties.
    Type: Grant
    Filed: March 8, 1993
    Date of Patent: April 25, 1995
    Assignee: Kanegafuchi Chemical Industry Co., Ltd.
    Inventors: Takahisa Iwahara, Makoto Chiba, Tomoko Takahara, Kazuya Yonezawa
  • Patent number: 5391797
    Abstract: A process for preparing an alkoxysilane of the general formula:R.sup.3.sub.b SiH.sub.c (OR.sup.2).sub.4-(b+c)in which R.sup.2 represents a substituted or unsubstituted alkyl group, R.sup.3 represents a monovalent substituted or unsubstituted hydrocarbon group, b is 1, 2 or 3, and c is 0, 1, or 2, having the step of:reacting an alkoxysilane of the general formula:R.sup.1.sub.a Si(OR.sup.2).sub.4-awherein R.sup.1 represents a monovalent substituted or unsubstituted hydrocarbon group, R.sup.2 is the same as defined above, and a is 0, 1, 2 or 3, with a polysiloxane in the presence of a catalyst containing an aluminum alkoxide, a zirconium alkoxide or a zirconium chelate to obtain the alkoxysilane, which process suppresses side reactions to provide the intended compound which is free from halogen compounds in a high yield.
    Type: Grant
    Filed: March 31, 1994
    Date of Patent: February 21, 1995
    Assignee: Kanegafuchi Chemical Industry Co., Ltd.
    Inventors: Toshifumi Hirose, Katsuya Ouchi, Hiroshi Awaji
  • Patent number: 5387542
    Abstract: A polycrystalline silicon thin film having a hydrogen content of not more than 5 atomic %, which can be fabricated on an inexpensive glass substrate (3) such as soda glass or on a glass substrate (3) provided with a metal electrode or transparent electrode. The polycrystalline silicon thin film can be fabricated at such a tempereture by using multiple repetitions of a process comprising the fabrication of an amorphous silicon film, for example, by the CVD method, followed by exposure to a hydrogen plasma for set period of time.
    Type: Grant
    Filed: July 12, 1993
    Date of Patent: February 7, 1995
    Assignee: Kanegafuchi Chemical Industry Co., Ltd.
    Inventors: Kenji Yamamoto, Yoshifumi Okamoto
  • Patent number: 5382787
    Abstract: The invention provides a temperature switch material capable of detecting a very low temperature not higher than 150 K. It also provides a light switch material for detecting light in the ultraviolet region. It further provides a switch material suited for use as a substrate for thin oxide layer formation thereon. The switching material utilizes an abrupt change in photoelectric current as produced upon phase transition of SrTiO.sub.3 at a low temperature. The photoelectric switch or temperature switch utilizes the change in photoconduction spectrum upon irradiation of SrTiO.sub.3 with light in the 3 eV-5 eV ultraviolet region. A switch is available by varying the intensity of irradiating light thereby controlling the transition temperature.
    Type: Grant
    Filed: July 7, 1992
    Date of Patent: January 17, 1995
    Assignee: Kanegafuchi Chemical Industry Co., Ltd.
    Inventors: Jun Takada, Akihiko Nakajima, Yoshihisa Tawada
  • Patent number: 5380496
    Abstract: There is provided an apparatus for suspension polymerization to produce polymer particles having uniform size. The apparatus has a droplet forming device with at least one orifice and a recycle line which recycles the aqueous dispersion medium through the droplet forming device, a first reactor and a second reactor. The apparatus can produce polymer particles having uniform particle size.
    Type: Grant
    Filed: October 1, 1993
    Date of Patent: January 10, 1995
    Assignee: Kanegafuchi Chemical Industry Co., Ltd.
    Inventors: Yoshiyuki Hashiguchi, Masakiti Kishi, Takehiko Yagyu
  • Patent number: 5367016
    Abstract: A reinforced resin composition comprising 100 parts by weight of a resin component comprising a polycarbonate resin, a thermoplastic polyester resin and an impact modifier in a ratio, by weight, of 90-10:10-90:0-40 and 0.5 to 100 parts by weight of kaolin with a mean particle diameter of 0.1 to 4.0 .mu.m. The composition can be molded by conventional techniques such as injection molding and extrusion molding into automotive parts, electrical or electronic parts and other products excellent in heat resistance, impact resistance, rigidity, dimensional stability, chemical resistance, moldability, weather resistance and thermal stability with a low linear coefficient of expansion and excellent surface gloss and appearance.
    Type: Grant
    Filed: November 23, 1992
    Date of Patent: November 22, 1994
    Assignee: Kanegafuchi Chemical Industry Co., Ltd.
    Inventors: Osamu Miyama, Katsutoyo Fujita, Hayato Nishimura, Shigemi Matsumoto, Satoshi Tonoki
  • Patent number: 5362711
    Abstract: A process for forming a single crystal superconducting LnA.sub.2 Cu.sub.3 O.sub.7-x film, wherein Ln is at least one rare earth element and A is at least one alkaline earth element, is disclosed, which comprises simultaneously evaporating Ln, A and Cu in an atomic ratio of about 1:2:3 from discrete evaporation sources of Ln, A and Cu onto a heated substrate in a vacuum vessel while blowing an oxygen gas onto the substrate to form an oxygen-containing atmosphere, thereby forming the single crystal superconducting film on the substrate.
    Type: Grant
    Filed: April 27, 1993
    Date of Patent: November 8, 1994
    Assignees: Kanegafuchi Chemical Industry Co., Ltd., Matsushita Electric Inductris Co., Ltd., NEC Corporation, Nippon Mining Co., Ltd., Nippon Steel Corporation, TDK Corporation, Tosoh Corporation, Toyo Boseki Kabushiki Kaisha, Seisan Kaihatsu Kagaku Kenkyusho, Ube Industries, Ltd.
    Inventors: Toshio Takada, Takahito Terashima, Yoshichika Bando
  • Patent number: 5350606
    Abstract: A ferroelectric thin film consisting of a single crystal of BaTiO.sub.3 which has a perovskite structure is produced by a method comprising evaporating Ba and Ti in an atomic ratio of 1:1 from discrete evaporation sources of Ba and Ti to deposit them on a substrate in a vacuum deposition vessel while supplying a small amount of an oxygen gas to the reactor.
    Type: Grant
    Filed: June 9, 1993
    Date of Patent: September 27, 1994
    Assignees: Kanegafuchi Chemical Industry Co., Ltd., Nippon Steel Corporation, NEC Corporation, Seisan Kaihatsu Kagaku Kenkyusho
    Inventors: Toshio Takada, Takahito Terashima, Kenji Iijima, Kazunuki Yamamoto, Kazuto Hirata, Yoshichika Bando
  • Patent number: 5341672
    Abstract: A molecular weight of a polymer is measured by a process including steps of: heating a polymer portion with a heating device, measuring, with a temperature measuring device, the difference between temperatures of at least two points of the polymer portion at each of which the polymer portion is subjected to a thermally different influence from each other by the heating device, and estimating the molecular weight of the polymer which corresponds to the difference between the temperatures obtained by the measuring step according to a relationship between the temperature difference and the molecular weight of the polymer which relationship has been beforehand obtained.
    Type: Grant
    Filed: November 22, 1993
    Date of Patent: August 30, 1994
    Assignees: Kanegafuchi Chemical Industry Co., Ltd., Snow Brand Milk Products Co., Ltd.
    Inventors: Norio Kawanami, Kiyotaka Kondo, Yoshihiro Ikeda, Tooru Nakagawa, Kensuke Itoh, Yukihiro Saiki, Saburo Ishii, Kenji Aoyama
  • Patent number: 5336703
    Abstract: A two-pack type curable composition comprising:A. a first composition containing (A-1) an organic elastomeric polymer having at least one silicon-containing group to the silicon atom of which a hydroxyl group and/or a hydrolyzable group are bonded and which is cross linkable through formation of a siloxane linkage in a molecule and (A-2) a curing agent for an epoxy resin, andB. a second composition containing (B-1) an epoxy resin, (B-2) a curing catalyst for the organic elastomeric polymer having at least one silicon-containing reactive group and (B-3) at least one member selected from the group consisting of acidic fillers and carboxylic acids, which has good storage stability.
    Type: Grant
    Filed: September 13, 1993
    Date of Patent: August 9, 1994
    Assignee: Kanegafuchi Chemical Industry Co., Ltd.
    Inventors: Michihide Homma, Atsuko Yoshihara, Hiroshi Wakabayashi, Katsuhiko Isayama
  • Patent number: 5315282
    Abstract: A magnetoresistance effect element including a substrate and at least two magnetic thin layers which are laminated with interposing a non-magnetic thin layer therebetween on said substrate, wherein adjacent magnetic thin layers through the non-magnetic thin layer have different coercive forces and each of the magnetic thin layers and the non-magnetic layer has a thickness of not larger than 200 .ANG., which has a large magnetoresistance ratio of several % to several ten % at a small external magnetic field of several Oe to several ten Oe and can provide a MR sensor having a high sensitivity and a MR head which achieves high density magnetic recording.
    Type: Grant
    Filed: January 21, 1992
    Date of Patent: May 24, 1994
    Assignees: Ube Industries, Ltd., Kanegafuchi Chemical Industry Co., Ltd., Nippon Steel Corporation, TDK Corporation, Tosoh Corporation, Toyo Boseki Kabushiki Kaisha, Nippon Mining Co., Ltd., NEC Corporation, Matsushita electgric Industrial Co., Ltd., Seisan Kaihatsu Kagaku Kenkyusho
    Inventors: Teruya Shinjo, Hidefumi Yamamoto, Toshio Takada
  • Patent number: 5296582
    Abstract: A curable resin composition has a low viscosity, hence is easy to handle, before curing and, after curing, gives cured products having good tensile characteristics and, in addition, good chemical resistance and water resistance. This composition includes (A) an oxypropylene polymer having at least one silicon atom-containing group having a hydroxyl group or hydrolyzable group bound to the silicon atom and having an Mw/Mn ratio of up to than 1.6 and a number average molecular weight of at least 6,000, and (B) an epoxy resin.
    Type: Grant
    Filed: November 18, 1991
    Date of Patent: March 22, 1994
    Assignee: Kanegafuchi Chemical Industry Co., Ltd.
    Inventors: Masayuki Fujita, Michihide Homma, Hiroshi Wakabayashi
  • Patent number: 5290873
    Abstract: An isobutylene polymer having an unsaturated group and comprising more than one unit per molecule on the average of the formula: ##STR1## wherein R.sup.1, R.sup.2 and R.sup.3 are the same or different and each a hydrogen atom or a C.sub.1 -C.sub.8 alkyl group, R' and R" are the same or different and each a hydrogen atom, a methyl group or an ethyl group, and Q is a C.sub.1 -C.sub.30 divalent organic group, which provides a cured material having improved weather resistance.
    Type: Grant
    Filed: April 15, 1991
    Date of Patent: March 1, 1994
    Assignee: Kanegafuchi Chemical Industry Co., Ltd.
    Inventors: Koji Noda, Hiroshi Fujisawa, Kazuya Yonezawa
  • Patent number: 5276113
    Abstract: There is provided a suspension polymerization process for production of polymer particles having a substantially uniform size, which process comprises the steps of: (a) applying regular vibration to a flow of a monomer liquid which has a specific gravity smaller than that of an aqueous dispersion medium, (b) introducing the aqueous dispersion medium containing the droplets in a first reactor comprising a recycling means which discharges the aqueous dispersion medium from the bottom of the reactor and recycles it to the top of the reactor, (c) partially polymerizing the monomer liquid in the first reactor so that the specific gravity of the droplets does not exceed that of the aqueous dispersion medium while maintaining the suspended condition of the droplets, and (d) discharging the partially polymerized droplets together with the aqueous dispersion medium from a lower portion of the first reactor and introducing them in a second reactor, and (e) further polymerizing the partially polymerized droplets in the
    Type: Grant
    Filed: September 2, 1992
    Date of Patent: January 4, 1994
    Assignee: Kanegafuchi Chemical Industry Co., Ltd.
    Inventors: Yoshiyuki Hashiguchi, Masakiti Kishi, Takehiko Yagyu
  • Patent number: 5262502
    Abstract: An isobutylene base polymer with a functional group having repeating units derived from isobutylene and at least one unit of the formula: ##STR1## wherein R.sup.1 is a hydrogen atom, a methyl group or an ethyl group and R.sup.2 is a divalent organic group, and a number average molecular weight of 500 to 500,000.
    Type: Grant
    Filed: October 9, 1992
    Date of Patent: November 16, 1993
    Assignee: Kanegafuchi Chemical Industry Co., Ltd.
    Inventors: Hiroshi Fujisawa, Kouji Noda, Kazuya Yonezawa
  • Patent number: 5252390
    Abstract: A laminated film comprising at least two thin films of single crystal LnBa.sub.2 Cu.sub.3 O.sub.7-x wherein Ln is Y or one of lanthanoids except Pr and Tb having the (001) plane in the direction parallel with the film surface and at least one continuous thin film of Y.sub.2 O.sub.3 which has a thickness of not larger than 100 .ANG. and the (001) plane in the direction parallel with the film surface and is interposed between a pair of said thin films of single crystal LnBa.sub.2 Cu.sub.3 O.sub.7-x, wherein the thin films of single crystal LnBa.sub.2 Cu.sub.3 O.sub.7-x has good superconductive properties.
    Type: Grant
    Filed: June 28, 1991
    Date of Patent: October 12, 1993
    Assignees: Ube Industries, Ltd., Kanegafuchi Chemical Industry Co., Ltd., Nippon Steel Corporation, TDK Corporation, Tosoh Corporation, Toyo Boseki Kabushiki Kaisha, Nippon Mining Co., Ltd., NEC Corporation, Matsushita Electric Industrial Co., Ltd., Seisan Kaihatsu Kagaku Kenkyusho
    Inventors: Toshio Takada, Takahito Terashima, Kenji Iijima, Kazunuki Yamamoto, Kazuto Hirata, Yoshichika Bando
  • Patent number: 5250120
    Abstract: This invention relates to a photovoltaic device, such as a solar cell or a photosensor, which comprises an amorphous silicon semiconductor photosensitive layer and, as disposed on respective sides thereof, a transparent electrode and a rear electrode. The rear electrode is a multi-layer structure constructed by alternately successive depositions, each in a thickness of 0.3 to 50 nm, of two or more metals selected from the group consisting of Cu, Ag, and Au. In using such a Cu/Ag multi-layer structure or an Au/Ag multi-layer structure as the rear electrode, the thickness of each Cu or Au layer is controlled at 0.3 to 20 nm and that of each Ag layer at 1 to 50 nm. The total thickness of the rear electrode is 20 nm to 1 .mu.m. This construction insures improved photoelectric conversion efficiency and improved reliability of the device.
    Type: Grant
    Filed: December 5, 1991
    Date of Patent: October 5, 1993
    Assignee: Kanegafuchi Chemical Industry Co., Ltd.
    Inventors: Jun Takada, Akihiko Nakajima, Katsuhiko Hayashi, Keizo Asaoka, Yoshihisa Tawada
  • Patent number: 5248459
    Abstract: A method of manufacturing a molded resin foam by charging pre-expanded resin pellets into a cavity of a mold and subjecting them to expansion molding. In order to minimize differences in weight of the foam from product to product, the method is characterized in that prior to charging, the apparent density of the pre-expanded resin pellets is measured and, upon charging, the cracking width of the mold is regulated, on the basis of the measurement result, to a definite value determined depending upon the apparent density, whereby the weight of the pellets charged in the mold cavity is made constant.
    Type: Grant
    Filed: July 23, 1991
    Date of Patent: September 28, 1993
    Assignee: Kanegafuchi Chemical Industry Co., Ltd.
    Inventors: Yukio Fukasawa, Hisatoshi Fukui, Shiro Tojo
  • Patent number: 5214199
    Abstract: A malonic monoester is prepared in a good yield by a single step reaction by reacting malonic acid with an alcohol in the presence of a base and an activator of malonic acid selected from the group consisting of an acyl halide or halocarbonate and an acid anhydride or dicarbonate.
    Type: Grant
    Filed: August 30, 1991
    Date of Patent: May 25, 1993
    Assignee: Kanegafuchi Chemical Industries Co., Ltd.
    Inventors: Teruyoshi Koga, Noboru Ueyama, Kenji Inoue, Satomi Takahashi
  • Patent number: 5214197
    Abstract: A novel 2,4-dihydroxyadipic acid derivative of the formula: ##STR1## wherein R.sup.1 and R.sup.4 are the same or different and each a hydrogen atom, an alkyl group, an aralkyl group, an aryl group or a silyl group, and R.sup.2 and R.sup.3 are the same or different and each a hydrogen atom or a protective group of a hydroxy group or together form a ring, which is useful as a common intermediate in the synthesis of HMG-CoA reductase inhibitor.
    Type: Grant
    Filed: July 2, 1991
    Date of Patent: May 25, 1993
    Assignee: Kanegafuchi Chemical Industry Co., Ltd.
    Inventors: Shigeo Hayashi, Noboru Ueyama, Kenji Inoue, Teruyoshi Koga, Satomi Takahashi