Patents Assigned to Meiwa Plastic Industries, Ltd.
  • Patent number: 8981014
    Abstract: The present invention provides a novel phosphorus-containing phenolic resin. When the phosphorus-containing phenolic resin is used as an epoxy resin curing agent, the cured product thereof has various excellent properties such as excellent moisture resistance, low permittivity, a low dissipation factor, and excellent adhesion in addition to improved flame retardation. Specifically, the phosphorus-containing phenolic resin of the invention is represented by formula (1). The invention also provides a method for manufacturing the novel phosphorus-containing phenolic resin, a phenolic resin composition including the phosphorus-containing phenolic resin, an epoxy resin curing agent including the phenolic resin composition, an epoxy resin composition including the epoxy resin curing agent and an epoxy resin, a cured product obtained by curing the epoxy resin composition, and a copper-clad laminated plate obtained by using the epoxy resin composition as a matrix resin.
    Type: Grant
    Filed: May 16, 2014
    Date of Patent: March 17, 2015
    Assignees: Meiwa Plastic Industries, Ltd., UFC Corporation
    Inventors: Masato Takenouchi, Tadatoshi Fujinaga, Erina Kimura, Yu-Chin Lee, Jen-Hai Liao, Sung-Chen Lo
  • Publication number: 20140378622
    Abstract: The present invention provides a novel phosphorus-containing phenolic resin. When the phosphorus-containing phenolic resin is used as an epoxy resin curing agent, the cured product thereof has various excellent properties such as excellent moisture resistance, low permittivity, a low dissipation factor, and excellent adhesion in addition to improved flame retardation. Specifically, the phosphorus-containing phenolic resin of the invention is represented by formula (1). The invention also provides a method for manufacturing the novel phosphorus-containing phenolic resin, a phenolic resin composition including the phosphorus-containing phenolic resin, an epoxy resin curing agent including the phenolic resin composition, an epoxy resin composition including the epoxy resin curing agent and an epoxy resin, a cured product obtained by curing the epoxy resin composition, and a copper-clad laminated plate obtained by using the epoxy resin composition as a matrix resin.
    Type: Application
    Filed: May 16, 2014
    Publication date: December 25, 2014
    Applicants: MEIWA PLASTIC INDUSTRIES, LTD., UFC CORPORATION
    Inventors: Masato Takenouchi, Tadatoshi Fujinaga, Erina Kimura, Yu-Chin Lee, Jen-Hai Liao, Sung-Chen Lo
  • Publication number: 20130307167
    Abstract: The present invention relates to techniques including a phenolic oligomer of general formula (1): wherein n is an integer of 0 to 15, Rs are allyl groups, a1 and a3 are each independently 0, 1, 2 or 3, each a2 is independently 0, 1 or 2, each R? is independently a hydrogen atom, an alkyl group having 1 to 10 carbon atoms or an aryl group, and proviso that at least one of a1, each a2 and a3 represents 2, and a method for producing such phenolic oligomer.
    Type: Application
    Filed: October 26, 2011
    Publication date: November 21, 2013
    Applicant: MEIWA PLASTIC INDUSTRIES, LTD.
    Inventors: Kiyoshi Oomori, Yasunori Fukuda, Yoshikazu Nakagawa, Yoshitaka Ooue, Noriyuki Mitani
  • Patent number: 5612442
    Abstract: A bis(methoxymethyl)biphenyl having the formula (I): ##STR1## which is capable of producing by a dehalogenating coupling of a halogenated methoxymethylbenzene and which is useful as an intermediate for a phenol novolak condensate, an epoxy resin curing agent, an epoxy resin composition, or a phenol resin composition.
    Type: Grant
    Filed: September 19, 1995
    Date of Patent: March 18, 1997
    Assignees: Ube Industries, Ltd., Meiwa Plastic Industries, Ltd.
    Inventors: Katuhiko Okazaki, Mikito Kashima, Yumiki Noda, Hiroshi Jibiki, Takashi Honma