Patents Assigned to METAMATERIAL TECHNOLOGIES USA, INC.
  • Patent number: 10395461
    Abstract: Aspects of the present disclosure include an anti-counterfeiting pattern that is identifiable by sheet resistance mapping metrology, a method of fabricating such an anti-counterfeiting device, and a method of detecting such an anti-counterfeiting device by imaging the pattern with sheet resistance mapping metrology. This abstract is provided to comply with rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.
    Type: Grant
    Filed: November 23, 2016
    Date of Patent: August 27, 2019
    Assignee: METAMATERIAL TECHNOLOGIES USA, INC.
    Inventor: Boris Kobrin
  • Patent number: 10262489
    Abstract: Aspects of the present disclosure include an anti-counterfeiting pattern that is identifiable by sheet resistance mapping metrology, a method of fabricating such an anti-counterfeiting device, and a method of detecting such an anti-counterfeiting device by imaging the pattern with sheet resistance mapping metrology. This abstract is provided to comply with rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.
    Type: Grant
    Filed: November 23, 2016
    Date of Patent: April 16, 2019
    Assignee: METAMATERIAL TECHNOLOGIES USA, INC.
    Inventor: Boris Kobrin
  • Patent number: 9981410
    Abstract: A cylindrical mask may be fabricated using a hollow casting cylinder and a mask cylinder. The casting cylinder has an inner diameter that is larger than the outer diameter of the mask cylinder. The casting and mask cylinders are coaxially assembled and a liquid polymer inserted in a space surrounding the mask cylinder between the inner surface of the casting cylinder and the outer surface of the mask cylinder. After curing the liquid polymer, the casting cylinder is removed. A surface of the cured polymer can be patterned. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.
    Type: Grant
    Filed: August 12, 2016
    Date of Patent: May 29, 2018
    Assignee: METAMATERIAL TECHNOLOGIES USA, INC.
    Inventors: Boris Kobrin, Oliver Seitz, Bruce Richardson, Ian McMackin, Mukti Aryal, Bryant Grigsby
  • Patent number: 9782917
    Abstract: Aspects of the present disclosure describe cylindrical molds that may be used to produce cylindrical masks for use in lithography. A structured porous layer may be deposited on an interior surface of a cylinder. A radiation-sensitive material may be deposited over the porous layer in order to fill pores formed in the layer. The radiation-sensitive material in the pores may be cured by exposing the cylinder with a light source. The uncured resist and porous layer may be removed, leaving behind posts on the cylinder's interior surface. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.
    Type: Grant
    Filed: January 31, 2013
    Date of Patent: October 10, 2017
    Assignee: METAMATERIAL TECHNOLOGIES USA, INC.
    Inventors: Boris Kobrin, Ian McMackin
  • Patent number: 9645504
    Abstract: Embodiments of the invention relate to methods and apparatus useful in the nanopatterning of large area substrates, where a rotatable mask is used to image a radiation-sensitive material. Typically the rotatable mask comprises a cylinder. The nanopatterning technique makes use of Near-Field photolithography, where the mask used to pattern the substrate is in contact or close proximity with the substrate. The Near-Field photolithography may make use of an elastomeric phase-shifting mask, or may employ surface plasmon technology, where a rotating cylinder surface comprises metal nano holes or nanoparticles.
    Type: Grant
    Filed: March 9, 2012
    Date of Patent: May 9, 2017
    Assignee: METAMATERIAL TECHNOLOGIES USA, INC.
    Inventor: Boris Kobrin
  • Patent number: 9481112
    Abstract: Aspects of the present disclosure include a cylindrical master mold assembly having a cylindrical patterned component with a first diameter and a sacrificial casting component with a second diameter. The component with the smaller radius may be co-axially inserted into the interior of the component with the larger radius. Patterned features may be formed on the interior surface of the cylindrical patterned component that faces the sacrificial casting component. The sacrificial casting component may be removed once a cast polymer has been cured to allow the polymer to be released. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.
    Type: Grant
    Filed: January 31, 2013
    Date of Patent: November 1, 2016
    Assignee: METAMATERIAL TECHNOLOGIES USA, INC.
    Inventors: Boris Kobrin, Ian McMackin