Abstract: An electrode apparatus for an electric arc vapor deposition machine has an electrode body with a coaxially aligned stud threaded into its rear surface and projecting substantially perpendicularly thereto. The distal end of the stud is threaded for rapid detachable fastening to an electrode support means such that the periphery of the rear surface of the electrode is uniformly drawn toward engagement with the electrode support means. A seal member forms a fluid tight seal between the peripheral rear surface of the electrode body and the electrode support means, which cooperatively define a coolant cavity for actively and efficiently cooling substantially the entire lower surface of the electrode. The electrode support means includes means for directly bathing the seal with liquid coolant from the coolant cavity. The simple threaded stud mounting configuration allows a spent cathode to be rapidly replaced.

Abstract: An improved method and apparatus for maintaining cathode spots in an electric arc vapor deposition coating process, on the desired cathode evaporation surface are disclosed. A primary anode is arranged, configured and biased within a vacuum deposition coating chamber relative to a cathodic source so as to maintain an electric arc therebetween. A relative biasing network maintains a voltage difference during deposition between the primary anode and other conductive surfaces within the chamber, or the chamber wall itself, such that electrons leaving the cathode are preferentially drawn toward the primary anode rather than to other conductive surfaces. The anode orientation within the chamber causes those electrons drawn toward it to tend to maintain the cathode spots on the desired cathode evaporation surface for maintaining arc stability at low arc current levels.

Abstract: An improved electric arc vapor deposition source plate mounting assembly (8) is disclosed. The source plate assembly is formed of a plurality of cooperatively mating sections (12, 22 and 24) that are secured to one another by fastening members (30, 32). The innermost section (24) carries an electrode (26) of coating source material. Insulator seal rings (56, 58) electrically isolate the mating sections (12, 22 and 24) from one another while forming a vacuum seal between the respective mating members. The insulator seal rings (56, 58) have two adjoining sections annularly displaced from one another such that the rings are self-centering between the respective mating members. The insulator rings preferably have a substantially L-shaped cross-section and include an enlarged bulge portion (61) for improved sealing characteristics.

Abstract: A method and apparatus for vapor depositing node-free coatings on substrate surfaces, without altering the pre-coating substrate surface dimension, are disclosed. A gaseous plasma (50) is generated within an evacuated deposition chamber (20) from a source (40) of coating material. The plasma generation is preferably performed by electric arc vapor deposition techniques. Means, preferrably a shield (60), are disposed in the chamber to intercept a portion of the plasma stream and to define a shadow region (60') that is substantially void of plasma particles traveling in a line-of-sight path from the source (40). Substrate(s) (30) to be coated are placed within the shadow region and are coated by that portion of the plasma diffusing into the shadow region. The substrates may be biased to ionically attract plasma ions. The shield (60) can be heated by ion bombardment of the plasma and positioned to heat the substrates by radiation. The shield may be electrically biased to enhance the coating operation.

Abstract: A substrate support apparatus (40) for reliably rotatably supporting substrates being coated within an evacuated physical vapor deposition chamber, is disclosed. A base member (41) defining one or more work stations (43) is configured and mounted for movement within a deposition coating chamber (20) such that the work station(s) move along a closed path in the chamber, past one or more coating material sources (25). Substrate holder assemblies (50), configured to support one or more substrates (30) to be coated, are mounted for rotation about auxiliary axes (47) at selectable ones of the work stations. Unique bearing means (65, 67), operable over wide temperature variations, rotatably support the substrate holder assemblies and provide good electrical conduction from the base member (41) to the substrates (30). Bearing surfaces (67b) are protected from contamination by the coating plasma (25a).

Abstract: A trigger apparatus and method for striking an electrical arc at the surface of a coating source material within a vapor deposition chamber is disclosed. A plunger member is mounted for axial movement in a housing configured for attachment to an inlet port of a deposition chamber. The plunger has one end adapted to carry an arc-initiating wire contact. A pneumatic drive cylinder axially reciprocates the plunger member with positive force strokes in both directions such that the wire contact alternately engages and disengages the surface of the cathode source material. Seal means are provided for maintaining a vacuum seal of the deposition chamber through the trigger apparatus. Dynamic shield means are mounted adjacent the inlet port for protecting the seal members from being coated by vapor particles within the deposition chamber. Alignment means cooperatively engage the plunger member for maintaining a positive angular position of the plunger member during reciprocal motion thereof.