Abstract: A seafood product cooking system includes a cooking vessel; a sensing module; a control module for measuring a set of cooking vessel parameters and outputting a set of control signals; a processing module for processing at least one signal from the sensing module and issuing control commands to the control module; and a memory module configurable to store a set of cooking process program instructions. A cooking process includes loading the product inside the cooking vessel; creating a negative pressure therein; increasing cooking vessel temperature to a first temperature; pumping in vapour comprising water vapour into the cooking vessel to initiate a process of attaining a second temperature lesser than the first temperature, wherein attaining the second temperature includes dwelling the seafood product at a plurality of intermediate temperatures; and spraying fluid including water on the seafood product to attain a third temperature that is lesser than the second temperature.

Abstract: The invention relates to plastic compounds for preparing films in a masterbatch containing zeolite with surfaces modified by silylation reaction. The films can be obtained through thermoplastic processing by blending the masterbatch with polymers such as polyolefins and polystyrene. The masterbatch includes styrene-b-(ethylene-ran-butylene)-b-styrene copolymers with styrene to ethylene-ran-butylene content of 12:88 to 14:86, and zeolites surfaces modified by silylation reaction with organosilane compound, in 30% to 70% by weight of copolymer with zeolite. The organosilane formula is R1nSiR2R3-n, where R is methoxy, ethoxy or chloro group, R1 is methyl group, R2 is functional group capable of a forming ?-? interaction from phenyl, phenylethyl, vinyl, or propyl methacrylate groups, and n is 0 and 2.

Abstract: A gas-timing control method for depositing metal oxynitride and transition metal oxynitride (Mx(ON)y) films on glass and flexible substrates using reactive radio frequency magnetron sputtering, without substrate heating. A system includes a sputtering chamber, substrates, targets, three mass flow controllers controlled respective flow rates of argon, nitrogen and oxygen gases alternately and intermittently into the sputtering chamber, and a radio frequency generator with 13.56 MHz which irradiated in the sputtering chamber to decompose sputtering gases. The flow rate ratio of oxygen+nitrogen/argon is at least 0.02, the flow rate ratio of oxygen/nitrogen is at least 0.01, and the sequence timing of argon, nitrogen and oxygen gases alternately or mixed into the sputtering chamber at least 1 sec.