Patents Assigned to Lastra S.p.A.
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Patent number: 7316887Abstract: A photosensitive lithographic printing plate comprises a photosensitive layer and a protective layer formed in this order on a support, wherein the photosensitive layer has a maximum peak of spectral sensitivity within a wavelength range ranging from 390 to 430 nm, the minimum exposure for the photosensitive lithographic printing plate for image formation at a wavelength of 410 nm (S410) is at most 100 ?J/cm2, and the relation between the minimum exposure for image formation at a wavelength of 450 nm (S450) and the minimum exposure for image formation at a wavelength of 410 nm (S410) is 0<S410/S450?0.1.Type: GrantFiled: December 13, 2005Date of Patent: January 8, 2008Assignee: Lastra S.p.A.Inventors: Toshiyuki Urano, Kazuhiro Kohori, Hideaki Okamoto
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Publication number: 20070134592Abstract: A photosensitive lithographic printing plate includes a photosensitive layer and a protective layer formed in this order on a support, wherein the photosensitive layer has a maximum peak of spectral sensitivity within a wavelength range ranging from 390 to 430 nm, the minimum exposure for the photosensitive lithographic printing plate for image formation at a wavelength of 410 nm (S410) is at most 100 ?J/cm2, and the relation between the minimum exposure for image formation at a wavelength of 450 nm (S450) and the minimum exposure for image formation at a wavelength of 410 nm (S410) is 0<S410/S450?0.1.Type: ApplicationFiled: February 7, 2007Publication date: June 14, 2007Applicant: LASTRA S.p.A.Inventors: Toshiyuki Urano, Kazuhiro Kohori, Hideaki Okamoto
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Patent number: 7144681Abstract: A heat-sensitive composition which forms an image without the removal of material, which does not require any developing treatment after the stage of exposure to heat and comprises: (a) a switchable polymer, (b) an IR absorber, (c) a triazine compound, and (d) a novolak resin. Negative lithographic plate comprising a substrate coated with the said composition. A method for obtaining a negative image on a substrate coated with a composition which is first hydrophobic and then lipophilic after exposure to heat, without the removal of material, the said negative image being obtained by applying a small quantity of energy to the said composition.Type: GrantFiled: June 9, 2005Date of Patent: December 5, 2006Assignee: Lastra S.p.A.Inventors: Angelo Bolli, Andrea Tettamanti
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Patent number: 7060412Abstract: A heat-sensitive composition which forms an image without the removal of material, which does not require any developing treatment after the stage of exposure to heat and comprises: (a) a switchable polymer, (b) an IR absorber, (c) a triazine compound, and (d) a novolak resin. Negative lithographic plate comprising a substrate coated with the said composition. A method for obtaining a negative image on a substrate coated with a composition which is first hydrophilic and then lipophilic after exposure to heat, without the removal of material, the said negative image being obtained by applying a small quantity of energy to the said composition.Type: GrantFiled: June 27, 2003Date of Patent: June 13, 2006Assignee: LASTRA S.p.A.Inventors: Angelo Bolli, Andrea Tettamanti
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Publication number: 20060110681Abstract: A photosensitive lithographic printing plate comprises a photosensitive layer and a protective layer formed in this order on a support, wherein the photosensitive layer has a maximum peak of spectral sensitivity within a wavelength range ranging from 390 to 430 nm, the minimum exposure for the photosensitive lithographic printing plate for image formation at a wavelength of 410 nm (S410) is at most 100 ?J/cm2, and the relation between the minimum exposure for image formation at a wavelength of 450 nm (S450) and the minimum exposure for image formation at a wavelength of 410 nm (S410) is 0<S410/S450?0.1.Type: ApplicationFiled: December 13, 2005Publication date: May 25, 2006Applicant: LASTRA S.p.A.Inventors: Toshiyuki Urano, Kazuhiro Kohori, Hideaki Okamoto
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Patent number: 7041431Abstract: A photosensitive lithographic printing plate comprises a photosensitive layer and a protective layer formed in this order on a support, wherein the photosensitive layer has a maximum peak of spectral sensitivity within a wavelength range ranging from 390 to 430 nm, the minimum exposure for the photosensitive lithographic printing plate for image formation at a wavelength of 410 nm (S410) is at most 100 ?J/cm2, and the relation between the minimum exposure for image formation at a wavelength of 450 nm (S450) and the minimum exposure for image formation at a wavelength of 410 nm (S410) is 0<S410/S450?0.1.Type: GrantFiled: December 18, 2003Date of Patent: May 9, 2006Assignee: Lastra S.p.A.Inventors: Toshiyuki Urano, Kazuhiro Kohori, Hideaki Okamoto
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Patent number: 6897007Abstract: A method for forming an image, which comprises subjecting a photosensitive layer of a photosensitive lithographic printing plate having a photosensitive layer comprising a photopolymerizable composition formed on a support surface to scanning exposure with a laser light having a wavelength in a range of from 650 to 1,300 nm, developing an image, and then further subjecting the photosensitive lithographic printing plate having the developed image to whole image exposure with a light exposure energy of from 1 to 70 times larger than the light exposure energy at the time of the laser light scanning exposure.Type: GrantFiled: March 18, 2002Date of Patent: May 24, 2005Assignee: Lastra S.p.A.Inventor: Hideaki Okamoto
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Publication number: 20050048404Abstract: A method for forming an image, which comprises subjecting a photosensitive layer of a photosensitive lithographic printing plate having a photosensitive layer comprising a photopolymerizable composition formed on a support surface to scanning exposure with a laser light having a wavelength in a range of from 650 to 1,300 nm, developing an image, and then further subjecting the photosensitive lithographic printing plate having the developed image to whole image exposure with a light exposure energy of from 1 to 70 times larger than the light exposure energy at the time of the laser light scanning exposure.Type: ApplicationFiled: October 5, 2004Publication date: March 3, 2005Applicant: LASTRA S.p.A.Inventor: Hideaki Okamoto
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Patent number: 6861202Abstract: A method for treating a photosensitive lithographic printing plate, which comprises exposing the photosensitive lithographic printing plate to laser light, developing with a developer containing an alkali metal silicate and then carrying out post-exposure treatment, said photosensitive lithographic printing plate being prepared by forming a photopolymerizable photosensitive layer having a film thickness of from 1.2 to 4 g/m2 and further forming a protective layer having a film thickness of from 2 to 8 g/m2 on a support having a centerline average height (Ra) of at least 0.35 ?m.Type: GrantFiled: March 5, 2003Date of Patent: March 1, 2005Assignee: Lastra S.p.A.Inventors: Eriko Toshimitsu, Hideaki Okamoto
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Publication number: 20040131975Abstract: A photosensitive lithographic printing plate comprises a photosensitive layer and a protective layer formed in this order on a support, wherein the photosensitive layer has a maximum peak of spectral sensitivity within a wavelength range ranging from 390 to 430 nm, the minimum exposure for the photosensitive lithographic printing plate for image formation at a wavelength of 410 nm (S410) is at most 100 &mgr;J/cm2, and the relation between the minimum exposure for image formation at a wavelength of 450 nm (S450) and the minimum exposure for image formation at a wavelength of 410 nm (S410) is 0<S410/S450≦0.1.Type: ApplicationFiled: December 18, 2003Publication date: July 8, 2004Applicant: LASTRA S.p.A.Inventors: Toshiyuki Urano, Kazuhiro Kohori, Hideaki Okamoto
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Patent number: 6689537Abstract: A photosensitive lithographic printing plate comprises a photosensitive layer and a protective layer formed in this order on a support, wherein the photosensitive layer has a maximum peak of spectral sensitivity within a wavelength range ranging from 390 to 430 nm, the minimum exposure for the photosensitive lithographic printing plate for image formation at a wavelength of 410 nm (S410) is at most 100 &mgr;J/cm2, and the relation between the minimum exposure for image formation at a wavelength of 450 nm (S450) and the minimum exposure for image formation at a wavelength of 410 nm (S410) is 0<S410/S450<0.1.Type: GrantFiled: April 19, 2001Date of Patent: February 10, 2004Assignee: Lastra S.p.A.Inventors: Toshiyuki Urano, Kazuhiro Kohori, Hideaki Okamoto
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Patent number: 6620572Abstract: A heat-sensitive composition of the positive type comprising a polymeric binder and a solubility inhibitor, wherein the said solubility inhibitor consists of an organometallic compound, with the exclusion of the metallocenes, an organic salt or an organic complex of an inorganic salt of a metal belonging to the group IIIA or transition group of the periodic system of the elements.Type: GrantFiled: July 28, 2000Date of Patent: September 16, 2003Assignee: Lastra S.p.A.Inventors: Roberto Bernardini, Domenico Tiefenthaler, Angelo Bolli
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Patent number: 6500600Abstract: A heat-sensitive composition of the positive type comprising a polymeric binder and a solubility inhibitor, wherein the said solubility inhibitor is a hydroxylated acrylic polymer, a hydroxylated acrylic copolymer or of a derivative thereof wherein some hydroxyl groups have been esterified by a carboxylic acid or a reactive derivative thereof.Type: GrantFiled: July 28, 2000Date of Patent: December 31, 2002Assignee: Lastra S.p.A.Inventors: Roberto Bernardini, Domenico Tiefenthaler, Angelo Bolli
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Patent number: 6376150Abstract: An IR- and UV-radiation-sensitive composition comprising a diazo resin, a diazo ester, at least one novolac resin and an IR-ray absorber. A lithographic plate comprising a support coated with the said photosensitive composition.Type: GrantFiled: May 11, 1999Date of Patent: April 23, 2002Assignee: Lastra S.p.A.Inventors: Angelo Bolli, Paolo Peveri, Andrea Tettamanti