Patents Assigned to Marlborough,
  • Patent number: 11083175
    Abstract: The system, apparatus and method of the present invention provides for the cultivation of shellfish in subtidal environments. A key aspect of the invention is the use of specially configured baskets, into which the shellfish to be grown is seeded. In particular, the baskets are configured with a support bracket through which a cable passes. The mounting of the support bracket permits the rotation of the basket and allows a shellfish cultivator to replicate the growing conditions of intertidal ecosystems despite the invention being used in a subtidal environment.
    Type: Grant
    Filed: January 31, 2019
    Date of Patent: August 10, 2021
    Assignee: MARLBOROUGH OYSTERS LIMITED
    Inventor: Aaron Peter Pannell
  • Patent number: 8542235
    Abstract: A system and method for displaying complex scripts with a cloud computing architecture may include a client device and a cloud computing server. The client device accesses a web application via the internet and transmits a request containing complex scripts to the cloud computing server. The cloud computing server parses the text and breaks the text down to a sequence of characters of a particular script, and maps the Unicode of each character to a particular glyph to obtain a glyph ID for each character making a one to one relationship. The cloud computing server analyzes each character, assigns, and applies specific font related operations to each glyph. The cloud computing server optimizes and compresses the glyph ID and positioning data, and transmit the compressed data back to the client device to be rendered on the display of the client device.
    Type: Grant
    Filed: October 13, 2010
    Date of Patent: September 24, 2013
    Assignee: Marlborough Software Development Holdings Inc.
    Inventors: Lokesh Joshi, Himanshu Joshi
  • Patent number: 6878500
    Abstract: Compositions and methods for the removal of patterned photodefinable materials, such as photoresists and/or photoimageable dielectric materials, from substrates are provided. Such compositions and methods are useful in the manufacture of electronic devices. Methods of reworking electronic device substrates by removing patterned photodefinable material from an underlying organic film are also provided.
    Type: Grant
    Filed: April 5, 2003
    Date of Patent: April 12, 2005
    Assignee: Marlborough,
    Inventors: Edward W. Rutter, Jr., Cuong Manh Tran, Edward C. Orr
  • Publication number: 20020000382
    Abstract: Disclosed are methods of repairing metal seed layers prior to subsequent metallization. Such repair methods provide metal seed layers disposed on a substrate that are substantially free of metal oxide and substantially free of discontinuities.
    Type: Application
    Filed: December 15, 2000
    Publication date: January 3, 2002
    Applicant: Shipley Company, L.L.C. of Marlborough
    Inventors: Denis Morrissey, David Merricks, Leon R. Barstad, Eugene N. Step, Jeffrey M. Calvert, Robert A. Schetty, James G. Shelnut, Mark Lefebvre, Martin W. Bayes, Donald E. Storjohann
  • Publication number: 20010051318
    Abstract: Disclosed are compositions useful for the pretreatment of polymeric material to be removed from substrates, such as electronic devices. The compositions of the present invention are particularly suitable for pretreating polymer residues from plasma etch processes. Also disclosed are methods of removing such pretreated polymeric material.
    Type: Application
    Filed: May 25, 2001
    Publication date: December 13, 2001
    Applicant: Shipley Company, L.L.C. of Marlborough, Massachusetts
    Inventor: John Cheung-Shing Chu
  • Patent number: 5919597
    Abstract: Methods are provided to prepare photoresists without isolation of various components, i.e. in a "one-pot" procedure. Preferred one-pot preparation methods of the invention include preparing a photoresist resin binder in a selected photoresist solvent and, without isolation of the resin binder from the solvent, adding a photoactive component and any other desired photoresist materials to the resin binder in solution to thereby provide a liquid photoresist composition in the solvent in which the resin binder was prepared. The invention also provides novel methods for synthesizing resist resin binders, particularly phenolic polymers that contain phenolic OH groups covalently bonded to another moiety such as acid labile groups or inert blocking groups.
    Type: Grant
    Filed: October 30, 1997
    Date of Patent: July 6, 1999
    Assignees: IBM Corporation of Armonk, Shipley Company, L.L.C. of Marlborough
    Inventors: Roger F. Sinta, Uday Kumar, George W. Orsula, James I. T. Fahey, William R. Brunsvold, Wu-Song Huang, Ahmad D. Katnani, Ronald W. Nunes, Mahmoud M. Khojasteh