Abstract: A method of improving selectivity of a metal in a selective deposition process. A pre-treatment process for the metal modifies the metal surface, and includes first reducing the metal to remove organic contamination from the metal followed by oxidation of the metal to allow a monolayer of a metal oxide to grow on the surface. This modification of the metal allows inhibitor molecules to adsorb on the metal oxide monolayer to improve selectivity.
Type:
Grant
Filed:
August 6, 2018
Date of Patent:
May 5, 2020
Assignee:
Lam Rasearch Corporation
Inventors:
Dennis Hausmann, Elham Mohimi, Pengyi Zhang, Paul C. Lemaire, Kashish Sharma, Alexander R. Fox, Nagraj Shankar, Kapu Sirish Reddy, David Charles Smith