Patents Assigned to MicroContinuum, Inc.
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Patent number: 11467397Abstract: Methods are described for forming polarized image films in which a displayed image changes depending on the state of polarization of a backside illumination source. Methods are also described for eliminating the leakage of unpolarized light through certain parts of the images resulting in unwanted visual artifacts in these images. Polarized dual graphic films achieving images with higher optical density and uniformity, minimum ghosting and mis-registration, can be made by a manufacturing technique that is faster, capable of higher production volumes, and that can produce polarized images at a lower cost. An exemplary method provides for forming a polarized image or pattern on an oriented substrate by using a negative patterned resist image or pattern formed by graphic arts techniques, followed by the imbibition of a dichroic dye or iodine ink to form a corresponding positive image in the areas not protected by the resist.Type: GrantFiled: April 25, 2018Date of Patent: October 11, 2022Assignee: MicroContinuum, Inc.Inventors: W. Dennis Slafer, Christine Higgins
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Publication number: 20220246895Abstract: Systems, methods, and structures for improving the performance of thin-film electronic devices, in particular organic LEDs (OLEDs) used in lighting, are disclosed. Enhanced substrates, upon which OLED devices may be deposited, incorporate various structures for extracting light trapped in the device stack and substrate. The substrates provide an improved transparent electrode layer. Methods for forming planarized buried extraction structures to reduce disruption to the deposited device stack layers are disclosed, as are methods for providing smooth, planarized buried metal mesh conductors.Type: ApplicationFiled: February 1, 2022Publication date: August 4, 2022Applicant: MicroContinuum, Inc.Inventor: W. Dennis Slafer
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Patent number: 10879595Abstract: The present disclosure advances the art by providing a method and system for forming electronic devices. In particular, and by example only, methods are described for forming devices for harvesting energy in the terahertz frequency range on flexible substrates, wherein the methods provide favorable accuracy in registration of the various device elements and facilitate low-cost R2R manufacturing.Type: GrantFiled: September 10, 2019Date of Patent: December 29, 2020Assignee: MicroContinuum, Inc.Inventor: W. Dennis Slafer
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Patent number: 10759095Abstract: Methods, apparatus and systems are disclosed by which patterned layers can be formed in a roll-to-roll process using a variable and programmable means for applying liquids and solutions used in the patterning process.Type: GrantFiled: August 7, 2017Date of Patent: September 1, 2020Assignee: MicroContinuum, Inc.Inventor: W. Dennis Slafer
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Patent number: 10737433Abstract: Means, apparatus, systems, and/or methods are described for forming improved rigid or flexible semi-transparent imprinting templates. These templates can be used to produce patterning masks having improved resolution that do not require plasma etching for residue removal. The methods and apparatus are compatible with roll-to-roll manufacturing processes and enable roll-to-roll formation of a wide range of metal patterned films.Type: GrantFiled: September 18, 2014Date of Patent: August 11, 2020Assignee: MicroContinuum, Inc.Inventor: W. Dennis Slafer
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Patent number: 10682805Abstract: Systems, methods, and apparatus are disclosed for making patterning tools from one or more discrete elements. Such tools can have one or more “seams” or joints where the individual elements abut which can limit the tools' performance and utility in roll-to-roll manufacturing. Methods are described herein for producing “near-seamless” tools, that is, tools having seams that exhibit minimum disruption of the tool pattern and thus improved material produced by such tools. The patterning tools can be cylindrical and/or closed in shape.Type: GrantFiled: May 22, 2015Date of Patent: June 16, 2020Assignee: MicroContinuum, Inc.Inventor: W. Dennis Slafer
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Patent number: 10675824Abstract: Methods are disclosed for forming polarized films and glasses having polarization efficiency that is varied in a predetermined design. In particular, such designs include monochrome and color polarization density gradients, where the non-polarized areas of films and glasses allow viewing of polarized displays without distortion. The methods include forming films and glasses that have visually uniform density while still incorporating polarization gradients. The disclosed methods also enable creation of polarization filters and glasses with increased optical density and reduced glare from multiple angles.Type: GrantFiled: January 8, 2018Date of Patent: June 9, 2020Assignee: MicroContinuum, Inc.Inventors: W. Dennis Slafer, Christine Higgins, B. Diane Martin
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Patent number: 10580649Abstract: The present disclosure advances the art by providing a method and system for forming electronic devices. In particular, and by example only, methods are described for forming devices for harvesting energy in the terahertz frequency range on flexible substrates, wherein the methods provide favorable accuracy in registration of the various device elements and facilitate low-cost R2R manufacturing.Type: GrantFiled: March 2, 2017Date of Patent: March 3, 2020Assignee: MicroContinuum, Inc.Inventor: W. Dennis Slafer
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Patent number: 10546607Abstract: Durable seamless replication tools are disclosed for replication of seamless relief patterns in desired media, for example in optical recording or data storage media. Methods of making such durable replication tools are disclosed, including preparing a recording substrate on the inner surface of a support cylinder, recording and developing a relief pattern in the substrate, creating a durable negative relief replica of the pattern, extracting the resulting durable tool sleeve from a processing cell, and mounting the tool sleeve on a mounting fixture. Apparatus are disclosed for fabricating such seamless replication tools, including systems for recording a desired relief pattern on a photosensitive layer on an inner surface of a support cylinder. Also disclosed are electrodeposition cells for forming a durable tool sleeve having a desired relief pattern. The replication tool relief features may have critical dimensions down to the micron and nanometer regime.Type: GrantFiled: July 19, 2016Date of Patent: January 28, 2020Assignee: MicroContinuum, Inc.Inventor: W. Dennis Slafer
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Patent number: 10546722Abstract: Systems and methods are disclosed by which patterns of various materials can be formed on flexible substrates by a continuous roll-to-roll manufacturing process. The patterns may include metallic, transparent conductive, or non-metallic elements with lateral dimensions including in the range from below 100 nanometers to millimeters and with thickness dimensions including the range from tens of Angstroms to greater than 10,000 Angstroms. The substrate may be any material capable of sufficient flexibility for compatibility with roll-based processing equipment, including polymeric films, metallic foils, and thin glass, with polymeric films representing a particularly broad field of application. Methods may include the continuous roll-to-roll formation of a temporary polymeric structure with selected areas open to the underlying substrate, the continuous addition or subtraction of constituent materials, and the continuous removal, where necessary, of the polymeric structure and any excess material.Type: GrantFiled: April 4, 2016Date of Patent: January 28, 2020Assignee: MicroContinuum, Inc.Inventor: W. Dennis Slafer
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Patent number: 10505268Abstract: Techniques are described for fabricating multilayer structures having arrays of conducting elements or apertures in a conductive grid which can be used to form frequency selective surfaces (FSSs), antenna arrays and the like on flexible substrates. Fabrication techniques can include use of a polymer mask or direct dielectric molding. In embodiments utilizing a polymer mask, a temporary 3D polymeric relief pattern is formed on a substrate and used as a mask or stencil to form the desired pattern elements. In an additive process, the conductive material is deposited over the masked surface. Deposition can be followed by mask removal. In the subtractive process, the conductive layer can be deposited prior to formation of the polymer mask, and the exposed parts of the underlying conductive layer can be etched. Other embodiments utilize dielectric molding in which the molded structure itself becomes an integral and permanent part of the FSS structure.Type: GrantFiled: December 18, 2014Date of Patent: December 10, 2019Assignee: MicroContinuum, Inc.Inventor: W. Dennis Slafer
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Patent number: 10135031Abstract: Systems and methods are disclosed for providing working substrates for the deposition of various photonic and electronic devices, in particular for organic light emitting diodes (OLEDs) used for lighting and displays, where these substrates incorporate structural elements that improve the performance of these devices. These elements include nanoscale and microscale relief (3D) patterns on one or both sides of the substrate that are beneficial in controlling light and electrical properties of these devices by, for example, improving light output efficiency and uniformity. The present disclosure describes batch and roll-to-roll (R2R) techniques that allow these performance enhancing substrates to be efficiently formed, and at a much lower cost than can be achieved using prior art. Although one particular application relates to OLED lighting, such substrates can be used to enhance the performance of other devices, including flexible displays, touch screens, energy harvesting cells, sensors, and the like.Type: GrantFiled: May 28, 2018Date of Patent: November 20, 2018Assignee: MicroContinuum, Inc.Inventor: W. Dennis Slafer
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Patent number: 9985248Abstract: Systems and methods are disclosed for providing working substrates for the deposition of various photonic and electronic devices, in particular for organic light emitting diodes (OLEDs) used for lighting and displays, where these substrates incorporate structural elements that improve the performance of these devices. These elements include nanoscale and microscale relief (3D) patterns on one or both sides of the substrate that are beneficial in controlling light and electrical properties of these devices by, for example, improving light output efficiency and uniformity. The present disclosure describes batch and roll-to-roll (R2R) techniques that allow these performance enhancing substrates to be efficiently formed, and at a much lower cost than can be achieved using prior art. Although one particular application relates to OLED lighting, such substrates can be used to enhance the performance of other devices, including flexible displays, touch screens, energy harvesting cells, sensors, and the like.Type: GrantFiled: October 14, 2016Date of Patent: May 29, 2018Assignee: Microcontinuum, Inc.Inventor: W. Dennis Slafer
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Patent number: 9724849Abstract: Methods, apparatus and systems are disclosed by which patterned layers can be formed in a roll-to-roll process using a variable and programmable means for applying liquids and solutions used in the patterning process.Type: GrantFiled: December 2, 2013Date of Patent: August 8, 2017Assignee: MICROCONTINUUM, INC.Inventor: W. Dennis Slafer
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Patent number: 9589797Abstract: The present disclosure advances the art by providing a method and system for forming electronic devices. In particular, and by example only, methods are described for forming devices for harvesting energy in the terahertz frequency range on flexible substrates, wherein the methods provide favorable accuracy in registration of the various device elements and facilitate low-cost R2R manufacturing.Type: GrantFiled: May 19, 2014Date of Patent: March 7, 2017Assignee: MicroContinuum, Inc.Inventor: W. Dennis Slafer
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Patent number: 9395623Abstract: Durable seamless replication tools are disclosed for replication of seamless relief patterns in desired media, for example in optical recording or data storage media. Methods of making such durable replication tools are disclosed, including preparing a recording substrate on the inner surface of a support cylinder, recording and developing a relief pattern in the substrate, creating a durable negative relief replica of the pattern, extracting the resulting durable tool sleeve from a processing cell, and mounting the tool sleeve on a mounting fixture. Apparatus are disclosed for fabricating such seamless replication tools, including systems for recording a desired relief pattern on a photosensitive layer on an inner surface of a support cylinder. Also disclosed are electrodeposition cells for forming a durable tool sleeve having a desired relief pattern. The replication tool relief features may have critical dimensions down to the micron and nanometer regime.Type: GrantFiled: November 22, 2011Date of Patent: July 19, 2016Assignee: MicroContinuum, Inc.Inventor: W. Dennis Slafer
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Patent number: 9307648Abstract: Systems and methods are disclosed by which patterns of various materials can be formed on flexible substrates by a continuous roll-to-roll manufacturing process. The patterns may include metallic, transparent conductive, or non-metallic elements with lateral dimensions including in the range from below 100 nanometers to millimeters and with thickness dimensions including the range from tens of Angstroms to greater than 10,000 Angstroms. The substrate may be any material capable of sufficient flexibility for compatibility with roll-based processing equipment, including polymeric films, metallic foils, and thin glass, with polymeric films representing a particularly broad field of application. Methods may include the continuous roll-to-roll formation of a temporary polymeric structure with selected areas open to the underlying substrate, the continuous addition or subtraction of constituent materials, and the continuous removal, where necessary, of the polymeric structure and any excess material.Type: GrantFiled: January 23, 2009Date of Patent: April 5, 2016Assignee: MicroContinuum, Inc.Inventor: W. Dennis Slafer
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Patent number: 9079349Abstract: Methods are disclosed by which two-dimensional and three-dimensional pattern layers may be formed on non-planar surfaces, including optical elements such as lenses with one or more cylindrical, spherical or aspheric surfaces. Patterns with features in the micro- and/or nano-size regime comprised of organic, inorganic or metallic materials may be formed by the methods described herein.Type: GrantFiled: August 19, 2014Date of Patent: July 14, 2015Assignee: MicroContinuum, Inc.Inventor: W. Dennis Slafer
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Patent number: 9039401Abstract: Systems, methods, and apparatus are disclosed for making patterning tools from one or more discrete elements. Such tools can have one or more “seams” or joints where the individual elements abut which can limit the tools' performance and utility in roll-to-roll manufacturing. Methods are described herein for producing “near-seamless” tools, that is, tools having seams that exhibit minimum disruption of the tool pattern and thus improved material produced by such tools. The patterning tools can be cylindrical and/or closed in shape.Type: GrantFiled: February 27, 2007Date of Patent: May 26, 2015Assignee: MicroContinuum, Inc.Inventor: W. Dennis Slafer
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Patent number: 8940117Abstract: Techniques are described for fabricating multilayer structures having arrays of conducting elements or apertures in a conductive grid which can be used to form frequency selective surfaces (FSSs), antenna arrays and the like on flexible substrates. Fabrication techniques can include use of a polymer mask or direct dielectric molding. In embodiments utilizing a polymer mask, a temporary 3D polymeric relief pattern is formed on a substrate and used as a mask or stencil to form the desired pattern elements. In an additive process, the conductive material is deposited over the masked surface. Deposition can be followed by mask removal In the subtractive process, the conductive layer can be deposited prior to formation of the polymer mask, and the exposed parts of the underlying conductive layer can be etched. Other embodiments utilize dielectric molding in which the molded structure itself becomes an integral and permanent part of the FSS structure.Type: GrantFiled: November 13, 2008Date of Patent: January 27, 2015Assignee: Microcontinuum, Inc.Inventor: W. Dennis Slafer