Patents Assigned to Kodak Polychrome Graphics GmbH
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Patent number: 7439995Abstract: An apparatus and method for providing substantially intimate rolling contact between a portion of a donor sheet and a portion of an acceptor element in a laser-induced thermal transfer printer comprises a rotatably mounted cylindrical drum, an acceptor element affixed to and supported by the cylindrical drum, a rotatably mounted dispensing roller for dispensing a donor sheet, and a rotatably mounted receiving roller for receiving the donor sheet, so that the donor sheet is extended between the dispensing roller and the receiving roller. A plurality of rotatably mounted contact rollers configured to bring a portion of the donor sheet extended between the dispensing roller and the receiving roller into contact with a portion of the acceptor element is also included.Type: GrantFiled: October 26, 2005Date of Patent: October 21, 2008Assignee: Kodak Polychrome Graphics, GmbHInventors: Mohammad Zaki Ali, Jianbing Huang
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Publication number: 20080160444Abstract: Lithographic substrate comprising (a) a dimensionally stable plate- or foil-shaped support, (b) an aluminum oxide layer provided on at least one side of the support (a), and (c) a hydrophilic layer applied onto the aluminum oxide layer comprising at least one phosphono-substituted siloxane of the general formula (I)Type: ApplicationFiled: August 25, 2005Publication date: July 3, 2008Applicant: KODAK POLYCHROME GRAPHICS GMBHInventors: Ulrich Fiebag, Hans-Joachim Timpe, Ursula Muller
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Patent number: 7363856Abstract: The present invention provides a flat bed platesetter system and a method for its use, particularly for imaging printing plates. For providing a precise, continuous, rapid and format-independent system which is reliable, the present invention suggests to move the printing plate relative to a stationary bridge carrying a radiant energy emitting head by means of a low inertia carriage member effectively connecting the printing plate and drive means.Type: GrantFiled: February 17, 2000Date of Patent: April 29, 2008Assignee: Kodak Polychrome Graphics GmbHInventor: Michel Moulin
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Publication number: 20080092763Abstract: A process for the post-treatment of an imaged lithographic printing plate comprises (a) Contacting a lithographic printing plate having image areas and non-image areas on a lithographic substrate with a solution comprising at least one phosphono-substituted siloxane of the following general formula (I) that is defined herein and (b) drying.Type: ApplicationFiled: August 25, 2005Publication date: April 24, 2008Applicant: Kodak Polychrome Graphics, GmbHInventors: Bernd Strehmel, Ulrich Fiebag, Tanja Ebhardt, Harald Baumann
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Publication number: 20070292809Abstract: The invention relates to a process for the production of a heat-sensitive imageable element comprising: (a) providing a substrate, (b) applying a first coating solution, comprising at least one photothermal conversion material, at least one polymer A soluble or swellable in an aqueous alkaline developer and at least one solvent, (c) drying, (d) applying a second coating solution, comprising at least one cross-linkable polyfunctional enolether, at least one polymer B comprising hydroxy groups and/or carboxy groups, and at least one solvent, wherein the polymer used in the first coating solution does not dissolve in this solvent, wherein the second coating solution does not contain a photothermal conversion material, and (e) drying at a temperature of at least 60° C.Type: ApplicationFiled: October 11, 2004Publication date: December 20, 2007Applicant: KODAK POLYCHROME GRAPHICS, GMBHInventors: Celin Savariar-Hauck, Gerhard Hauck, Dietmar Frank
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Publication number: 20070269745Abstract: Lithographic printing plate precursor comprising (a) a lithographic substrate with a hydrophilic surface and (b) a radiation-sensitive coating on the hydrophilic surface comprising (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a freeradical polymerization, (ii) at least one sensitizer, and at least one coinitiator capable of forming free radicals together with the sensitizer (ii); characterized in that the at least one sensitizer is an oligomeric or polymeric compound comprising the following structural unit (Formula (I)), wherein ?1 is an aromatic or heteroaromatic unit or a combination of the two so that a conjugated n-system is present between the two groups Z in structure (I), each Z independently represents a heteroatom, each R1 and R2 is independently selected from a halogen atom, an alkyl, aryl, alkylaryl or aralkyl group, a group —NR3R4 and a group —OR5, each R3, R4 and R5 is independently selected from anType: ApplicationFiled: November 11, 2005Publication date: November 22, 2007Applicant: KODAK POLYCHROME GRAPHICS GMBHInventors: Bernd Strehmel, Harald Baumann, Udo Dwars, Detlef Pietsch, Axel Draber, Michael Mursal
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Publication number: 20070269727Abstract: Radiation-sensitive negative working element comprising (a) a substrate with a hydrophilic surface and (b) a layer on the hydrophilic surface of the substrate, wherein said layer comprises a modified polymer obtainable by reacting (i) a polymer with —COOH, —SO3H, —P03H2 and/or —PO4H2 in the side chains, wherein the polymer is soluble in aqueous alkaline solutions and the solubility is not changed by IR radiation, and (ii) a salt with an inorganic or organic cation, wherein the modified polymer is soluble in aqueous alkaline solutions and the solubility is not changed by IR radiation, said layer being soluble in aqueous alkaline developer, but is rendered insoluble in aqueous alkaline developer by IR radiation.Type: ApplicationFiled: June 15, 2005Publication date: November 22, 2007Applicant: KODAK POLYCHROME GRAPHICS GMBHInventors: Celin Savariar-Hauck, Alan Monk, Rene Ullrich
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Patent number: 7270930Abstract: Heat-sensitive element comprising a) an optionally pretreated substrate; b) a positive working coating comprising (i) at least 40 wt.-%, based on the dry weight of the coating, of at least one polymer soluble in aqueous alkaline developer selected from novolak resins, functionalized novolak resins, polyvinylphenol resins, polyvinyl cresols and poly(meth)acrylates with phenolic and/or sulfonamide side groups, (ii) 01-20 wt.-%, based on the dry weight of the coating, of at least one (C4-C20 alkyl)phenol novolak resin insoluble in aqueous alkaline developer, and (iii) optionally at least one further component selected from polymer particles, surfactants, contrast dyes and pigments, inorganic fillers, antioxidants, print-out dyes, carboxylic acid derivatives of cellulose polymers, plasticizers and substances capable of absorbing radiation of a wavelength from the range of 650 to 1,300 nm and converting it into heat.Type: GrantFiled: August 9, 2004Date of Patent: September 18, 2007Assignee: Kodak Polychrome Graphics, GmbHInventors: Gerhard Hauck, Dietmar Frank
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Patent number: 7169534Abstract: Radiation-sensitive elements are described whose radiation-sensitive coating comprises both a photopolymerizable oligomer with a biuret structural unit and a photopolymerizable phosphazene oligomer.Type: GrantFiled: November 28, 2003Date of Patent: January 30, 2007Assignee: Kodak Polychrome Graphics GmbHInventors: Harald Baumann, Michael Flugel, Udo Dwars, Hans-Horst Glatt