Patents Assigned to National University Corporation the University of Electro-Communications
  • Patent number: 8494008
    Abstract: The present invention includes two or more bandpass filters, for passing signals of mutually different frequency bands therethrough, including one or more stages of units having coupling devices and resonance circuits coupled, in a tap type, to the coupling device, one end of each bandpass filter is directly connected to a common port, the coupling device and the resonance circuit of the first stage nearest to the port of each bandpass filter has a function of impedance matching means for each bandpass filter, in addition to a function of resonance means, respectively.
    Type: Grant
    Filed: August 31, 2006
    Date of Patent: July 23, 2013
    Assignee: National University Corporation the University of Electro-Communications
    Inventor: Kouji Wada
  • Patent number: 8164396
    Abstract: The present invention provides a harmonic processing circuit capable of miniaturizing a circuit, and an amplifier circuit using this harmonic processing circuit. A first impedance adjustment section and a second impedance adjustment section are provided. The first impedance adjustment section is provided with a coupled distributed constant line CT. The coupled distributed constant line CT receive as input the output of an amplification transistor S, and have a length of ΒΌ the wavelength (?) of the fundamental wave at the output of the amplification transistor S. Further, the first impedance adjusting section is configured to adjust input impedance with respect to the even harmonics to one of effectively infinity or zero. The first impedance adjusting section and the second impedance adjustment section are configured to adjust input impedance with respect to the odd harmonics to the other of effectively infinity or zero.
    Type: Grant
    Filed: August 1, 2007
    Date of Patent: April 24, 2012
    Assignee: National University Corporation, The University of Electro-Communications
    Inventors: Ryo Ishikawa, Kazuhiko Honjo
  • Patent number: 7813900
    Abstract: A displacement detection method detects a displacement from phase singularities before and after the displacement, by specifying the phase singularities based on predetermined elements by acquiring the elements from a phase structure of the phase singularities, and detecting positions of the phase singularities after the displacement based on the elements acquired by specifying of the phase singularity.
    Type: Grant
    Filed: January 24, 2007
    Date of Patent: October 12, 2010
    Assignee: National University Corporation the University of Electro-Communications
    Inventors: Mitsuo Takeda, Wei Wang, Tomoaki Yokozeki, Reika Ishijima, Yu Qiao
  • Patent number: 7802384
    Abstract: An excavation technique for a stratum capable of excavating a submerged stratum such as a layer containing an underground resource by using laser irradiation in liquid is provided. In this technique, a laser beam transmitted through laser transmission means 20 is irradiated in liquid 90 in form of a laser beam having a wavelength with high absorptance of the liquid 90 by laser-induced bubble generation means 35, generating a bubble flow 36, thus excavation of a submerged stratum may be carried out by using a laser-induced destruction effect. Moreover, a laser beam 41 having low absorptance of the liquid 90 is irradiated by laser irradiation means 39 and passed through the bubble flow 36, thereby applying a thermal effect to a stratum to destroy rock and excavate the stratum. The destruction effect and the thermal effect also may be cooperatively worked.
    Type: Grant
    Filed: March 16, 2006
    Date of Patent: September 28, 2010
    Assignees: Japan Drilling Co., Ltd., Tohoku University, National University Corporation the University of Electro-Communications
    Inventors: Toshio Kobayashi, Kazuyoshi Takayama, Ken-ichi Ueda, Kazuhisa Otomo, Shigehito Uetake
  • Publication number: 20090246643
    Abstract: [Problems] The present invention provides a photosensitive composition capable of permanently forming a hologram having a low light scattering loss and high diffraction efficiency, and a forming method of a pattern. [Means for solving problems] A photosensitive composition used for forming a pattern by a pattern exposure containing (a) a polymerizable compound, (b) a photopolymerization initiator, and (c) organic-zirconia composite fine particles having a zirconia volume concentration of 20% by volume to 80% by volume; and a forming method of a pattern using the composition.
    Type: Application
    Filed: August 14, 2007
    Publication date: October 1, 2009
    Applicants: NATIONAL UNIVERSITY CORPORATION THE UNIVERSITY OF ELECTRO-COMMUNICATIONS, NISSAN CHEMICAL INDUSTRIES , LTD.
    Inventors: Yasuo Tomita, Naoaki Suzuki, Motohiko Hidaka, Kentaro Ohmori, Keisuke Odoi
  • Publication number: 20080176146
    Abstract: It is an object of the present invention to provide a photosensitive composition capable of forming permanent holograms with low light scattering loss and high diffraction efficiency, and a method for forming a pattern. A photosensitive composition and a pattern formation method using the photosensitive composition are characterized in that the photosensitive composition used to form a pattern by pattern exposure includes: (a) a polymerizable compound, (b) a photopolymerization initiator, and (c) organic fine particles.
    Type: Application
    Filed: March 16, 2006
    Publication date: July 24, 2008
    Applicants: NATIONAL UNIVERSITY CORPORATION THE UNIVERSITY OF ELECTRO-COMMUNICATIONS, NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Yasuo Tomita, Kouji Furushima, Kazuhiko Akimoto, Katsumi Chikama, Motohiko Hidaka, Keisuke Odoi