Abstract: A low-profile intercranial device adapted for housing a functional neurosurgical implant in manner providing for convenient and reliable grounding to ensure proper impedance measurements includes a static cranial implant including a base cranial implant member including an outer first surface, an inner second surface, and a recess shaped and dimensioned for receiving a functional neurosurgical implant. The low-profile intercranial device includes a plurality of fluid passageways extending between the inner second surface and the recess allowing for the flow of bodily fluid between an external environment of the base cranial implant member and a cavity defined by the recess.

Abstract: A universal low-profile intercranial assembly includes a mounting plate and a low profile intercranial device composed of a static cranial implant and an interdigitating functional neurosurgical implant. The low profile intercranial device is shaped and dimensioned for mounted to the mounting plate.

Abstract: A low-profile intercranial device including a low-profile static cranial implant and a functional neurosurgical implant. The low-profile static cranial implant and the functional neurosurgical implant are virtually designed and interdigitated prior to physical assembly of the low-profile intercranial device.

Abstract: A cerebral spinal fluid shunt plug includes a shunt plug housing having a shunt valve recess formed therein and an intracranial monitoring device recess with an access hole. A shunt valve is positioned within the shunt valve recess of the shunt plug housing and an intracranial monitoring device is passed through the central access hole of the shunt plug housing.

Abstract: A low-profile intercranial device adapted for housing a functional neurosurgical implant in manner providing for convenient and reliable grounding to ensure proper impedance measurements includes a static cranial implant including a base cranial implant member including an outer first surface, an inner second surface, and a recess shaped and dimensioned for receiving a functional neurosurgical implant. The low-profile intercranial device includes a plurality of fluid passageways extending between the inner second surface and the recess allowing for the flow of bodily fluid between an external environment of the base cranial implant member and a cavity defined by the recess.

Abstract: A method for performing a cranioplasty includes the steps of prefabricating a sonolucent craniofacial implant based upon information generated by preoperative scans, creating a cranial, craniofacial, and/or facial defect, and attaching the craniofacial implant to the cranial, craniofacial, and/or facial defect. The craniofacial implant is composed of a material that is sonolucent and exhibits attenuation of less than 6 dB/cm.

Abstract: A cranial implant for access to a cerebral cortex includes a window member shaped and dimensioned for positioning within a dural defect to provide access through the dura such that access to the cerebral cortex is provided in a location under study. An implant body is provided having a geometry that substantially conforms to a resected portion of a patient's anatomy to which the implant body is to be secured.

Abstract: A cerebral spinal fluid shunt plug includes a shunt plug housing having a recess formed therein and a shunt valve shaped and dimensioned for positioning within the recess of the shunt plug housing.

Abstract: A low-profile intercranial device including a low-profile static cranial implant and a functional neurosurgical implant. The low-profile static cranial implant and the functional neurosurgical implant are virtually designed and interdigitated prior to physical assembly of the low-profile intercranial device.

Abstract: A method for single-stage cranioplasty reconstruction includes prefabricating a clear craniofacial implant, creating a cranial, craniofacial, and/or facial defect, positioning the clear craniofacial implant over the cranial, craniofacial, and/or facial defect, tracing cut lines on the clear craniofacial implant as it lies over the cranial, craniofacial, and/or facial defect, cutting the prefabricated clear custom craniofacial implant along the hand-marked lines for optimal fit of the clear implant within the cranial, craniofacial, and/or facial defect, and attaching the final clear craniofacial implant to the cranial, craniofacial, and/or facial defect with standard fixation methods of today.