Abstract: A photoresist supply apparatus and a method of supplying photoresist using the same are provided. The photoresist supply apparatus includes a flow length measurer for measuring the flow length of photoresist remaining at the tip of a nozzle unit; a measured data processor for converting data measured by the flow length measurer into an electrical signal; and a valve controller for finely controlling the flow length of photoresist by controlling the amount of air flowing into an automatic on/off valve in response to the electrical signal fed back from the measured data processor. Accordingly, by measuring the flow length of photoresist at the tip of nozzle unit in real time and feeding back the measured flow length, a faulty process due to an irregular flow length of photoresist can be prevented, and a fixed amount of photoresist can be ejected.