Abstract: The frequency response of an RF power amplifier in a Cellular Phone Base station is improved by providing a shunt capacitor with the choke coil which interconnects a DC power source to the active device of the amplifier. The cutoff frequency of the bias network can be adjusted so that sum and difference frequencies of multiple-input signals are not attenuated by the feed network thereby permitting the sum and difference frequency signals to be shunted to ground. The linearity and bandwidth of the power amplifier is thus improved.

Abstract: An RF power device including a DMOS field effect transistor has increased efficiency and reduced distortion. A capacitor is connected between the gate and source input of the transistor which swamps non-linear variations of the parasitic capacitance (C.sub.GD) between the gate and drain, thereby offsetting the Miller effect of the feedback provided by the MOS transistor parasitic capacitance. The capacitor, the Ciss of the MOS transistor, and the inductance of input leads provide a device input resonant frequency between the input signal fundamental frequency and the first harmonic.

Abstract: Thermal balance in an array of RF transistor cells in which all transistors are connected in parallel is obtained by interconnecting the transistors to array contacts by means of discrete wire leads. The array is electrically tested and a temperature distribution in the array is obtained. Thereafter, the wire leads are varied in length and height above the plane of the array to improve temperature distribution during test. The steps are repeated as necessary to obtain a desired temperature balance in the array.

Abstract: Disclosed is a method of improving semiconductor device yield by enhancing photoresist adherence to semiconductor substrates during device fabrication. The surface of a layer, such as silicon oxide of silicon nitride, on a semiconductor substrate is coated with a thin layer of oxygen-reactive metal prior to applying photoresist material thereto. The metal is selected from the group consisting of tungsten, titanium, chromium, and combinations thereof; the thickness of the layer of oxygen-reactive metal is of the order of 50-100 .ANG.. The metal coating facilitates the adhesion of the resist material and reduces undercutting of the layer to be etched.

Abstract: An improved dual metallization process in which self-aligned tungsten contacts are formed to closely-spaced emitter or source sites in RF power silicon devices. Low-resistivity ohmic contacts are made by selectively depositing tungsten on the exposed silicon surfaces as a first metal layer without a photomasking process and after a dielectric layer deposition and via opening process. The metallization process is completed by depositing a second metal or polysilicon layer on the dielectric layer and through vias to selected tungsten contacts. The tungsten combines with doped silicon in the emitter or source regions to form the low-resistivity ohmic contacts without the requirement of a platinum or palladium deposition and siliciding step as in prior art. The tungsten is preferably chemical-vapor-deposited in a two-temperature step when a first few hundred Angstroms of tungsten are grown at a low temperature on the order of 250.degree. C.-350.degree. C.