Abstract: A circuit configuration in which a pair of conversion circuit parts for converting a power source voltage of a DC power source into an AC by two pairs of switching elements made of a full bridge configuration are connected in parallel with the DC power source and rectification circuit parts are provided to the output sides of each of the conversion circuit parts through transformers and series capacitors are inserted and connected between each of the conversion circuit parts and the transformers is used as unitary units and n groups of the unitary units are provided with respect to the DC power source E and the transformer secondary sides of one rectification circuit parts of each of the unitary units are connected in series among the n groups and also the transformer secondary sides of the other rectification circuit parts are connected in series among the n groups.

Abstract: The ion implantation apparatus deals with an ion beam as a charged particle beam and has an accelerating tube 8 incorporating an electrostatic lens for converging/diverging it. The control of the electrostatic lens is carried out as follows. The swept ion beam 4 is received by a single Faraday cup 46 to measure the beam quantity I(n) and the beam width Wd(p) of the ion beam 4. The evaluated values of the beam quantity and beam width with respect to prescribed standards are calculated. These evaluated valued are assigned weights to calculate a unified evaluated value. The focusing voltage Vf applied to the electrostatic lens with the accelerating tube 8 is controlled so that the unified evaluated value is increased. A waveform shaping controller 50 and beam controller 54 constitute a device for making such control.