Abstract: A method is provided for forming films comprising Fe, Ru or Os employing the techniques of chemical vapor deposition to decompose a vapor comprising an organometallic compound of the formula (a): (CO).sub.4 ML or (b): M.sub.2 [.mu.-.eta.:.eta..sup.4 -C.sub.4 ](CO).sub.6 ; wherein L is a two-electron donor ligand and each R is H, halo, OH, alkyl, perfluoroalkyl or aryl; so as to deposit a coating comprising one or more of said metals on the surface of a substrate.
Type:
Grant
Filed:
July 28, 1992
Date of Patent:
May 24, 1994
Assignee:
Minnesota Mining & Mfg. Co./Regents of the University of Minnesota
Inventors:
Fred B. McCormick, Wayne L. Gladfelter, Yoshihide Senzaki