Abstract: An apparatus for deflecting laser radiation comprises: a first lens array comprising a plurality of first lenses arranged next to one another to permit the laser radiation to at least partially pass through the first lens array; a second lens array comprising a plurality of second lenses arranged next to one another to at least partially pass through the second lens array laser radiation that has passed through the first lens array; a rotatable or pivotable first mirror arranged between the first and second lens arrays to deflect in a direction of the second lens array the laser radiation that has passed through the first lens array; and an objective lens to focus laser radiation that has passed through the second lens array into a working plane.

Abstract: An apparatus for deflecting and/or modulating a laser radiation, wherein the laser radiation is a plurality of laser beams. The apparatus comprises a plurality of deflecting elements configured as mirror elements or transparent components, and movement apparatus that is capable of moving the plurality of deflecting elements individually or in groups. The movement apparatus comprises a plurality of piezo actuators which are capable of performing a translatory motion.

Abstract: The invention relates to a device (20) for producing an electron beam (4), which comprises a hot cathode (1), a cathode electrode (2), an anode electrode (3) having an opening (6) through which an electron beam (4) produced by the device can pass, wherein during the operation of the device (20) a voltage for accelerating the electrons exiting from the hot cathode (1) is applied between the cathode electrode (2) and the anode electrode (3), and further comprising deflection means that can deflect the electron beam (4) that has passed through the opening of the anode electrode (3), wherein the deflection means comprise at least one deflection electrode (8, 12), which can reflect the electron beam (4) and/or which comprises a deflection surface (9) that is inclined towards the propagation direction of the electron beam (4).

Abstract: A method for producing a solar cell, in particular a silicon thin-film solar cell, wherein a TCO layer (3) is deposited on a glass substrate (1) and at least a silicon layer (4, 5) is deposited on the TCO layer (3), wherein the glass substrate (1) is exposed to electron radiation prior to the application of the TCO layer (3), thereby producing a light-scattering layer (2) of the glass substrate (1), onto which the TCO layer (3) is deposited. Alternatively or additionally, a first silicon layer (4) may be deposited on the TCO layer (3), wherein the first silicon layer (4) is exposed to laser radiation or electron radiation, and wherein a second silicon layer (5) is deposited on the irradiated first silicon layer (4).