Abstract: Provided are: a high-quality SiC single crystal ingot that suppresses the generation of inclusions; and a production method for said SiC single crystal ingot. The present invention pertains to a SiC single crystal ingot including a seed crystal substrate and a SiC growth crystal grown using the solution method and using the seed crystal substrate as the origin thereof, the growth crystal having a recessed crystal growth surface and not including inclusions.
Type:
Grant
Filed:
May 8, 2013
Date of Patent:
December 20, 2016
Assignees:
TOYOTA JIDOSHA KABUSHIKI KAISHA, NIPPON STEEL & SUMITOMO METAL CORPORATIN