Patents Assigned to Micrion Corporation
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Publication number: 20020145391Abstract: A focused particle beam system, according to one embodiment of the invention, precisely shapes a pole-tip assembly formed by a multi-layer device having a first layer with a first structural element, a second layer with a second structural element, and a shielding layer with a shielding element, the shielding element being located between the first layer and the second layer. The focused particle beam system mills the second structural element without irradiating a first structural element. The system images a selected portion of the multi-layer device to locate the shielding element and thereby avoids irradiating the first structural element. The shielding element separates the first structural element from the second structural element. Based on the location of the shielding element, the system images and mills the second structural element without irradiating the first structural element.Type: ApplicationFiled: December 18, 2001Publication date: October 10, 2002Applicant: Micrion CorporationInventors: Gregory J. Athas, Russel Mello
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Publication number: 20020144892Abstract: This invention relates to a multi-layer lithographically fabricated device used to produce improved thin-film recording heads. It further relates to a focused particle beam system for milling a recording head pole-tip assembly without irradiating a sensitive structure, e.g. a read head, of the recording head. The invention precisely forms a pole-tip assembly by milling a second structural element without irradiating a first structural element. The invention avoids irradiating the first structural element by placing a first marker element, which can be imaged and/or damaged, in the same layer of a multi-layer lithographically fabricated device as the first structural element. The marker element has a fixed spatial relationship to the first structural element.Type: ApplicationFiled: February 28, 2002Publication date: October 10, 2002Applicant: Micrion CorporationInventors: Randall Grafton Lee, Charles J. Libby
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Patent number: 6354438Abstract: This invention relates to a multi-layer lithographically fabricated device used to produce improved thin-film recording heads. It further relates to a focused particle beam system for milling a recording head pole-tip assembly without irradiating a sensitive structure, e.g. a read head, of the recording head. The invention precisely forms a pole-tip assembly by milling a second structural element without irradiating a first structural element. The invention avoids irradiating the first structural element by placing a first marker element, which can be imaged and/or damaged, in the same layer of a multi-layer lithographically fabricated device as the first structural element. The marker element has a fixed spatial relationship to the first structural element.Type: GrantFiled: August 9, 1999Date of Patent: March 12, 2002Assignee: Micrion CorporationInventors: Randall Grafton Lee, Charles J. Libby, Donald E. Yansen, Gregory J. Athas, Raymond Hill, Russell Mello
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Patent number: 6332962Abstract: A focused particle beam system, according to one embodiment of the invention, precisely shapes a pole-tip assembly formed by a multi-layer device having a first layer with a first structural element, a second layer with a second structural element, and a shielding layer with a shielding element, the shielding element being located between the first layer and the second layer. The focused particle beam system mills the second structural element without irradiating a first structural element. The system images a selected portion of the multi-layer device to locate the shielding element and thereby avoids irradiating the first structural element. The shielding element separates the first structural element from the second structural element. Based on the location of the shielding element, the system images and mills the second structural element without irradiating the first structural element.Type: GrantFiled: April 30, 1998Date of Patent: December 25, 2001Assignee: Micrion CorporationInventors: Gregory J. Athas, Russel Mello
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Patent number: 6113056Abstract: The present invention provides an apparatus for supporting a workpiece in a precision processing system. The apparatus includes a plurality of workpiece contact elements for supporting the workpiece substantially in a plane, and a compliant stiction support for reducing workpiece vibration. The workpiece supporting apparatus can include a base member connected to the workpiece contact elements and to the compliant stiction support. The complaint stiction support can include a slider assembly for contacting the workpiece. The slider assembly is in sliding, frictional connection with the base member. The compliant stiction support can further include a workpiece contact spring element for forcing the slider assembly into contact with the workpiece. The compliant stiction support can further include a stiction spring element. The stiction spring element is in contact with the slider element. The stiction spring element forces the slider element into frictional contact with the base member.Type: GrantFiled: August 4, 1998Date of Patent: September 5, 2000Assignee: Micrion CorporationInventor: Allen Armstrong
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Patent number: 6042738Abstract: The present invention generally provides methods for employing a focused particle beam system in the removal of an excess portion from a workpiece having an opaque film patterned on a substrate and more particularly provides methods of gas-assisted etching using an etching gas including bromine.Type: GrantFiled: April 16, 1997Date of Patent: March 28, 2000Assignee: Micrion CorporationInventors: J. David Casey, Jr., Andrew Doyle
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Patent number: 6039000Abstract: Particle beam systems and methods for interacting with a workpiece according to this invention include a work stage assembly and a first particle beam source. The work stage assembly is adapted a) for supporting a workpiece, b) for translating along a first axis, c) for translating along a second axis perpendicular to the first axis, and d) for rotating about a third axis perpendicular to both the first axis and the second axis. The work stage assembly has a work stage axis substantially parallel to the third axis. The first particle beam source for interacting with the workpiece is supported by the work stage assembly. The first particle beam source has a first particle beam axis. In one embodiment, the first particle beam source is oriented so that the first particle beam axis forms an angle with the third axis.Type: GrantFiled: February 11, 1998Date of Patent: March 21, 2000Assignee: Micrion CorporationInventors: Charles J. Libby, Billy W. Ward
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Patent number: 6004437Abstract: This invention relates to a multi-layer lithographically fabricated device used to produce improved thin-film recording heads. It further relates to a focused particle beam system for milling a recording head pole-tip assembly without irradiating a sensitive structure, e.g. a read head, of the recording head. The invention precisely forms a pole-tip assembly by milling a second structural element without irradiating a first structural element. The invention avoids irradiating the first structural element by placing a first marker element, which can be imaged and/or damaged, in the same layer of a multi-layer lithographically fabricated device as the first structural element. The marker element has a fixed spatial relationship to the first structural element.Type: GrantFiled: March 4, 1997Date of Patent: December 21, 1999Assignee: Micrion CorporationInventors: Randall Grafton Lee, Charles J. Libby
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Patent number: 5916424Abstract: Thin-film magnetic recording heads and systems and processes for manufacturing the same are disclosed. In one embodiment, the invention is understood as a focused particle beam system that includes a pattern recognition element and that employs the pattern recognition element to image and analyze the pole-tip assembly footprint of a recording head and that employs a processor to generate instruction signals that direct a focused particle beam to remove selected portions of the recording head and thereby shape the pole-tip assembly of the recording head. The focused particle beam system provides a precision milling device that can employ the coordinate information to mill selectively the recording head and thereby shape the geometry of the pole-tip assembly footprint, including geometries that have contoured surfaces.Type: GrantFiled: April 19, 1996Date of Patent: June 29, 1999Assignee: Micrion CorporationInventors: Charles J. Libby, Donald E. Yansen, Gregory J. Athas, Raymond Hill, Russell Mello
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Patent number: 5851413Abstract: Apparatus and method of an improved gas delivery system for delivering reactant material to a workpiece, such as a substrate, being operated on by a particle beam employs a shroud-type concentrator having an interior axial passage. Fluid reactant material is supplied to the axial passage for delivery to the workpiece. A particle beam can traverse the axial passage for impingement on the workpiece surface, concurrently if desired with the reactant delivery.Type: GrantFiled: June 19, 1996Date of Patent: December 22, 1998Assignee: Micrion CorporationInventors: Robert A. Casella, Charles J. Libby, Gary P. Rathmell
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Patent number: 5155368Abstract: Ion beam apparatus provides beam blanking by utilizing an aperture through which the beam passes during unblanked periods, and elements for deflecting the beam during blanking so that the beam is deflected away from the aperture. Electrodes between the aperture element and the deflecting elements generate a potential exceeding the kinetic energy of charged particles emitted from the aperture element due to ions striking the aperture element during blanking. Charged particles emitted from the aperture element are thus prevented from striking the beam deflecting elements, thereby reducing hydrocarbon cracking, insulator accumulation, and charge accumulation on the deflecting elements. Beam stability is thereby enhanced. Charged particles emitted from the aperture element are also returned to the aperture element, so that an accurate measure of ion beam current is obtained by measuring current flow to the aperture element.Type: GrantFiled: April 16, 1991Date of Patent: October 13, 1992Assignee: Micrion CorporationInventors: David Edwards, Jr., Billy W. Ward
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Patent number: 5103102Abstract: An apparatus for generating a localized, non-contact vacuum seal at a selected process region of a workpiece surface includes a vacuum body with a workpiece-facing surface having a plurality of concentric grooves and a central bore thorugh which a process energy beam can be transmitted. A method of generating a localized vacuum seal includes placing the vacuum body into selected proximity with the process region of the workpiece surface, and differentially evacuating the grooves, thereby defining differentially pumped vacuum chambers which reduce the influx of atmospheric particles to the process region. A selected control gas can be introduced into a vacuum body groove to further reduce the influx of atmospheric particles to the process region, and selected process gases can be introduced into the vacuum body to react with the process beam.Type: GrantFiled: February 24, 1989Date of Patent: April 7, 1992Assignee: Micrion CorporationInventors: Nicholas P. Economou, David Edwards, Jr., Nicholas Guarino
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Patent number: 5034612Abstract: Ion source methods and apparatus include an ion generating element for providing a reservoir of flowing liquid source material, accelerating elements for providing an electric field around the ion generating element, and shielding elements. The shielding element is constructed from a material including atoms which, if backsputtered onto the ion generating element, do not substantially degrade ion source performance.Type: GrantFiled: December 3, 1990Date of Patent: July 23, 1991Assignee: Micrion CorporationInventors: Billy W. Ward, Randall G. Percival
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Patent number: 4976843Abstract: An apparatus is described for allowing an ion beam and an electron beam to travel toward a predetermined region of a substrate surface during the sputter etching and imaging of insulating and other targets while preventing deflection of the electron beam by sources of stray electrostatic fields on the substrate surface. A metal shield is provided having a funnel-shaped portion leading to an orifice. The incident finely focused ion beam, together with the electron beam, which is used to neutralize the charge created by the incident ion beam, pass to the target through the orifice. The shield also physically supports a gas injection needle that injects a gas through the orifice toward the predetermined region.Type: GrantFiled: February 2, 1990Date of Patent: December 11, 1990Assignee: Micrion CorporationInventors: Billy W. Ward, David Edwards, Jr., Robert A. Casella
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Patent number: 4943732Abstract: Methods and apparatus for locating defects in liquid crystal display (LCD) panels include scanning the panel with a laser, detecting reflected, refracted, scattered or transmitted light, and processing signals representative of the detected light utilizing a digital processor, to detect discontinuities in the arrays of LCD elements on the panel.Type: GrantFiled: August 16, 1989Date of Patent: July 24, 1990Assignee: Micrion CorporationInventor: Nicholas P. Economou
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Patent number: 4874947Abstract: Ion beam machining apparatus which uses a focused ion beam to sputter particles from a target is disclosed. The beam is scanned over the target and photons emitted in response to the incidence of the beam on the target are analyzed to identify the different materials in the target and the location of these materials. Electrons are projected in a stream to the impingement site of the ion beam, in order to neutralize the charge produced by the beam and thereby stabilize the position of this site, and the photon detectors are isolated from any light emitted by the electron source.Type: GrantFiled: February 26, 1988Date of Patent: October 17, 1989Assignee: Micrion CorporationInventors: Billy W. Ward, Michael L. Ward