Patents Assigned to Mitsubishi Gas Chemical Company, Inc.
  • Publication number: 20230096312
    Abstract: Provided is a resist composition which contains a resin (A) and a solvent (B) that contains a compound (B1) represented by general formula (b-1), wherein the content of the active ingredients based on the total amount of the resist composition is 45% by mass or less. (In formula (b-1), R1 represents an alkyl group having from 1 to 10 carbon atoms.
    Type: Application
    Filed: February 17, 2021
    Publication date: March 30, 2023
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Takumi OKADA, Hideyuki SATO, Masayuki KATAGIRI, Shu SUZUKI
  • Patent number: 11613720
    Abstract: An aqueous composition includes (A) from 0.001 to 20 mass % of one or more kinds of fluorine-containing compounds selected from tetrafluoroboric acid, hexafluorosilicic acid, hexafluoroaluminic acid, hexafluorotitanic acid and a salt thereof, with respect to the total amount of the aqueous composition; and (B) from 0.0001 to 10 mass % of one or more kinds of compounds selected from a C4-13 alkylphosphonic acid, a C4-13 alkylphosphonate ester, a C4-13 alkyl phosphate and a salt thereof, with respect to the total amount of the aqueous composition.
    Type: Grant
    Filed: April 25, 2019
    Date of Patent: March 28, 2023
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Toshiyuki Oie, Akinobu Horita, Takahiro Kikunaga, Kenji Yamada
  • Publication number: 20230088428
    Abstract: Provided is a thermoforming laminate, etc., having good thermoforming properties as well as excellent chemical resistance and abrasion resistance. Examples of solutions to the problem include a thermoformable laminate, including: (a) a substrate layer containing a thermoplastic resin; (b) a post-cure type hard coat layer containing an active-energy-ray-curable resin having a (meth)acryloyl group, the hard coat layer also containing a polymerization inhibitor; and (c) a protective film, wherein: (a) the substrate layer, (b) the hard coat layer, and (c) the protective film are layered in this order; and the polymerization inhibitor includes at least one among a quinone-based compound, a sulfur-containing compound, and a nitrogen-containing compound.
    Type: Application
    Filed: February 3, 2021
    Publication date: March 23, 2023
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Yasutaka FUKUNAGA, Shota KAMEI
  • Publication number: 20230083286
    Abstract: A method for producing an ion conductor containing LiCB9H10 and LiCB11H12 includes: preparing a homogeneous solution by mixing LiCB9H10 and LiCB11H12 in a solvent at a LiCB9H10/LiCB11H12 molar ratio of from 1.1 to 20; obtaining a precursor by removing the solvent from the homogeneous solution; and obtaining an ion conductor by subjecting the precursor to a heat treatment.
    Type: Application
    Filed: February 8, 2021
    Publication date: March 16, 2023
    Applicants: MITSUBISHI GAS CHEMICAL COMPANY, INC., TOHOKU TECHNO ARCH CO., LTD.
    Inventors: Keita NOGUCHI, Genki NOGAMI, Yutaka MATSUURA, Sangryun KIM, Kazuaki KISU, Shin-ichi ORIMO
  • Publication number: 20230071336
    Abstract: A method for producing a sulfide solid electrolyte includes: preparing a uniform solution that includes at least elemental lithium (Li), elemental tin (Sn), elemental phosphorus (P), and elemental sulfur (S) in an organic solvent; removing the organic solvent from the uniform solution to obtain a precursor; and heat-treating the precursor to obtain a sulfide solid electrolyte.
    Type: Application
    Filed: January 6, 2021
    Publication date: March 9, 2023
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventor: Tomohiro ITO
  • Publication number: 20230076244
    Abstract: A polyimide resin composition containing a polyimide resin (A) and a polyetherimide sulfone resin (B), wherein the polyimide resin (A) contains a repeating structural unit represented by the following formula (1) and a repeating structural unit represented by the following formula (2), and a content ratio of the repeating structural unit of the formula (1) with respect to the total of the repeating structural unit of the formula (1) and the repeating structural unit of the formula (2) is 20 to 70 mol %; and a molded article containing the same. (R1 represents a divalent group having from 6 to 22 carbon atoms containing at least one alicyclic hydrocarbon structure; R2 represents a divalent chain aliphatic group having from 5 to 16 carbon atoms; and X1 and X2 each independently represent a tetravalent group having from 6 to 22 carbon atoms containing at least one aromatic ring.
    Type: Application
    Filed: November 30, 2020
    Publication date: March 9, 2023
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Atsushi SAKAI, Yuuki SATO
  • Patent number: 11596936
    Abstract: Realized is a method for restoring the activity of a catalyst for producing a carbonate ester by a simple technique with no use of a complicated step such as calcining or the like to allow the catalyst to be reusable, and a method for producing a carbonate ester at a high yield by use of the catalyst thus regenerated. The above-described problem has been solved by a method for regenerating a catalyst containing CeO2, the catalyst being usable for a carbonate ester generation reaction of generating a carbonate ester from carbon dioxide and an alcohol, the method comprising (a) a separation step of separating the catalyst as a crude catalyst from a reaction solution of carbon dioxide and the alcohol; and (b) a catalyst processing step of washing the crude catalyst with a washing alcohol to provide a purified catalyst.
    Type: Grant
    Filed: September 25, 2018
    Date of Patent: March 7, 2023
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Hidefumi Harada, Takehiko Isobe, Hongyu Liu, Yousuke Shinkai, Ryotaro Umezu
  • Publication number: 20230062796
    Abstract: The compound (A) is represented by formula (1). R1O—R2—OR1?? (1) (In formula (1), each R1 independently represents a group represented by formula (2), or a hydrogen atom, and R2 represents a linear or branched alkylene group having 1 to 16 carbon atoms, or a linear or branched alkenylene group having 2 to 16 carbon atoms, provided that at least one R1 is a group represented by formula (2).) (In formula (2), -* represents a bonding hand.
    Type: Application
    Filed: December 9, 2020
    Publication date: March 2, 2023
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Shunsuke KATAGIRI, Takuya SUZUKI, Seiji SHIKA, Yune KUMAZAWA
  • Publication number: 20230066153
    Abstract: Provided is a resin composition which has good solubility and photocurability, further has good alkaline-developability when containing a photo initiator and a compound containing one or more carboxyl groups, and in addition, is capable of providing a resin sheet having suppressed tackiness; and a resin sheet, multilayer printed wiring board, and semiconductor device using the same. The resin composition of the present invention contains a particular bismaleimide compound (A), and at least two maleimide compounds (B) selected from the group consisting of six kinds of particular compounds which are different from this bismaleimide compound (A).
    Type: Application
    Filed: December 9, 2020
    Publication date: March 2, 2023
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Yune KUMAZAWA, Takuya SUZUKI, Seiji SHIKA, Shunsuke KATAGIRI
  • Publication number: 20230066520
    Abstract: A method for producing a fiber-reinforced composite material containing a polyimide resin (A) having a predetermined repeating unit and a continuous reinforcing fiber (B), the method including the following steps (I) and (II) in this order: step (I): a step of laminating at least one polyimide resin (A) layer and at least one continuous reinforcing fiber (B) layer to obtain a laminated product; and step (II): a step of molding the laminated product by heating and pressurizing under a condition where a working parameter X expressed by the following expression (i) is 35 or more and 87 or less: X=(Tp?Tm)3×P1/2/1000??(i) wherein in the expression (i), Tp represents a temperature (° C.) during the molding, Tm represents a melting point (° C.) of the polyimide resin (A), and P represents a press pressure (MPa) during the molding.
    Type: Application
    Filed: April 14, 2021
    Publication date: March 2, 2023
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Yuuki SATO, Kousuke IKEUCHI, Nobuhiko MATSUMOTO
  • Publication number: 20230057045
    Abstract: A compound (A) of the present invention is represented by the formula (1): wherein each R1 independently represents a group represented by the formula (2) or a hydrogen atom, and each R2 independently represents a hydrogen atom or a linear or branched alkyl group having 1 to 6 carbon atoms, provided that at least one R1 is a group represented by the formula (2); and wherein -* represents a bonding hand.
    Type: Application
    Filed: December 9, 2020
    Publication date: February 23, 2023
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Shunsuke KATAGIRI, Takuya SUZUKI, Seiji SHIKA, Yune KUMAZAWA
  • Publication number: 20230059584
    Abstract: An epoxy resin composition including an epoxy resin, an epoxy resin curing agent containing an amine-based curing agent, and an unsaturated fatty acid amide having from 14 to 24 carbons, a gas barrier laminate and a retort food packaging material using the epoxy resin composition, an odor-proofing or aroma-retaining packaging material, an odor-proofing or aroma-retaining method of sealing an article containing an odorous component or an aromatic component in the packaging material, a heat-shrinkable label, the production method of the heat-shrinkable label, a heat-shrunken label and a bottle having the heat-shrunken label, and a CO2 transmission prevention method.
    Type: Application
    Filed: January 22, 2021
    Publication date: February 23, 2023
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Kazuki KOUNO, Ryoma HASHIMOTO, Naoko KOBAYASHI
  • Patent number: 11584705
    Abstract: A production method for a cyclohexanedicarboxylic acid compound, having a step of obtaining a cyclohexanedicarboxylic acid compound or an aqueous ammonia solution of a cyclohexanedicarboxylic acid compound by bringing a phthalic acid compound in an aqueous ammonia solution into contact with hydrogen in the presence of a fixed bed catalyst in a reactor.
    Type: Grant
    Filed: April 11, 2019
    Date of Patent: February 21, 2023
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Aoi Yamazoe, Yuta Ohmori, Akifumi Iida, Yutaka Kanbara
  • Publication number: 20230040356
    Abstract: A method for producing bis(aminomethyl)cyclohexane, including hydrogenating xylylenediamine in the presence of a solvent and a catalyst, wherein the catalyst with decreased activity due to use is treated in a catalyst regeneration treatment step including the following step (1) and step (2), and then reused in a reaction system: step (1): maintaining an amount of bis(aminomethyl)cyclohexane in a liquid before the step (2) at 20% by mass or less, step (2): heating the catalyst to 100 to 500° C. and bringing the catalyst into contact with a hydrogen-containing gas.
    Type: Application
    Filed: December 15, 2020
    Publication date: February 9, 2023
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Emi NOGUCHI, Yukiya IBI, Tatsuyuki KUMANO
  • Patent number: 11572338
    Abstract: The problem addressed by this invention is to achieve a useful and novel method for producing dicyanocyclohexane and bis(aminomethyl)cyclohexane. This problem was solved by providing a method for producing dicyanocyclohexane having a cyanation step in which dicyanocyclohexane is obtained by a cyanation reaction of cyanocyclohexane-1-carboxylic acid and/or a salt thereof with an ammonia source, and a method for producing bis(aminomethyl)cyclohexane using the dicyanocyclohexane thus produced.
    Type: Grant
    Filed: December 26, 2018
    Date of Patent: February 7, 2023
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Emi Nakano, Noriyuki Shiomi, Akifumi Iida
  • Patent number: 11572436
    Abstract: Provided is a curing agent for a water-based epoxy resin, which contains the following component (A) and component (B): (A); at least one selected from the group consisting of a polyamide amine-based curing agent (a1), a reaction product (a2) of a polyamine compound and a polyepoxy compound, and a Mannich reaction product (a3) of a polyamine compound, a phenol compound, and an aldehyde compound; (B): at least one selected from the group consisting of a reaction product (b1) of styrene and an amine compound represented by the following formula (1), and a reaction product (b2) of epichlorohydrin and an amine compound represented by the following formula (1); H2N—CH2-A-CH2—NH2??(1) wherein A is a 1,2-phenylene group, a 1,3-phenylene group, or a 1,4-phenylene group.
    Type: Grant
    Filed: April 10, 2019
    Date of Patent: February 7, 2023
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventor: Takuma Hanaoka
  • Patent number: 11572430
    Abstract: The present invention employs a compound represented by the following formula (1) and/or a resin comprising the compound as a constituent: wherein R1 is a 2n-valent group of 1 to 60 carbon atoms or a single bond; R2 to R5 are each independently a linear, branched, or cyclic alkyl group of 1 to 10 carbon atoms, an aryl group of 6 to 10 carbon atoms, an alkenyl group of 2 to 10 carbon atoms, an alkoxy group of 1 to 30 carbon atoms, a halogen atom, a thiol group, a hydroxy group, or a group in which a hydrogen atom of a hydroxy group is replaced with an acid dissociation group, provided that at least one selected from R2 to R5 is a group in which a hydrogen atom of a hydroxy group is replaced with an acid dissociation group; m2 and m3 are each independently an integer of 0 to 8; m4 and m5 are each independently an integer of 0 to 9, provided that m2, m3, m4, and m5 are not 0 at the same time; n is an integer of 1 to 4; and p2 to p5 are each independently an integer of 0 to 2.
    Type: Grant
    Filed: September 14, 2020
    Date of Patent: February 7, 2023
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Takumi Toida, Youko Shimizu, Takashi Makinoshima, Takashi Sato, Masatoshi Echigo
  • Patent number: 11548847
    Abstract: Provided are a novel amine composition and a novel amine compound. Also provided are a method for producing the amine composition and amine compound, and an epoxy resin curing agent, an epoxy resin composition, a cured product, a urethane prepolymer curing agent, a polyurethane urea resin composition, a polyamide varnish, and a polyamide, each obtained using the amine composition and amine compound. The amine composition contains a compound represented by Formula (1), wherein A is a cyclic alkylene group, and B is a group containing an aryl group or a heteroaryl group.
    Type: Grant
    Filed: February 21, 2020
    Date of Patent: January 10, 2023
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventor: Yuiga Asai
  • Patent number: 11542222
    Abstract: A method for preparing a dicyanoalkane may omit a filtration for a catalyst after a cyanation reaction can by carrying out the cyanation reaction in a state in which precipitation of a metal catalyst is suppressed. A method for preparing a dicyanoalkane may involve cyanating one or more aliphatic dicarboxylic acids and/or salt(s) thereof with an ammonia source in the presence of a predetermined compound and a catalyst, wherein, in the cyanation, the amount of the predetermined compound is maintained at a predetermined amount or more with respect to the catalyst.
    Type: Grant
    Filed: April 11, 2019
    Date of Patent: January 3, 2023
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Noriyuki Shiomi, Emi Nakano, Akifumi Iida
  • Publication number: 20220411622
    Abstract: Provided is a resin composition capable of providing a plate-shaped molded article having a high refractive index as well as a high hardness, and a plate-shaped molded article, a multilayered article, and an anti-reflection film formed from the resin composition. The resin composition contains 10 to 99 parts by mass of an acrylic resin (A); and 90 to 1 part by mass of a random copolymer (B) derived from a monomer composition B composed of 5 to 95 mass % of a (meth)acrylate represented by the formula (b1) (b-1), 5 to 95 mass % of an aromatic (meth)acrylate (b-2), and 0 to 20 mass % of an additional monomer (b-3); in the formula (b1), Rb1 is a hydrogen atom or a methyl group, and Rb2 is an aliphatic group.
    Type: Application
    Filed: November 16, 2020
    Publication date: December 29, 2022
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Keisuke TOMITA, Kaori SAKURAI