Abstract: A test substance detection method includes: a step A in which a sample containing a test substance and water, a compound having a structure in which a response site and a recognition site are connected via a spacer, and a surfactant are added; and a step B in which the recognition site and the test substance interact and a response at the response site arising from the interaction is detected. Further, also provided are: a purified water production method and an injection water production method both using the foregoing; a detection agent composition containing a compound represented by Formula (1) and a surfactant; and a detection apparatus, a purified water production facility, and an injection water production facility, all using the foregoing.

Abstract: A method for starting up a hot ultrapure water production system that produces hot ultrapure water by heating ultrapure water to a supply water temperature, for supplied to a point of use, the method involving: alternately passing heated water and cooled water through a hot ultrapure water pipe through which the hot ultrapure water flows, the heated water being obtained by heating the ultrapure water to a temperature higher than room temperature and the cooled water being obtained by cooling the ultrapure water to a temperature lower than the temperature of the heated water in a range of from room temperature to the supply water temperature.

Abstract: Provided are: a method of producing heated ozone water, the method capable of producing heated ozone water having an extremely high ozone concentration by suppressing a reduction in the ozone concentration in high-concentration heated ozone water; heated ozone water; and a semiconductor wafer-cleaning liquid using the heated ozone water. A method of producing heated ozone water obtained by dissolving ozone in pure water, the method being characterized by including: adjusting a pH of the pure water to 3 or less by adding acid to the pure water; to obtain an acid water, dissolving an ozone gas in the acid water; and heating the pure water, the acid water or the ozone water, to 60° C. or more.

Abstract: A water quality measurement system 10 includes: a first pipe 11 through which a first treated water flows; a first branch pipe 11a branching from the first pipe 11 and having a first valve V11; a second pipe 12 through which a second treated water flows; a second branch pipe 12a branching from the second pipe 12 and having a second valve V12; a third pipe 13 connected to the first pipe 11 and the second pipe 12 and through which the first treated water and the second treated water flow; and a water quality measurement device 14 configured to measure a water quality of a treated water flowing through the third pipe 13.

Abstract: A method of detecting an endotoxin of detecting an endotoxin from a test subject sample using a fluorescent substance having a structure in which a fluorescent site and a recognition site are connected by a spacer, wherein the recognition site recognizes a specific site of a molecular structure of an endotoxin.

Abstract: An ultrapure water production system to produce an ultrapure water, includes a pre-treatment unit 2; a primary pure water production unit 3; a secondary pure water production unit 4; a storage unit 5 provided to precede the pre-treatment unit 2 or between the pre-treatment unit 2 and the primary pure water production unit 3, the storage unit 5 being capable of storing raw water or treatable water; a recovery treatment unit 6 to remove impurities mixed in a used ultrapure water obtained after use of the ultrapure water and containing hydrogen peroxide with passing a part or the whole of the hydrogen peroxide therethrough, to make a recovered water; and a circulator 7 to circulate the recovered water obtained from the recovery treatment unit 6 to feed the recovered water back to the storage unit 5.

Abstract: A method for starting up a hot ultrapure water production system that produces hot ultrapure water by heating ultrapure water to a supply water temperature, for supplied to a point of use, the method involving: alternately passing heated water and cooled water through a hot ultrapure water pipe through which the hot ultrapure water flows, the heated water being obtained by heating the ultrapure water to a temperature higher than room temperature and the cooled water being obtained by cooling the ultrapure water to a temperature lower than the temperature of the heated water in a range of from room temperature to the supply water temperature.

Abstract: A desalination apparatus 12 (liquid treatment apparatus) includes a first water treatment unit 26 (liquid treatment unit) that includes a reverse osmosis membrane and in which a treated liquid is separated into a permeate that permeates the reverse osmosis membrane and a concentrate other than the permeate, a water recovery unit 28 (liquid recovery unit) that includes a reverse osmosis membrane and in which the concentrate is separated into a recovered liquid that permeates the reverse osmosis membrane and a waste liquid other than the recovered liquid, and a pressure increasing means that increases a liquid pressure of the concentrate, such that a state capable of separating into the recovered liquid and the waste liquid in the liquid recovery unit continues, and that directly feeds the concentrate from the liquid treatment unit to the liquid recovery unit.

Abstract: Provided is a stripping method capable of stripping a resist while suppressing the time and cost of processing required for stripping, while giving sufficient consideration to the load on the environment. The resist stripping method is a method for stripping a resist film-formed on a substrate, including: a pretreatment step of exposing the resist to a heated steam in a predetermined temperature range for a predetermined time; and a stripping step of stripping the resist exposed to the heated steam in the pretreatment step by using a resist stripping liquid, wherein the predetermined temperature range and the predetermined time are set according to the resist.

Abstract: A ultrapure water supply system 10 includes a pure water tank 16 provided vertically below a use point 30, a return pipe 32 through which ultrapure water is returned from the use point 30 to the pure water tank 16, a first pressure regulating valve 40 that is provided at a first position H1 of the return pipe 32 and adjusts a first pressure upstream of the first position H1 and a second pressure regulating valve 42 that is provided at a second position H2 downstream of the first position H1 and vertically below the first position H1 of the return pipe 32 and adjusts a second pressure downstream of the first position H1 and upstream of the second position H2.

Abstract: Conventional ozone water is still insufficient in the removal rate and cleaning ability of resist required in today's semiconductor manufacturing field, and it does not fully meet the expectation of further improvement in the effects of sterilization, deodorization, and cleaning in the fields such as cleaning of foodstuffs, cleaning of process equipment and tools, and cleaning of fingers, as well as in the fields such as deodorization, sterilization, and preservation of freshness of foodstuffs. The above problem can be solved by defining the values of a plurality of specific production parameters in the production of ozone water into specific ranges.

Abstract: Conventional ozone water is still insufficient in the removal rate and cleaning ability of resist required in today's semiconductor manufacturing field, and it does not fully meet the expectation of further improvement in the effects of sterilization, deodorization, and cleaning in the fields such as cleaning of foodstuffs, cleaning of process equipment and tools, and cleaning of fingers, as well as in the fields such as deodorization, sterilization, and preservation of freshness of foodstuffs. The above-problem can be solved by defining the values of a plurality of specific production parameters in the production of ozone water into specific ranges.

Abstract: Provided are: a method of producing heated ozone water, the method capable of producing heated ozone water having an extremely high ozone concentration by suppressing a reduction in the ozone concentration in high-concentration heated ozone water; heated ozone water; and a semiconductor wafer-cleaning liquid using the heated ozone water. A method of producing heated ozone water obtained by dissolving ozone in pure water, the method being characterized by including: adjusting a pH of the pure water to 3 or less by adding acid to the pure water; to obtain an acid water, dissolving an ozone gas in the acid water; and heating the pure water, the acid water or the ozone water, to 60° C. or more.

Abstract: To provide method and apparatus for producing alkaline water, capable of preventing mixture of fine particles derived from a gas dissolving membrane device into hydrogen water. An apparatus for producing alkaline water for cleaning electronic device includes: a pH adjusting device 11 configured to adjust ultrapure water to be alkaline; a deaeration device 13 configured to deaerate the ultrapure water adjusted to be alkaline; and a gas dissolving membrane device 14 having a gas permeable membrane to dissolve functional gas into the deaerated ultrapure water.

Abstract: A functional water producing apparatus in an embodiment includes: a water pressure regulator configured to regulate the water pressure of the ultrapure water, the water pressure regulator having a pressure regulating valve configured to regulate a water pressure of the ultrapure water to an almost constant pressure and a feed water pump configured to pressurize the ultrapure water; a dissolving device configured to dissolve functional gas imparting a specific function in the ultrapure water regulated the water pressure by the water pressure regulator; and a control device configured to control the feed water pump to regulate the water pressure of the functional water to a predetermined constant pressure based on a water pressure or a flow rate of the functional water flowing out of the dissolving device.

Abstract: A functional water producing apparatus in an embodiment includes: a water pressure regulator configured to regulate the water pressure of the ultrapure water, the water pressure regulator having a pressure regulating valve configured to regulate a water pressure of the ultrapure water to an almost constant pressure and a feed water pump configured to pressurize the ultrapure water; a dissolving device configured to dissolve functional gas imparting a specific function in the ultrapure water regulated the water pressure by the water pressure regulator; and a control device configured to control the feed water pump to regulate the water pressure of the functional water to a predetermined constant pressure based on a water pressure or a flow rate of the functional water flowing out of the dissolving device.

Abstract: An object of the present invention is to provide an ultrapure water production method and an ultrapure water production system that are capable of suppressing deterioration in a two-stage reverse osmosis membrane device of the ultrapure water production system caused by an oxidant and further suppressing occurrence of biofouling. The ultrapure water production method using an ultrapure water production system including a two-stage reverse osmosis membrane device including a chlorine-resistant reverse osmosis membrane device at a previous-stage and a non-chlorine-resistant reverse osmosis membrane device to perform a treatment at a subsequent-stage, and the method comprises treating a water-to-be-treated having a total of a free chlorine concentration in Cl equivalent and a free bromine concentration in Br equivalent of 0.01 mg/L or more and less than 0.

Abstract: To provide method and apparatus for producing alkaline water, capable of preventing mixture of fine particles derived from a gas dissolving membrane device into hydrogen water. An apparatus for producing alkaline water for cleaning electronic device includes: a pH adjusting device 11 configured to adjust ultrapure water to be alkaline; a deaeration device 13 configured to deaerate the ultrapure water adjusted to be alkaline; and a gas dissolving membrane device 14 having a gas permeable membrane to dissolve functional gas into the deaerated ultrapure water.

Abstract: A method of producing washing hydrogen water in an embodiment, includes: a step of storing ammonia water in a first tank; a step of transferring the ammonia water from the first tank to a second tank; a step of diluting the transferred ammonia water with ultrapure water in the second tank; a step of mixing the diluted ammonia water into hydrogen water; and a washing step of washing an inside of the first tank by ultrapure water to remove fine particles derived from ammonia generated in the first tank.

Abstract: A functional water producing apparatus in an embodiment includes: a water pressure regulator configured to regulate the water pressure of the ultrapure water, the water pressure regulator having a pressure regulating valve configured to regulate a water pressure of the ultrapure water to an almost constant pressure and a feed water pump configured to pressurize the ultrapure water; a dissolving device configured to dissolve functional gas imparting a specific function in the ultrapure water regulated the water pressure by the water pressure regulator; and a control device configured to control the feed water pump to regulate the water pressure of the functional water to a predetermined constant pressure based on a water pressure or a flow rate of the functional water flowing out of the dissolving device.