Patents Assigned to NexGenSemi Holdings Corporation
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Publication number: 20070284695Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.Type: ApplicationFiled: August 20, 2007Publication date: December 13, 2007Applicant: NexGenSemi Holdings CorporationInventors: Michael Zani, Mark Bennahmias, Mark Mayse, Jeffrey Scott
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Publication number: 20070284538Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.Type: ApplicationFiled: August 20, 2007Publication date: December 13, 2007Applicant: NexGenSemi Holdings CorporationInventors: Michael Zani, Mark Bennahmias, Mark Mayse, Jeffrey Scott
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Publication number: 20070284537Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.Type: ApplicationFiled: August 20, 2007Publication date: December 13, 2007Applicant: NexGenSemi Holdings CorporationInventors: Michael Zani, Mark Bennahmias, Mark Mayse, Jeffrey Scott
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Publication number: 20070278418Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.Type: ApplicationFiled: August 20, 2007Publication date: December 6, 2007Applicant: NexGenSemi Holdings CorporationInventors: Michael Zani, Mark Bennahmias, Mark Mayse, Jeffrey Scott
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Publication number: 20070278428Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.Type: ApplicationFiled: August 20, 2007Publication date: December 6, 2007Applicant: NexGenSemi Holdings CorporationInventors: Michael Zani, Mark Bennahmias, Mark Mayse, Jeffrey Scott
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Publication number: 20070278419Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.Type: ApplicationFiled: August 20, 2007Publication date: December 6, 2007Applicant: NexGenSemi Holdings CorporationInventors: Michael Zani, Mark Bennahmias, Mark Mayse, Jeffrey Scott
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Patent number: 7259373Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.Type: GrantFiled: July 10, 2006Date of Patent: August 21, 2007Assignee: NexGenSemi Holdings CorporationInventors: Michael John Zani, Mark Joseph Bennahmias, Mark Anthony Mayse, Jeffrey Winfield Scott