Abstract: A hydrous silica gel is dehydrated by freezing, thawing, and removing water separated by thawing, thereby yielding silica particles. In addition, the silica particles thus formed is washed and fired, thereby producing a synthetic quartz glass power. A water glass is dealkalized, an oxidizing agent and an acid are added, the mixture thus formed is passed through a hydrogen type cation exchange resin, the aqueous silica solution thus formed is then gelled, and the gelled material is then washed and fired, thereby producing a synthetic quartz powder. Silica is sequentially held for a predetermined time at each temperature range of 150 to 400° C., 500 to 700° C., and 1,100 to 1,300° C., thereby producing a quartz glass.

Abstract: Organic matter and metal impurities present on the surface of a photomask are removed. Foreign matter still adhering to the surface of the photomask is removed with H2 gas dissolved water. The photomask is dried. Thus provided is a method of washing a photomask in a manner which permits attaining an effect of removing foreign matter equivalent or superior to that of a conventional method with a small amount of chemical solution and reducing the amounts of chemicals and high purity water.

Abstract: A decomposition apparatus is provided that includes an excimer lamp emitting UV light for decomposing an organic compound and a decomposition container provided with the excimer lamp for decomposing the organic compound in a liquid or a gas. In the decomposition apparatus, since the UV light irradiated from the excimer lamp is emitted to the liquid or the gas, the organic compound in the liquid or the gas can be decomposed easily by the simple decomposition apparatus and method. The decomposition apparatus and method are effective to decompose the organic compound, such as dioxin (polychlorinated dibenzo-para-dioxin), PCB (polychiorinated biphenyl), trichloroethylene or the like, polluting the air or water to purify the environment.

Abstract: Organic matter and metal impurities present on the surface of a photomask are removed. Foreign matter still adhering to the surface of the photomask is removed with H2 gas dissolved water. The photomask is dried. Thus provided is a method of washing a photomask in a manner which permits attaining an effect of removing foreign matter equivalent or superior to that of a conventional method with a small amount of chemical solution and reducing the amounts of chemicals and high purity water.

Abstract: To provide a photomask cleaning method which brings about a high effect of removing residual sulfuric acid or foreign objects and can remove foreign objects effectively without fluctuating the transmission or other properties of the light-shielding layer (MoSiON film) in a phase shift photomask.

Abstract: Organic matter and metal impurities present on the surface of a photomask are removed. Foreign matter still adhering to the surface of the photomask is removed with H2 gas dissolved water. The photomask is dried. Thus provided is a method of washing a photomask in a manner which permits attaining an effect of removing foreign matter equivalent or superior to that of a conventional method with a small amount of chemical solution and reducing the amounts of chemicals and high purity water.

Abstract: There are provided a decomposition apparatus by emission of a UV light which is irradiated from an excimer lamp, a decomposition method thereof and an excimer lamp and an excimer emission apparatus which may suitable be used for a decomposition apparatus and a decomposition method of an organic compound. The decomposition apparatus comprises an excimer lamp emitting UV light for decomposing the organic compound and a decomposition container provided with the excimer lamp for decomposing the organic compound in a liquid or a gas. In the decomposition apparatus, since the UV light irradiated from excimer lamp is emitted to the liquid or the gas, the organic compound in the liquid or the gas can be decomposed easily by the simple decomposition apparatus and method.

Abstract: To provide a photomask cleaning method which brings about a high effect of removing residual sulfuric acid or foreign objects and can remove foreign objects effectively without fluctuating the transmission or other properties of the light-shielding layer (MoSiON film) in a phase shift photomask.

Abstract: Disclosed herein are several aspects processes of preparing a polymer electrolyte electrochemical cell in which supply of a reaction gas and discharge of an obtained gas can be smoothly conducted. This can be achieved by forming through apertures in a cathode or by forming a gradient of ion exchange resin concentration of a catalyst particle cluster size.

Abstract: A lower alcohol is recovered from a mixed liquid thereof with water, derived from a vapor drying procedure for a water-wetted article, for example, a water-washed lens or semiconductor wafer, by feeding the mixed liquid of a lower alcohol with water from the vapor drying procedure to a vaporizer; vaporizing the mixed liquid; feeding the mixed vapor into a gas-separating module comprising at least one gas-separating membrane, for example, composed of a aromatic polyimide hollow fiber, which allows a selective permeation of water vapor from a feed side to a permeated side therethrough, withdrawing a non-permeated vapor fraction containing the lower alcohol in an increased concentration from the feed side, and converting the vapor fraction to a high purity lower alcohol liquid by cooling, while discharging a permeated vapor fraction containing water in an increased concentration from the permeated side.