Patents Assigned to Koltron Corporation
  • Patent number: 4575229
    Abstract: A photoetch plate hinge apparatus having a base photoetch plate for supporting a base hinge platform to which a metal hinge is mounted. The metal hinge is also secured to a coverplate hinge platform which is affixed to a cover photoetch plate via a cantilever bridge structure. The cover plate hinge platform and the cover photoetch plate are capable of vertical arc-like movement relative to the base photoetch plate, so as to accomplish the disposition of sheet material between the base and cover plates for photoetching. The usable surfaces of the plates are totally accessible to irradiation and cleaning, and will not damage when subjected to vacuum photoetching procedures.
    Type: Grant
    Filed: May 3, 1984
    Date of Patent: March 11, 1986
    Assignee: Koltron Corporation
    Inventor: Inge Lundstrom
  • Patent number: 4479849
    Abstract: A method for removing excess etchant from a work piece after the work piece exits an etching chamber. The steps include sensing the presence of the work piece as it exits the chamber and subjecting the work piece to a gas liquid spray to remove excess etchant, capture the excess etchant and recycle the captured excess etchant.
    Type: Grant
    Filed: May 27, 1983
    Date of Patent: October 30, 1984
    Assignee: Koltron Corporation
    Inventor: John J. Frantzen
  • Patent number: 4397708
    Abstract: Etching method and etching and etchant removal apparatus. A specific embodiment includes two sets of fan spray nozzles located adjacent to the etching chamber and positioned to direct a spray at the work piece as the work piece exits the etching chamber. A sensor is also located adjacent to the etching chamber for turning the nozzles on when the work piece is present. Hydrometer means for determining the specific gravity of the etchant solution controls one set of nozzles whereby the nozzles are turned on to decrease the density of the etchant and turned off to increase the density of the etchant.
    Type: Grant
    Filed: September 25, 1980
    Date of Patent: August 9, 1983
    Assignee: Koltron Corporation
    Inventor: John J. Frantzen
  • Patent number: 4019458
    Abstract: A photoresist spraying apparatus for coating both sides of metal sheets with photoresist and including a spray gun for spraying photoresist upon a workpiece, a spray chamber having a filter and exhaust vent for containing any overspray; a rack rotatably mounted within the chamber for holding the workpiece to be sprayed; a spray guide disposed at the front of the chamber in front of the workpiece for guiding the spray gun across the workpiece, and a positioning mechanism for moving the spray gun along the guide.
    Type: Grant
    Filed: September 2, 1976
    Date of Patent: April 26, 1977
    Assignee: Koltron Corporation
    Inventor: Franz Kolterer